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    • 4. 发明授权
    • Microscope arrangement for inspecting a substrate
    • 用于检查基板的显微镜装置
    • US07035003B2
    • 2006-04-25
    • US10991517
    • 2004-11-19
    • Martin PeiterMandy Vogel
    • Martin PeiterMandy Vogel
    • G02B21/26G02B21/00
    • G02B21/26G02B21/0016
    • A microscope measuring arrangement for inspecting a substrate includes a microscope, an illuminating system, preferably a sight glass, a holder, a substrate pallet and a rotary apparatus and/or tilting apparatus. The substrate pallet can be moved between at least two positions, which lie in the visual ranges respectively of the microscope and the sight glass. The substrate is first subject to an oblique light inspection for finding defect positions by the rotary and/or tilting apparatus. Without having to remove the substrate from the substrate pallet, the microscope to undertake a high-resolution inspection for classifying the defect at the defect position found.
    • 用于检查基板的显微镜测量装置包括显微镜,照明系统,优选观察镜,保持器,基板托盘和旋转装置和/或倾斜装置。 基板托盘可以在至少两个位置之间移动,这两个位置分别位于显微镜和观察窗的视觉范围内。 首先对基板进行倾斜光检查,以通过旋转和/或倾斜装置找到缺陷位置。 不需要从基板托盘移除基板,显微镜要进行高分辨率检查,以便在找到的缺陷位置对缺陷进行分类。
    • 6. 发明申请
    • Microscope arrangement for inspecting a substrate
    • 用于检查基板的显微镜装置
    • US20050122578A1
    • 2005-06-09
    • US10991517
    • 2004-11-19
    • Martin PeiterMandy Vogel
    • Martin PeiterMandy Vogel
    • G02B21/00G02B21/26G02B21/06
    • G02B21/26G02B21/0016
    • A microscope measuring arrangement for inspecting a substrate comprises a microscope, an illuminating system, preferably a sight glass, a holder, a substrate pallet and a rotary apparatus and/or tilting apparatus. The substrate pallet can be moved between at least two positions, which lie in the visual ranges 11, 21 respectively of the microscope and the sight glass. The substrate can firstly be subjected by means of the rotary and/or tilting apparatus 71, 72 to an oblique light inspection for finding defect positions. Without having to remove the substrate from the substrate pallet, it is subsequently possible to use the microscope to undertake a high-resolution inspection for the purpose of classifying the defect at the defect position found.
    • 用于检查基板的显微镜测量装置包括显微镜,照明系统,优选视镜,保持器,基板托盘和旋转装置和/或倾斜装置。 基板托盘可以在分别位于显微镜和观察窗的视觉范围11,21中的至少两个位置之间移动。 首先可以通过旋转和/或倾斜装置71,72对基板进行倾斜光检查,以找出缺陷位置。 无需从基板托盘上移除基板,随后可以使用显微镜进行高分辨率检查,以便在发现的缺陷位置对缺陷进行分类。