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1. 发明申请

US20080312663A1 COMPUTER-ASSISTED JOINT ANALYSIS USING SURFACE PROJECTION 失效
标题翻译：使用表面投影的计算机辅助联合分析
公开(公告)号：US20080312663A1
公开(公告)日：2008-12-18
申请号：US12138210
申请日：2008-06-12
申请人： Martin Haimerl , Gregor Tuma , Florian Schindler , Mark Fricke
发明人： Martin Haimerl , Gregor Tuma , Florian Schindler , Mark Fricke
IPC分类号： A61B19/00 , A61B17/58
CPC分类号： G06T7/0012 , G06T2207/30008
摘要： A system and method for computer-assisted joint analysis, wherein the joint elements in a three-dimensional imaging data set are segmented and then projected onto a two-dimensional or three-dimensional reference area for interference analysis and surgical planning.
摘要翻译：一种用于计算机辅助关节分析的系统和方法，其中三维成像数据集中的关节元件被分割，然后投影到二维或三维参考区域用于干扰分析和手术规划。

2. 发明授权

US08052623B2 Computer-assisted joint analysis using surface projection 失效
标题翻译：使用表面投影的计算机辅助联合分析
公开(公告)号：US08052623B2
公开(公告)日：2011-11-08
申请号：US12138210
申请日：2008-06-12
申请人： Martin Haimerl , Gregor Tuma , Florian Schindler , Marc Fricke
发明人： Martin Haimerl , Gregor Tuma , Florian Schindler , Marc Fricke
IPC分类号： A61B5/103 , A61B5/117
CPC分类号： G06T7/0012 , G06T2207/30008
摘要： A system and method for computer-assisted joint analysis, wherein the joint elements in a three-dimensional imaging data set are segmented and then projected onto a two-dimensional or three-dimensional reference area for interference analysis and surgical planning.
摘要翻译：一种用于计算机辅助关节分析的系统和方法，其中三维成像数据集中的关节元件被分割，然后投影到二维或三维参考区域用于干扰分析和手术规划。

3. 发明申请

US20080319449A1 COMPUTER-ASSISTED PLANNING METHOD FOR CORRECTING CHANGES IN THE SHAPE OF JOINT BONES 有权
标题翻译：用于校正接头形状变化的计算机辅助计划方法
公开(公告)号：US20080319449A1
公开(公告)日：2008-12-25
申请号：US12138223
申请日：2008-06-12
申请人： Gregor Tuma , Florian Schindler , Marc Fricke , Martin Haimerl
发明人： Gregor Tuma , Florian Schindler , Marc Fricke , Martin Haimerl
IPC分类号： A61B17/56
CPC分类号： A61B90/36 , A61B34/10 , A61B2090/364
摘要： The patent discloses a system and method for correcting changes in the shape of joint bones in a bone joint, including: providing a three-dimensional imaging data set of a bone joint; identifying the joint bones in the data set based on the shapes of the joint bones; inscribing a portion of a joint bone to be reconstructed with a base shape; determining contour deviations of the inscribed joint bone from the base shape by ascertaining contour distances between the base shape and the shape of the inscribed joint bone in different incision planes; determining a three-dimensional deviating volume using the contour deviations; and using the deviating volume for correction planning.
摘要翻译：该专利公开了一种用于校正骨关节骨骼形状变化的系统和方法，包括：提供骨关节的三维成像数据集; 根据关节骨的形状识别数据集中的关节骨; 以基部形状刻划要重建的关节骨的一部分; 通过确定基部形状与不同切口平面中的内接合骨的形状之间的轮廓距离来确定内切关节骨与基部形状的轮廓偏差; 使用轮廓偏差确定三维偏离体积; 并使用偏差量进行校正计划。

4. 发明授权

US08152816B2 Computer-assisted planning method for correcting changes in the shape of joint bones 有权
标题翻译：计算机辅助规划方法，用于纠正关节骨形状的变化
公开(公告)号：US08152816B2
公开(公告)日：2012-04-10
申请号：US12138223
申请日：2008-06-12
申请人： Gregor Tuma , Florian Schindler , Marc Fricke , Martin Haimerl
发明人： Gregor Tuma , Florian Schindler , Marc Fricke , Martin Haimerl
IPC分类号： A61B5/103
CPC分类号： A61B90/36 , A61B34/10 , A61B2090/364
摘要： The patent discloses a system and method for correcting changes in the shape of joint bones in a bone joint, including: providing a three-dimensional imaging data set of a bone joint; identifying the joint bones in the data set based on the shapes of the joint bones; inscribing a portion of a joint bone to be reconstructed with a base shape; determining contour deviations of the inscribed joint bone from the base shape by ascertaining contour distances between the base shape and the shape of the inscribed joint bone in different incision planes; determining a three-dimensional deviating volume using the contour deviations; and using the deviating volume for correction planning.
摘要翻译：该专利公开了一种用于校正骨关节骨骼形状变化的系统和方法，包括：提供骨关节的三维成像数据集; 根据关节骨的形状识别数据集中的关节骨; 以基部形状刻划要重建的关节骨的一部分; 通过确定基部形状与不同切口平面中的内接合骨的形状之间的轮廓距离来确定内切关节骨与基部形状的轮廓偏差; 使用轮廓偏差确定三维偏离体积; 并使用偏差量进行校正计划。

5. 发明申请

US20080049014A1 REGISTRATION OF IMAGING DATA 有权
标题翻译：成像数据的注册
公开(公告)号：US20080049014A1
公开(公告)日：2008-02-28
申请号：US11842974
申请日：2007-08-22
申请人： Martin Haimerl , Florian Schindler
发明人： Martin Haimerl , Florian Schindler
IPC分类号： G06T15/00
CPC分类号： A61B34/20 , A61B90/36 , A61B2034/2055 , A61B2034/2068 , A61B2090/364 , A61B2090/376 , G06K9/32 , G06K2209/057 , G06T7/32 , G06T7/73 , G06T7/80 , G06T2207/10121 , G06T2207/10124 , G06T2207/30004
摘要： A method of determining in a three-dimensional operating space a measure of super-imposition M between at least a portion of an object and a spatial representation of the object or part thereof in an object representation pose, a pose comprising position and orientation in operating space includes: a) obtaining a similarity measure S between a first imaging data taken in first respective imaging poses of the object or part thereof and second imaging data comparable to the first imaging data taken in second respective imaging poses that are digitally reconstructed from the spatial representation of the object or part thereof in the object representation pose; b) locating in operating space at least one point on the surface of the object or part thereof; c) obtaining a distance measure D between the at least one point in operating space and a surface of the spatial representation of the object or part thereof in the object representation pose; and d) obtaining a measure of superimposition M by a combination of the similarity measure S and the distance measure D.
摘要翻译：一种在三维操作空间中确定对象表示姿势中的物体的至少一部分与物体或其部分的空间表示之间的超强度M的度量的方法，包括操作中的位置和取向的姿势空间包括：a）获得在所述对象或其部分的第一各个成像姿势中拍摄的第一成像数据和与从所述空间中数字重建的第二相应成像姿态中拍摄的第一成像数据相比较的第二成像数据之间的相似性度量S 对象或其部分在对象表示姿态中的表示; b）将物体或其一部分的表面上的至少一个点定位在操作空间中; c）在对象表示姿态中获得操作空间中的至少一个点与对象或其部分的空间表示的表面之间的距离度量D; 以及d）通过相似度测量S和距离测量D的组合来获得叠加M的度量。

6. 发明授权

US08031922B2 Registration of imaging data 有权
标题翻译：注册成像数据
公开(公告)号：US08031922B2
公开(公告)日：2011-10-04
申请号：US11842974
申请日：2007-08-22
申请人： Martin Haimerl , Florian Schindler
发明人： Martin Haimerl , Florian Schindler
IPC分类号： G06K9/00 , G06T15/00
CPC分类号： A61B34/20 , A61B90/36 , A61B2034/2055 , A61B2034/2068 , A61B2090/364 , A61B2090/376 , G06K9/32 , G06K2209/057 , G06T7/32 , G06T7/73 , G06T7/80 , G06T2207/10121 , G06T2207/10124 , G06T2207/30004
摘要： A method of determining in a three-dimensional operating space a measure of super-imposition M between at least a portion of an object and a spatial representation of the object or part thereof in an object representation pose, a pose comprising position and orientation in operating space includes: a) obtaining a similarity measure S between a first imaging data taken in first respective imaging poses of the object or part thereof and second imaging data comparable to the first imaging data taken in second respective imaging poses that are digitally reconstructed from the spatial representation of the object or part thereof in the object representation pose; b) locating in operating space at least one point on the surface of the object or part thereof; c) obtaining a distance measure D between the at least one point in operating space and a surface of the spatial representation of the object or part thereof in the object representation pose; and d) obtaining a measure of superimposition M by a combination of the similarity measure S and the distance measure D.
摘要翻译：一种在三维操作空间中确定对象表示姿势中的物体的至少一部分与物体或其部分的空间表示之间的超强度M的度量的方法，包括操作中的位置和取向的姿势空间包括：a）获得在所述对象或其部分的第一各个成像姿势中拍摄的第一成像数据和与从所述空间中数字重建的第二相应成像姿态中拍摄的第一成像数据相比较的第二成像数据之间的相似性度量S 对象或其部分在对象表示姿态中的表示; b）将物体或其一部分的表面上的至少一个点定位在操作空间中; c）在对象表示姿态中获得操作空间中的至少一个点与对象或其部分的空间表示的表面之间的距离度量D; 以及d）通过相似度测量S和距离测量D的组合来获得叠加M的度量。

7. 发明授权

US08477317B2 Position measuring arrangement 有权
标题翻译：位置测量装置
公开(公告)号：US08477317B2
公开(公告)日：2013-07-02
申请号：US12804735
申请日：2010-07-28
申请人： Florian Schindler , Robert Kraus , Joel Heersink , Michael Stepputat
发明人： Florian Schindler , Robert Kraus , Joel Heersink , Michael Stepputat
IPC分类号： G01B11/02
CPC分类号： G01S17/42 , G01S17/36
摘要： A position measuring arrangement that includes a retroreflector, a light source generating a lightbeam and a scanning unit that generates a partially-divergent lightbeam. The scanning unit includes a scanning mirror mounted so it is deflected in a reproducible manner so that a grid-like scanning of a two-dimensional spatial area by the partially-divergent lightbeam takes place over a plurality of scanning tracks. The position measuring arrangement including an interferometric distance measuring unit that includes a beam splitter element that splits the lightbeam generated by the light source so that split lightbeams pass through a reference arm and a measuring arm at least once in each direction. The interferometric distance measuring unit includes an opto-electronic detector unit, through which a detection of distance-dependent signals from superimposed lightbeams from the reference arm and the measuring arm takes place.
摘要翻译：一种位置测量装置，包括后向反射器，产生光束的光源和产生部分发散的光束的扫描单元。扫描单元包括安装的扫描反射镜，其以可再现的方式偏转，使得通过部分发散的光束的二维空间区域的网格状扫描发生在多个扫描轨道上。所述位置测量装置包括干涉距离测量单元，所述干涉距离测量单元包括分束器元件，所述分束器元件分裂由所述光源产生的光束，使得分束光束在每个方向上至少穿过参考臂和测量臂。干涉距离测量单元包括光电检测器单元，通过该光电检测器单元检测来自参考臂和测量臂的叠加光束的距离相关信号。

8. 发明申请

US20120176027A1 Radiation Emitting Device 有权
标题翻译：辐射发射装置
公开(公告)号：US20120176027A1
公开(公告)日：2012-07-12
申请号：US13425164
申请日：2012-03-20
申请人： Markus Klein , Florian Schindler , Ian Stephen Millard , Sok Gek Beh
发明人： Markus Klein , Florian Schindler , Ian Stephen Millard , Sok Gek Beh
IPC分类号： H05B33/12
CPC分类号： H01L51/5262 , H01L33/08 , H01L51/5203 , H01L2251/5361 , H01L2924/0002 , H01L2924/00
摘要： A radiation emitting device includes a substrate and a layer sequence disposed on top of the substrate. The layer sequence includes a first electrode surface with a first contact for applying a voltage, at least one functional layer that emits radiation during operation, and a second electrode surface. In the layer sequence, a plurality of partial regions is present that is modified in such a way that the emission of radiation visible to an external observer therefrom is interrupted. The distribution density of these partial regions can vary depending on their distance from the contact.
摘要翻译：辐射发射器件包括衬底和设置在衬底顶部上的层序列。层序列包括具有用于施加电压的第一接触件的第一电极表面，在操作期间发射辐射的至少一个功能层和第二电极表面。在层序列中，存在多个部分区域，其被修改为使得外部观察者可见的辐射的发射被中断。这些部分区域的分布密度可以根据其与接触件的距离而变化。

9. 发明授权

US07982387B2 Optoelectronic component 有权
标题翻译：光电元件
公开(公告)号：US07982387B2
公开(公告)日：2011-07-19
申请号：US12157054
申请日：2008-06-06
申请人： Benjamin Claus Krummacher , Florian Schindler , Norwin von Malm , Manfred Url
发明人： Benjamin Claus Krummacher , Florian Schindler , Norwin von Malm , Manfred Url
IPC分类号： H05B33/00 , H04N9/31
CPC分类号： H01L27/322 , H01L33/507 , H01L51/5036 , H01L51/5262 , Y10S362/80
摘要： An optoelectronic component comprises a first electrode (3), a radiation-emitting layer sequence (1) having an active region (10) on the first electrode (3), which region has a main extension plane (E) with a surface normal (N) and emits an electromagnetic primary radiation having a non-Lambertian emission characteristic, a second electrode (4) on the radiation-emitting layer sequence (1), said second electrode being transparent to the primary radiation, and a wavelength conversion layer (2) in the beam path of the primary radiation, which converts the primary radiation at least partly into an electromagnetic secondary radiation. In this case, the first electrode (3) is reflective to the primary radiation, the non-Lambertian emission characteristic is given by an intensity I(α) of the primary radiation of the radiation-emitting layer sequence (1) as a function of an emission angle α measured with respect to the surface normal (N), the intensity I(α) increases from a α≧0° with increasing angle α up to a maximum angle αmax, and the conversion probability of the electromagnetic primary radiation in the wavelength conversion layer (2) increases as the emission angle α increases.
摘要翻译：光电子部件包括第一电极（3），在第一电极（3）上具有有源区（10）的辐射发射层序列（1），该区域具有表面法线的主延伸面（E） N）并且发射具有非朗伯发射特性的电磁一次辐射，在辐射发射层序列（1）上的第二电极（4），所述第二电极对于一次辐射是透明的，并且波长转换层）在主辐射的光束路径中，其将初级辐射至少部分地转换成电磁次级辐射。在这种情况下，第一电极（3）对初级辐射是反射的，非朗伯式发射特性由辐射发射层序列（1）的主要辐射的强度I（α）作为相对于表面法线（N）测量的发射角α，强度I（α）随着角度α增加而从α≥0°增加到最大角度αmax，并且电磁一次辐射的转换概率波长转换层（2）随着发射角α的增加而增加。

10. 发明申请

US20100007269A1 Radiation Emitting Device 有权
标题翻译：辐射发射装置
公开(公告)号：US20100007269A1
公开(公告)日：2010-01-14
申请号：US12443324
申请日：2007-09-11
申请人： Markus Klein , Florian Schindler , Ian Stephen Millard , Sok Gek Beh
发明人： Markus Klein , Florian Schindler , Ian Stephen Millard , Sok Gek Beh
IPC分类号： H01L51/52 , H01J1/62 , H01J9/00
CPC分类号： H01L51/5262 , H01L33/08 , H01L51/5203 , H01L2251/5361 , H01L2924/0002 , H01L2924/00
摘要： The invention relates to a radiation emitting device, with a substrate (100) and a layer sequence disposed on top of it. Said layer sequence comprises a first electrode surface (200) with a first contact (210) for applying a voltage, at least one functional layer (300), which emits radiation during operation, and a second electrode surface (400). In the layer sequence, a plurality of partial regions is present that is modified in such a way that the emission of radiation visible to an external observer therefrom is interrupted. The distribution density of these partial regions varies depending on their distance from the contact.
摘要翻译：本发明涉及一种具有衬底（100）和设置在其顶部上的层序列的辐射发射器件。所述层序列包括具有用于施加电压的第一接触（210）的第一电极表面（200），在操作期间发射辐射的至少一个功能层（300）和第二电极表面（400）。在层序列中，存在多个部分区域，其被修改为使得外部观察者可见的辐射的发射被中断。这些部分区域的分布密度根据其与接触件的距离而变化。

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