专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090111838A1 6-ARYLAMINO-5-CYANO-4-PYRIMIDINONES AS PDE9A INHIBITORS 审中-公开
标题翻译： 6-ARYLAMINO-5-CYANO-4-PYRIMIDINONES作为PDE9A抑制剂
公开(公告)号：US20090111838A1
公开(公告)日：2009-04-30
申请号：US12339393
申请日：2008-12-19
申请人： Martin HENDRIX , Lars BARFACKER , Bettina BEYREUTHER , Ulrich EBERT , Christina ERB , Frank-Thorsten HAFNER , Heike HECKROTH , Yan-Hong LIU , Dagmar KARTHAUS , Adrian TERSTEEGEN , Franz-Josef VAN DER STAAY , Marja VAN KAMPEN
发明人： Martin HENDRIX , Lars BARFACKER , Bettina BEYREUTHER , Ulrich EBERT , Christina ERB , Frank-Thorsten HAFNER , Heike HECKROTH , Yan-Hong LIU , Dagmar KARTHAUS , Adrian TERSTEEGEN , Franz-Josef VAN DER STAAY , Marja VAN KAMPEN
IPC分类号： A61K31/513 , C07D239/36 , A61P25/00
CPC分类号： C07D239/42 , C07D401/12 , C07D409/12
摘要： The invention relates to novel 6-arylamino-5-cyano-4-pyrimidinones of formula (I) methods for the production thereof, and the use thereof for producing medicaments utilized for improving awareness, concentration, learning capacity, and/or retentiveness of memory. Said compounds (I) show activity as PDE9 inhibitors.
摘要翻译：本发明涉及式（I）的新型6-芳基氨基-5-氰基-4-嘧啶酮的制备方法及其用于制备用于提高记忆力的意识，浓度，学习能力和/或保持性的药物的用途。所述化合物（I）显示作为PDE9抑制剂的活性。

2. 发明申请

US20070241341A1 LIGHT REFLECTING DEVICE WITH STRAY LIGHT EXTINCTION CAPABILITY 审中-公开
标题翻译：具有轻度放射能力的光反射装置
公开(公告)号：US20070241341A1
公开(公告)日：2007-10-18
申请号：US11668318
申请日：2007-01-29
申请人： Yan-Hong LIU
发明人： Yan-Hong LIU
IPC分类号： H01L33/00
CPC分类号： H01L33/44
摘要： A light reflecting device includes: a substrate having front and back surfaces; a light absorbing layer formed on a selected one of the front and back surfaces of the substrate; a buffer layer formed on the light absorbing layer when the light absorbing layer is formed on the front surface of the substrate and on the front surface of the substrate when the light absorbing layer is formed on the back surface of the substrate; and a light reflecting layer formed on the buffer layer. The light absorbing layer has an extinction coefficient greater than 0.15 and a layer thickness ranging from 10 to 500 nm.
摘要翻译：光反射装置包括：具有正面和背面的基板; 形成在所述基板的前表面和后表面中的所选择的一个上的光吸收层; 当所述光吸收层形成在所述基板的前表面上并且当所述光吸收层形成在所述基板的所述背面上时，形成在所述光吸收层上的缓冲层; 以及形成在缓冲层上的光反射层。光吸收层的消光系数大于0.15，层厚度范围为10〜500nm。

你已经成功收藏专利！

检索式保存成功!

IPRDB