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    • 4. 发明授权
    • Method and device for measuring the thickness of thin films near a sample's edge and in a damascene-type structure
    • 用于测量样品边缘和镶嵌型结构附近薄膜厚度的方法和装置
    • US06256100B1
    • 2001-07-03
    • US09067411
    • 1998-04-27
    • Matthew J. BanetMartin FuchsJohn A. Rogers
    • Matthew J. BanetMartin FuchsJohn A. Rogers
    • G01N2184
    • G01B11/0666
    • A method for measuring a structure that contains overlying and underlying films in a region where the overlying film's thickness rapidly decreases until the underlying film is exposed (e.g., an edge-exclusion structure). The method includes the steps of: (1) exciting acoustic modes in a first portion of the region with at least one excitation laser beam; (2) detecting the acoustic modes with a probe laser beam that is either reflected or diffracted to generate a signal beam; (3) analyzing the signal beam to determine a property of the structure (e.g., the thickness of the overlying layer) in the first portion of the region; (4) translating the structure or the excitation and probe laser beams; and (5) repeating the exciting, detecting, and analyzing steps to determine a property of the structure in a second portion of the region.
    • 一种用于测量在覆盖膜的厚度迅速减小直到底层膜暴露的区域(例如,边缘排除结构)中的覆盖和下层膜的结构的测量方法。 该方法包括以下步骤:(1)利用至少一个激发激光束激发该区域的第一部分中的声模; (2)用反射或衍射的探针激光束检测声学模式以产生信号光束; (3)分析信号光束以确定该区域的第一部分中的结构的性质(例如,上覆层的厚度); (4)平移结构或激发和探测激光束; 和(5)重复激励,检测和分析步骤以确定该区域的第二部分中的结构的属性。
    • 7. 发明授权
    • Method and device for measuring thin films and semiconductor substrates using reflection mode geometry
    • 使用反射模式几何测量薄膜和半导体衬底的方法和装置
    • US06795198B1
    • 2004-09-21
    • US09087141
    • 1998-05-28
    • Martin FuchsMatthew J. BanetKeith A. NelsonJohn A. Rogers
    • Martin FuchsMatthew J. BanetKeith A. NelsonJohn A. Rogers
    • G01B902
    • G01N21/1717G01B11/0666G01N29/2418G01N2291/0423
    • The invention provides both a method and apparatus that measures a property of a structure that includes at least one layer. The apparatus features a laser (e.g., a microchip laser, described below) that generates an optical pulse, and a diffractive mask that receives the optical pulse and diffracts it to generate at least two excitation pulses. An optical system, (e.g., an achromat lens pair) receives the optical pulses and spatially and temporally overlaps them on or in the structure to form an excitation pattern that launches an acoustic wave. The acoustic wave modulates a property of the structure, e.g., it generates a time-dependent “surface ripple” or modulates an optical property such as the sample's refractive index or absorption coefficient. Surface ripple is defined as a time-dependent change in the morphology of the surface; its peak-to-null amplitude is typically a few angstroms or less. The apparatus also includes a light source that produces a probe beam that reflects off the modulated property to generate a signal beam. An optical detection system receives the reflected signal beam and in response generates a light-induced electrical signal. An analyzer analyzes the signal to measure the property of the structure.
    • 本发明提供了一种测量包括至少一层的结构的性质的方法和装置。 该装置具有产生光脉冲的激光器(例如,下面描述的微芯片激光器),以及接收光脉冲并衍射以产生至少两个激励脉冲的衍射掩模。 光学系统(例如,消色差透镜对)接收光学脉冲,并且在结构中或结构中空间和时间上重叠它们以形成发射声波的激发图案。 声波调制结构的性质,例如,其产生时间依赖性的“表面纹波”或调制光学特性,例如样品的折射率或吸收系数。 表面波纹定义为表面形态的时间依赖性变化; 其峰到零幅度通常为几埃或更小。 该装置还包括产生探测光束的光源,其反射出调制的特性以产生信号光束。 光学检测系统接收反射的信号光束,并且响应于产生光诱导的电信号。 分析仪分析信号以测量结构的性质。
    • 10. 发明授权
    • Method and device for measuring the thickness of thin films near a sample's edge and in a damascene-type structure
    • 用于测量样品边缘和镶嵌型结构附近薄膜厚度的方法和装置
    • US06734982B2
    • 2004-05-11
    • US09795015
    • 2001-02-28
    • Matthew J. BanetMartin FuchsJohn A. Rogers
    • Matthew J. BanetMartin FuchsJohn A. Rogers
    • G01B1106
    • G01B11/0666
    • A method for measuring a structure that contains overlying and underlying films in a region where the overlying film's thickness rapidly decreases until the underlying film is exposed (e.g., an edge-exclusion structure). The method includes the steps of: (1) exciting acoustic modes in a first portion of the region with at least one excitation laser beam; (2) detecting the acoustic modes with a probe laser beam that is either reflected or diffracted to generate a signal beam; (3) analyzing the signal beam to determine a property of the structure (e.g., the thickness of the overlying layer) in the first portion of the region; (4) translating the structure or the excitation and probe laser beams; and (5) repeating the exciting, detecting, and analyzing steps to determine a property of the structure in a second portion of the region.
    • 一种用于测量在覆盖膜的厚度迅速减小直到底层膜暴露的区域(例如,边缘排除结构)中的覆盖和下层膜的结构的测量方法。 该方法包括以下步骤:(1)利用至少一个激发激光束激发该区域的第一部分中的声模; (2)用反射或衍射的探针激光束检测声学模式以产生信号光束; (3)分析信号光束以确定该区域的第一部分中的结构的性质(例如,上覆层的厚度); (4)平移结构或激发和探测激光束; 和(5)重复激励,检测和分析步骤以确定该区域的第二部分中的结构的属性。