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1. 发明授权

US09013684B2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置
公开(公告)号：US09013684B2
公开(公告)日：2015-04-21
申请号：US13556408
申请日：2012-07-24
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03F7/20 , G02B26/08 , G01M11/00 , G01N21/55
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
摘要翻译：微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。每个元件基于施加到元件的控制信号偏离入射光束。该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

2. 发明申请

US20120002185A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20120002185A1
公开(公告)日：2012-01-05
申请号：US13215616
申请日：2011-08-23
申请人： Markus Deguenther , Michael Patra , Andras G. Major
发明人： Markus Deguenther , Michael Patra , Andras G. Major
IPC分类号： G03B27/54
CPC分类号： G03F7/7085 , G02B26/0833 , G03F7/70116 , G03F7/70266 , G03F7/70591 , G03F7/706
摘要： A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.
摘要翻译：微光刻投影曝光装置包括可以由多个微镜形成的光学表面，以及被配置为测量与多个位置处的光学表面相关的参数的测量装置。测量装置包括具有多个照明构件的照明单元，每个具有光出射面。光学成像系统在其中布置至少两个光出射面的物平面与至少基本上与光学表面重合的像平面之间建立成像关系。检测器单元在与光学表面相互作用后测量光的性质，并且评估单元基于由检测器单元确定的特性来确定每个位置的表面相关参数。

3. 发明申请

US20100039629A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：用于在微观投影曝光装置的照明系统中监测多个反射镜阵列的方法和装置
公开(公告)号：US20100039629A1
公开(公告)日：2010-02-18
申请号：US12506364
申请日：2009-07-21
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.
摘要翻译：微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。检测仪器在光束偏离元件偏离后记录测量光束。评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

4. 发明申请

US20140233006A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20140233006A1
公开(公告)日：2014-08-21
申请号：US14255302
申请日：2014-04-17
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Manfred Maul , Johannes Eisenmenger , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Damian Fiolka , Andras G. Major , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Manfred Maul , Johannes Eisenmenger , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Damian Fiolka , Andras G. Major , Johannes Wangler , Michael Layh
IPC分类号： G03F7/20 , G01N21/55
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

5. 发明申请

US20120293784A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：用于在微观投影曝光装置的照明系统中监测多个反射镜阵列的方法和装置
公开(公告)号：US20120293784A1
公开(公告)日：2012-11-22
申请号：US13556408
申请日：2012-07-24
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
摘要翻译：微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。每个元件基于施加到元件的控制信号偏离入射光束。该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

6. 发明授权

US08339577B2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置
公开(公告)号：US08339577B2
公开(公告)日：2012-12-25
申请号：US12506364
申请日：2009-07-21
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G01C11/26 , G01N21/00 , G03B27/32 , G03B27/54 , G03B27/74
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.
摘要翻译：微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。检测仪器在光束偏离元件偏离后记录测量光束。评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

7. 发明授权

US08854604B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US08854604B2
公开(公告)日：2014-10-07
申请号：US13215616
申请日：2011-08-23
申请人： Markus Deguenther , Michael Patra , Andras G. Major
发明人： Markus Deguenther , Michael Patra , Andras G. Major
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20 , G02B26/08
CPC分类号： G03F7/7085 , G02B26/0833 , G03F7/70116 , G03F7/70266 , G03F7/70591 , G03F7/706
摘要： A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.
摘要翻译：微光刻投影曝光装置包括可以由多个微镜形成的光学表面，以及被配置为测量与多个位置处的光学表面相关的参数的测量装置。测量装置包括具有多个照明构件的照明单元，每个具有光出射面。光学成像系统在其中布置至少两个光出射面的物平面与至少基本上与光学表面重合的像平面之间建立成像关系。检测器单元在与光学表面相互作用后测量光的性质，并且评估单元基于由检测器单元确定的特性来确定每个位置的表面相关参数。

8. 发明申请

US20100103400A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：US20100103400A1
公开(公告)日：2010-04-29
申请号：US12632055
申请日：2009-12-07
申请人： Markus Deguenther , Andras G. Major , Anne Christine Andresen
发明人： Markus Deguenther , Andras G. Major , Anne Christine Andresen
IPC分类号： G03B27/72
CPC分类号： G03F7/70425 , G03F7/70116 , G03F7/70191 , G03F7/702
摘要： An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam deviating element. According to the disclosure an attenuation unit is provided which is configured to reduce the intensity of light, which is directed by any arbitrary beam deviating element (onto the pupil surface, by more than 50%. This makes it possible to reduce the intensity of light in the pupil surface that has been reflected by defective beam deviating elements.
摘要翻译：微光刻投影曝光装置的照明系统包括光瞳表面和单独驱动的光束偏离元件的布置。响应于施加到光束偏离元件的控制信号，每个光束偏离元件被配置为将光照射到其上的光瞳表面上的不同位置上。根据本公开，提供了一种衰减单元，其被配置为减少由任何任意的光束偏离元件（在瞳孔表面上）超过50％的光的强度，这使得可以降低光的强度在瞳孔表面已经被有缺陷的光束偏离元件反射。

9. 发明授权

US08773639B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US08773639B2
公开(公告)日：2014-07-08
申请号：US12632055
申请日：2009-12-07
申请人： Markus Deguenther , Andras G. Major , Anne Christine Andresen
发明人： Markus Deguenther , Andras G. Major , Anne Christine Andresen
IPC分类号： G03B27/72
CPC分类号： G03F7/70425 , G03F7/70116 , G03F7/70191 , G03F7/702
摘要： An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam deviating element. According to the disclosure an attenuation unit is provided which is configured to reduce the intensity of light, which is directed by any arbitrary beam deviating element (onto the pupil surface, by more than 50%. This makes it possible to reduce the intensity of light in the pupil surface that has been reflected by defective beam deviating elements.
摘要翻译：微光刻投影曝光装置的照明系统包括光瞳表面和单独驱动的光束偏离元件的布置。响应于施加到光束偏离元件的控制信号，每个光束偏离元件被配置为将光照射到其上的光瞳表面上的不同位置上。根据本公开，提供了一种衰减单元，其被配置为减少由任何任意的光束偏离元件（在瞳孔表面上）超过50％的光的强度，这使得可以降低光的强度在瞳孔表面已经被有缺陷的光束偏离元件反射。

10. 发明授权

US09046786B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US09046786B2
公开(公告)日：2015-06-02
申请号：US13604296
申请日：2012-09-05
申请人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
发明人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.
摘要翻译：微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。位移机构改变衍射光学元件的相互空间排列。在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。这使得可以以简单的方式生产连续可变的照明设置。

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