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    • 2. 发明授权
    • Method and apparatus for infrared scattering scanning near-field optical microscopy
    • 用于红外散射扫描近场光学显微镜的方法和装置
    • US08793811B1
    • 2014-07-29
    • US13835312
    • 2013-03-15
    • Craig PraterMarkus B. RaschkeSam Berweger
    • Craig PraterMarkus B. RaschkeSam Berweger
    • G01Q30/02
    • G01Q20/02G01Q30/02G01Q60/22
    • This invention involves measurement of optical properties of materials with sub-micron spatial resolution through infrared scattering scanning near field optical microscopy (s-SNOM). Specifically, the current invention provides substantial improvements over the prior art by achieving high signal to noise, high measurement speed and high accuracy of optical amplitude and phase. Additionally, it eliminates the need for an in situ reference to calculate wavelength dependent spectra of optical phase, or absorption spectra. These goals are achieved via improved asymmetric interferometry where the near field scattered light is interfered with a reference beam in an interferometer. The invention achieves dramatic improvements in background rejection by arranging a reference beam that is much more intense than the background scattered radiation. Combined with frequency selective demodulation techniques, the near-field scattered light can be efficiently and accurately discriminated from background scattered light. These goals are achieved via a range of improvements including a large dynamic range detector, careful control of relative beam intensities, and high bandwidth demodulation techniques.
    • 本发明涉及通过近场光学显微镜(s-SNOM)附近的红外散射扫描测量具有亚微米空间分辨率的材料的光学性质。 具体地,本发明通过实现高信噪比,高测量速度和高的光学幅度和相位精度来提供比现有技术更大的改进。 此外,它不需要原位参考来计算光学相位或吸收光谱的波长相关光谱。 这些目标通过改进的不对称干涉测量来实现,其中近场散射光被干涉仪中的参考光束干扰。 本发明通过布置比背景散射辐射强得多的参考光束来实现背景抑制的显着改进。 结合频率选择解调技术,可以高效,准确地区分近场散射光与背景散射光。 这些目标通过一系列改进实现,包括大型动态范围检测器,仔细控制相对光束强度和高带宽解调技术。