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1. 发明授权

US08859196B2 Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays 有权
标题翻译：用于高分辨率光刻合成DNA阵列的抗反射涂层
公开(公告)号：US08859196B2
公开(公告)日：2014-10-14
申请号：US13275521
申请日：2011-10-18
申请人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
发明人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
IPC分类号： C12Q1/00 , G03F7/09 , B82Y30/00 , C12Q1/68 , B01J19/00 , C40B40/06
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译：本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。

2. 发明申请

US20110003716A1 ANTIREFLECTIVE COATINGS FOR HIGH-RESOLUTION PHOTOLITHOGRAPHIC SYNTHESIS OF DNA ARRAY 有权
标题翻译： DNA阵列高分辨光谱合成的抗反射涂层
公开(公告)号：US20110003716A1
公开(公告)日：2011-01-06
申请号：US12832781
申请日：2010-07-08
申请人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
发明人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
IPC分类号： C40B50/18
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译：本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。

3. 发明授权

US07790389B2 Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays 有权
标题翻译：用于高分辨率光刻合成DNA阵列的抗反射涂层
公开(公告)号：US07790389B2
公开(公告)日：2010-09-07
申请号：US12014879
申请日：2008-01-16
申请人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
发明人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
IPC分类号： C12Q1/68
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译：本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。

4. 发明申请

US20120035083A1 Antireflective Coatings for High-Resolution Photolithographic Synthesis of DNA Array 有权
标题翻译：用于高分辨率光刻合成DNA阵列的抗反射涂层
公开(公告)号：US20120035083A1
公开(公告)日：2012-02-09
申请号：US13275521
申请日：2011-10-18
申请人： Mark O. Trulson , Martin J. Goldberg , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Richard P. Rava , Dana Truong
发明人： Mark O. Trulson , Martin J. Goldberg , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Richard P. Rava , Dana Truong
IPC分类号： C40B50/18
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译：本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。

5. 发明授权

US08114584B2 Antireflective coatings for high-resolution photolithographic synthesis of DNA array 有权
标题翻译：用于高分辨率光刻合成DNA阵列的抗反射涂层
公开(公告)号：US08114584B2
公开(公告)日：2012-02-14
申请号：US12832781
申请日：2010-07-08
申请人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Rich P. Rava , Martin J. Goldberg
发明人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Rich P. Rava , Martin J. Goldberg
IPC分类号： C12Q1/00
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译：本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。

6. 发明授权

US07332273B2 Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays 有权
标题翻译：用于高分辨率光刻合成DNA阵列的抗反射涂层
公开(公告)号：US07332273B2
公开(公告)日：2008-02-19
申请号：US10177169
申请日：2002-06-20
申请人： Mark Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Troung
发明人： Mark Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Troung
IPC分类号： C12Q1/68
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support; derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译：本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。本发明还提供了使用光引导合成在衬底上形成聚合物阵列的方法，该衬底具有在固体支持体上具有一个或多个电介质涂层的第一层; 通过使第一层与硅烷化试剂接触来衍生第一层，以及设置在所述第一层上的第二层，其中第二层包括用光不稳定保护基团保护的官能团。

7. 发明授权

US6150147A Biological array fabrication methods with reduction of static charge 失效
标题翻译：生物阵列制造方法减少静电荷
公开(公告)号：US6150147A
公开(公告)日：2000-11-21
申请号：US19881
申请日：1998-02-06
申请人： Martin J. Goldberg , Mel Yamamoto , Glenn H. McGall , Steven J. Woodman , Eric Spence , Lisa T. Kajisa
发明人： Martin J. Goldberg , Mel Yamamoto , Glenn H. McGall , Steven J. Woodman , Eric Spence , Lisa T. Kajisa
IPC分类号： G01N33/53 , B01J19/00 , C07B61/00 , C07H21/00 , C07K1/04 , C12M1/00 , C12N15/09 , C12Q1/68 , C40B40/06 , C40B40/18 , C40B60/14 , G01N33/566 , G01N37/00 , C12N13/00 , H01G3/00
CPC分类号： B82Y30/00 , B01J19/0046 , C07H21/00 , C07K1/045 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00608 , B01J2219/00612 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00745 , C07B2200/11 , C40B40/06 , C40B40/18 , C40B60/14 , Y02P20/55
摘要： The present invention provides modified methods and apparatus for the preparation of arrays of material wherein each array includes a preselected collection of polymers, small molecules or inorganic materials associated with a surface of a substrate. The methods of the invention provide for modifications to general apparatus, flow cell geometries and solutions used in array fabrication.
摘要翻译：本发明提供了用于制备材料阵列的改进方法和装置，其中每个阵列包括与基底表面相关联的聚合物，小分子或无机材料的预选集合。本发明的方法提供对在阵列制造中使用的一般装置，流动池几何形状和解决方案的修改。

8. 发明授权

US08067578B2 Substrate preparation process 失效
标题翻译：基材制备工艺
公开(公告)号：US08067578B2
公开(公告)日：2011-11-29
申请号：US12634475
申请日：2009-12-09
申请人： Martin J Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin J Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C07H21/00 , C07H21/02 , C07H21/04 , C12Q1/68
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译：本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。

9. 发明授权

US08309496B2 Methods for photolithographic synthesis of polymer arrays utilizing anti-reflective coatings 失效
标题翻译：使用抗反射涂层的光刻合成聚合物阵列的方法
公开(公告)号：US08309496B2
公开(公告)日：2012-11-13
申请号：US13273399
申请日：2011-10-14
申请人： Martin J. Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin J. Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C40B50/00 , C07H21/00 , C40B40/00 , C12Q1/68 , G01N15/06 , C07H21/02
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译：本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。

10. 发明授权

US06566515B1 Photocleavable protecting groups and methods for their use 有权
标题翻译：可透光保护组及其使用方法
公开(公告)号：US06566515B1
公开(公告)日：2003-05-20
申请号：US09525045
申请日：2000-03-14
申请人： Glenn H. McGall , Ngo Q. Nam , Richard P. Rava
发明人： Glenn H. McGall , Ngo Q. Nam , Richard P. Rava
IPC分类号： C07H2104
CPC分类号： C07H21/00 , B01J2219/00432 , C07B2200/11 , C07H19/10 , C07H19/20 , C07H19/207 , C07K1/061 , C40B40/04 , C40B50/14 , C40B60/14 , G01N33/54353 , Y02P20/55
摘要： Novel compounds are provided which are useful as linking groups in chemical synthesis, preferably in the solid phase synthesis of oligonucleotides and polypeptides. These compounds are generally photolabile and comprise protecting groups which can be removed by photolysis to unmask a reactive group. The protecting group has the general formula Ar—C(R1)(R2)—O—C(O)— wherein: Ar is an optionally substituted fused polycyclic aryl or heteroaromatic group or a vinylogous derivative thereof; R1 and R2 are independently H, optionally substituted alkyl, alkenyl or alkynyl, optionally substituted aryl or optionally substituted heteroaromatic, or a vinylogous derivative of the foregoing; and X is a leaving group, a chemical fragment linked to Ar—C(R1)(R2)—O—C(O)— via a heteroatom, or a solid support; provided that when Ar is 1-pyrenyl and R1 and R2 are H, X is not linked to Ar—C(R1)(R2)—O—C(O)— via a nitrogen atom. Preferred embodiments are those in which Ar is a fused polycyclic aromatic hydrocarbon and in which the substituents on Ar, R1 and R2 are electron donating groups. A particularly preferred protecting group is the “PYMOC” protecting group, pyrenylmethyloxycarbonyl, where Ar is pyrenyl and R1 and R2 are H. Also provided is a method of forming, from component molecules, a plurality of compounds on a support, each compound occupying a separate predefined region of the support, using the protected compounds described above.
摘要翻译：提供了新的化合物，其可用作化学合成中的连接基团，优选在寡核苷酸和多肽的固相合成中。这些化合物通常是光不稳定的并且包括可以通过光解去除以揭示反应性基团的保护基团。保护基具有通式Ar-C（R 1）（R 2）-OC（O） - ，其中：Ar是任选取代的稠合多环芳基或杂芳族基团或其杂原子衍生物; R 1和R 2独立地是H，烷基，烯基或炔基，任选取代的芳基或任选取代的杂芳族，或前述的维果衍生物; 和X是离去基团，通过杂原子与固体载体连接至Ar-C（R 1）（R 2）-O-C（O） - 的化学片段; 条件是当Ar为1-芘基且R 1和R 2为H时，X不能通过氮原子与Ar-C（R 1）（R 2）-O-C（O） - 连接。优选的实施方案是其中Ar是稠合多环芳烃并且其中Ar，R 1和R 2上的取代基是给电子基团的实施方案。特别优选的保护基是“PYMOC”保护基团，芘基甲氧基羰基，其中Ar是芘基，R 1和R 2是H.另外提供了一种从成分分子在载体上形成多种化合物的方法，使用上述保护的化合物分离预定区域的载体。

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