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1. 发明授权

US06363166B1 Automated photomask inspection apparatus 有权
标题翻译：自动光掩模检测仪
公开(公告)号：US06363166B1
公开(公告)日：2002-03-26
申请号：US09539672
申请日：2000-03-30
申请人： Mark Joseph Wihl , Tao-Yi Fu , Marek Zywno , Damon Floyd Kvamme , Michael E. Fein
发明人： Mark Joseph Wihl , Tao-Yi Fu , Marek Zywno , Damon Floyd Kvamme , Michael E. Fein
IPC分类号： G06K900
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676
摘要： An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.
摘要翻译：一种自动化光掩模检查装置，包括用于在XY平面中的蛇形路径中传送被测试的基板的XY状态（12），包括激光器（30），透射光检测器（34）的光学系统（16），反射光检测器（36），限定参考光束路径的光学元件和激光器，衬底和检测器之间的照明光束路径，以及用于相对于照射和参考光束往复扫描照射和参考光束的声光束扫描器（40,42）基板表面，以及用于控制平台和光学系统的操作以及用于解释和存储由检测器输出的信号的电子控制，分析和显示系统。该设备可以以管芯到管芯的比较模式或管芯到数据库模式工作。

2. 发明授权

US06584218B2 Automated photomask inspection apparatus 有权
公开(公告)号：US06584218B2
公开(公告)日：2003-06-24
申请号：US10003166
申请日：2001-11-14
申请人： Mark Joseph Wihl , Tao-Yi Fu , Marek Zywno , Damon Floyd Kvamme , Michael E. Fein
发明人： Mark Joseph Wihl , Tao-Yi Fu , Marek Zywno , Damon Floyd Kvamme , Michael E. Fein
IPC分类号： G06K900
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676
摘要： An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.

3. 发明授权

US6052478A Automated photomask inspection apparatus 失效
公开(公告)号：US6052478A
公开(公告)日：2000-04-18
申请号：US727985
申请日：1996-10-09
申请人： Mark Joseph Wihl , Tao-Yi Fu , Marek Zywno , Damon Floyd Kvamme , Michael E. Fein
发明人： Mark Joseph Wihl , Tao-Yi Fu , Marek Zywno , Damon Floyd Kvamme , Michael E. Fein
IPC分类号： G01B11/30 , G01N21/93 , G01N21/956 , G03F1/84 , G06K9/00 , G06T7/00 , H01L21/66
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676
摘要： An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.

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