会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Method for detecting lithographically significant defects on reticles
    • 在光罩上检测光刻显着缺陷的方法
    • US07873204B2
    • 2011-01-18
    • US11622432
    • 2007-01-11
    • Mark J. WihlYalin XiongLih-Huah Yiin
    • Mark J. WihlYalin XiongLih-Huah Yiin
    • G06K9/00
    • G03F1/84
    • A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are processed together to recover a band limited mask pattern associated with the photomask. A model of an exposure lithography system for chip fabrication is adapted to accommodate the band limited mask pattern as an input which is input into the model to obtain an aerial image of the mask pattern that is processed with a photoresist model yielding a resist-modeled image. The resist-modeled image is used to determine if the photomask has lithographically significant defects.
    • 用于识别光刻显着缺陷的方法。 光掩模被照亮以产生经由检查工具成像的掩模版的不同参数的图像。 示例性参数包括传输强度图像和反射强度图像。 一起处理图像以恢复与光掩模相关联的带限制掩模图案。 用于芯片制造的曝光光刻系统的模型适于适应带限制掩模图案作为输入到输入到模型中以获得用光致抗蚀剂模型处理的掩模图案的空间图像,产生抗蚀剂建模图像 。 使用抗蚀剂建模的图像来确定光掩模是否具有光刻的显着缺陷。
    • 2. 发明申请
    • METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES
    • 用于检测反应物上的重要缺陷的方法
    • US20080170773A1
    • 2008-07-17
    • US11622432
    • 2007-01-11
    • Mark J. WihlYalin XiongLih-Huah Yiin
    • Mark J. WihlYalin XiongLih-Huah Yiin
    • G06K9/00
    • G03F1/84
    • A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are processed together to recover a band limited mask pattern associated with the photomask. A model of an exposure lithography system for chip fabrication is adapted to accommodate the band limited mask pattern as an input which is input into the model to obtain an aerial image of the mask pattern that is processed with a photoresist model yielding a resist-modeled image. The resist-modeled image is used to determine if the photomask has lithographically significant defects.
    • 用于识别光刻显着缺陷的方法。 光掩模被照亮以产生经由检查工具成像的掩模版的不同参数的图像。 示例性参数包括传输强度图像和反射强度图像。 一起处理图像以恢复与光掩模相关联的带限制掩模图案。 用于芯片制造的曝光光刻系统的模型适于适应带限制掩模图案作为输入到输入到模型中以获得用光致抗蚀剂模型处理的掩模图案的空间图像,产生抗蚀剂建模图像 。 使用抗蚀剂建模的图像来确定光掩模是否具有光刻显着的缺陷。
    • 4. 发明授权
    • Reticle inspection system
    • 标线检查系统
    • US4926489A
    • 1990-05-15
    • US104740
    • 1987-10-05
    • Donald L. DanielsonMark J. WihlDavid A. Joseph
    • Donald L. DanielsonMark J. WihlDavid A. Joseph
    • G01N21/956G03F1/84G06T7/00
    • G06K9/00G01N21/95607G03F1/84G06T7/001G06T7/0024G01N2021/95676G06K2209/19G06T2207/30148
    • An automatic inspection system including an illuminator for illuminating a reticle or photomask to be inspected, while optically projecting a magnified image of the reticle or photomask onto a plurality of detector elements. A carriage assembly moves the object at a constant velocity to allow the detector elements to sequentially view the entire surface to be inspected. The detector elements are responsive to the intensity of light incident thereupon and are periodically scanned to obtain a two-dimensional measured representation of the object. A database adaptor formulates a two-dimensional representation from the design database description corresponding to the scanned object simultaneously and in synchronism with the scanning of the photomask or reticle. The measured and database adapted representation of the scanned object are input to a signal processor for alignment and defect detection. While the representations are shifted through a memory, an alignment circuit dynamically measures and corrects for misalignment between the representations, so that a defect detector can effectively compare the representations for defects. Additional correction of misalignment between the representations is obtained by modulating the size of the measured representation as detected by the detector elements. At the operator's option, a second measured image of a multi-cell reticle or photomask may be used for comparison as a substitute for the database representation.
    • 一种自动检查系统,包括用于照亮要检查的掩模版或光掩模的照明器,同时将掩模版或光掩模的放大图像光学投影到多个检测器元件上。 托架组件以恒定速度移动物体,以允许检测器元件依次观察要检查的整个表面。 检测器元件响应于其上入射的光的强度并被周期性扫描以获得物体的二维测量表示。 数据库适配器同时和与光掩模或掩模版的扫描同步地从与扫描对象相对应的设计数据库描述中形成二维表示。 扫描对象的测量和数据库适配表示被输入到用于对准和缺陷检测的信号处理器。 当表示通过存储器移位时,对准电路动态地测量和校正表示之间的未对准,使得缺陷检测器可以有效地比较缺陷的表示。 通过调制由检测器元件检测到的测量表示的大小来获得表示之间的未对准的附加校正。 在操作者的选择下,可以使用多单元掩模版或光掩模的第二测量图像作为数据库表示的替代来进行比较。
    • 5. 发明授权
    • Automatic photomask inspection system having image enhancement means
    • 具有图像增强装置的自动光掩模检查系统
    • US4633504A
    • 1986-12-30
    • US625903
    • 1984-06-28
    • Mark J. Wihl
    • Mark J. Wihl
    • G01B11/30G01B11/24G01B11/245G01N21/956G03F1/84G06T1/00G06T5/20G06T7/00H01L21/027H01L21/30H01L21/66H04N7/18G06K9/40
    • G03F1/84G06T5/003G06T5/20G06T7/0004G06T2207/30148
    • Optical inspection apparatus for detecting defects in a visually perceptible pattern including image acquistion means for inspecting the pattern on a pixel-by-pixel basis, developing digital data signals corresponding to each pixel and feeding the signals so developed to an imaging enhancement means. The imaging enhancement means compensates for equipment related degradations in the images and converts the digital data signal value corresponding to each pixel into a corrected signal value by operating on the digital data signal with a two dimensional finite impulse response filter. The corrected signal values of the image enhancement means are received by a defect detection means which evaluates the signal values for defects in the pattern. Any defects so determined are recorded and/or displayed on data recording means.
    • 用于检测视觉上可察觉图案中的缺陷的光学检查装置,包括用于逐像素地检查图案的图像获取装置,显影对应于每个像素的数字数据信号,并将如此显影的信号馈送到成像增强装置。 成像增强装置补偿图像中与设备有关的劣化,并且通过利用二维有限脉冲响应滤波器对数字数据信号进行操作,将与每个像素对应的数字数据信号值转换为校正信号值。 图像增强装置的校正信号值由缺陷检测装置接收,该缺陷检测装置对图案中的缺陷的信号值进行评估。 如此确定的任何缺陷将被记录和/或显示在数据记录装置上。
    • 6. 发明授权
    • Automatic system and method for inspecting hole quality
    • 自动检测孔质量的系统和方法
    • US4555798A
    • 1985-11-26
    • US505848
    • 1983-06-20
    • William H. Broadbent, Jr.Steve BuchholzPeter EldredgeMark J. Wihl
    • William H. Broadbent, Jr.Steve BuchholzPeter EldredgeMark J. Wihl
    • G01N21/956G06T7/00G06K9/60
    • G06T7/0008G01N21/95607G06T7/604G06T2207/10056G06T2207/30148
    • An automatic inspection system for inspecting holes in a mask including carriage means 30, illumination means 44, optical means 48, photosensitive detector means 46, and signal processing means 56. The mask 34 to be inspected is positioned by the carriage means in a horizontal plane. The optical means projects a focused image of a portion of the mask onto the photosensitive detector means. Photodiodes in the detector means are responsive to light from the illumination means that is transmitted through the holes in the mask. The signal processing means scans the outputs of the photodiodes and stores in memory a digital representation of the mask. The signal processing means performs inspection measurements and comparison tests. A smoothness checker circuit 240 measures the local radius of curvature of each hole at several places and compares the measurements to predetermined curvature limits to detect nicks and sharp protrusion defects. An area check circuit 246 measures the area of the hole and compares it to predetermined area limits. A diameter check circuit 244 measures the diameter of the hole in two dimensions and compares it to predetermined diameter limits. If either the hole area or the hole diameter is outside their respective limits, a hole size defect is indicated. Means are also provided for locating completely blocked, mispositioned or unintended holes by comparing detected information to a data base.
    • 用于检查掩模中的孔的自动检查系统,包括托架装置30,照明装置44,光学装置48,光敏检测装置46和信号处理装置56.待检查的掩模34由托架装置定位在水平面 。 光学装置将一部分掩模的聚焦图像投射到光敏检测器装置上。 检测器装置中的光电二极管响应来自照射装置的光,透射通过掩模中的孔。 信号处理装置扫描光电二极管的输出并在存储器中存储掩模的数字表示。 信号处理装置执行检查测量和比较测试。 平滑度检查器电路240测量几个位置处的每个孔的局部曲率半径,并将测量值与预定的曲率极限进行比较,以检测刻痕和尖锐的突出缺陷。 区域检查电路246测量孔的面积并将其与预定面积限制进行比较。 直径检查电路244测量孔的直径,并将其与预定的直径限制进行比较。 如果孔面积或孔径都在其各自的极限之外,则表示孔尺寸缺陷。 还提供了用于通过将检测到的信息与数据库进行比较来定位完全阻塞,错位或非预期的孔的手段。
    • 9. 发明授权
    • Photomask inspection apparatus and method using corner comparator defect
detection algorithm
    • 光掩模检查装置及方法采用拐角比较器缺陷检测算法
    • US4532650A
    • 1985-07-30
    • US494762
    • 1983-05-12
    • Tim S. WihlMark J. Wihl
    • Tim S. WihlMark J. Wihl
    • G03F1/84G06T7/00G06K9/00
    • G03F1/84G06T7/001G06T2207/30148
    • Defect detection apparatus including a mechanical and optical system for scanning duplicate areas of a photomask to be inspected, electronic means for converting the optically scanned information to digitized form, memory for storing such information, and means for comparing information obtained from one inspected area to the other inspected area to determine differences therebetween, such differences being classified as defects. The detection is accomplished using a vector gradient within a matrix technique to develop candidate and cancellor information which is then logically manipulated to qualify the data obtained from each pixel matrix and then, after qualification, is used to determine whether or not a defect has been detected. The subject invention has particular application to the detection of defects occurring at pattern corners within the inspected photomask and is specifically directed to overcoming difficulties previously encountered in detecting such defects.
    • 缺陷检测装置,包括用于扫描要检查的光掩模的重复区域的机械和光学系统,用于将光学扫描信息转换为数字化形式的电子装置,用于存储此类信息的存储器,以及用于将从一个检查区域获得的信息与 其他检查区域以确定其间的差异,这种差异被分类为缺陷。 使用矩阵技术内的向量梯度来完成检测,以开发候选和取消信息,然后在逻辑上操纵它们以对从每个像素矩阵获得的数据进行限定,然后在鉴定之后,确定是否检测到缺陷 。 本发明特别适用于检测在检查的光掩模内的图案角落处发生的缺陷,并且具体涉及克服先前在检测这些缺陷中遇到的困难。