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1. 发明授权

US08826851B2 Cover for a roller 有权
标题翻译：盖一个滚筒
公开(公告)号：US08826851B2
公开(公告)日：2014-09-09
申请号：US12502615
申请日：2009-07-14
申请人： Mark Andreas , Joerg Kerschbaumer , Stefan Schneider , Arno Zindel
发明人： Mark Andreas , Joerg Kerschbaumer , Stefan Schneider , Arno Zindel
IPC分类号： B05C13/02 , H01L31/18 , C23C16/458 , C23C16/54
CPC分类号： H01L31/18 , C23C16/4583 , C23C16/54
摘要： A cover for a roller having at least one roller (2) for transporting a substrate (1) in a deposition system and at least one cover means (6), wherein the roller is retractable away from the substrate and the cover means is adapted for at least partly covering the retracted roller against contamination by a substance present in the deposition system. The cover for a roller has the advantage that the uptime of the deposition system is increased.
摘要翻译：一种用于辊子的盖子，其具有至少一个用于在沉积系统中传送基底（1）的辊（2）和至少一个盖装置（6），其中所述辊可从所述基底伸出，并且所述盖装置适于至少部分地覆盖缩回的辊子以抵抗沉积系统中存在的物质的污染。辊子的盖子具有增加沉积系统的正常运行时间的优点。

2. 发明申请

US20100016136A1 COVER FOR A ROLLER 有权
标题翻译：一个滚子的盖子
公开(公告)号：US20100016136A1
公开(公告)日：2010-01-21
申请号：US12502615
申请日：2009-07-14
申请人： Mark Andreas , Joerg Kerschbaumer , Stefan Schneider , Arno Zindel
发明人： Mark Andreas , Joerg Kerschbaumer , Stefan Schneider , Arno Zindel
IPC分类号： F16C13/00
CPC分类号： H01L31/18 , C23C16/4583 , C23C16/54
摘要： A cover for a roller having at least one roller (2) for transporting a substrate (1) in a deposition system and at least one cover means (6), wherein the roller is retractable away from the substrate and the cover means is adapted for at least partly covering the retracted roller against contamination by a substance present in the deposition system. The cover for a roller has the advantage that the uptime of the deposition system is increased.
摘要翻译：一种用于辊子的盖子，其具有至少一个用于在沉积系统中传送基底（1）的辊（2）和至少一个盖装置（6），其中所述辊可从所述基底伸出，并且所述盖装置适于至少部分地覆盖缩回的辊子以抵抗沉积系统中存在的物质的污染。辊子的盖子具有增加沉积系统的正常运行时间的优点。

3. 发明授权

US08512452B2 Hot-trap assembly for trapping unreacted gas by-products 失效
标题翻译：用于捕获未反应的气体副产物的热阱组件
公开(公告)号：US08512452B2
公开(公告)日：2013-08-20
申请号：US13059855
申请日：2009-06-15
申请人： Tobias Fischer , Stefan Schneider , Hagen Göttlich , Kavreet Bhangu , Benjamin Vogler , Christoph Widmeier , Arno Zindel
发明人： Tobias Fischer , Stefan Schneider , Hagen Göttlich , Kavreet Bhangu , Benjamin Vogler , Christoph Widmeier , Arno Zindel
IPC分类号： B01D45/00
CPC分类号： C23C16/4412
摘要： The present invention provides a hot-trap device (1) comprising an enclosure (2) with at least one inlet (3), at least one outlet (5) at least one heating means (7) and at least one collector means (10) for the conversion of reaction by-products into products, wherein the collector means is arranged within the enclosure between the inlet and the outlet has a diameter that substantially matches the diameter of the enclosure and has at least one opening (18).
摘要翻译：本发明提供一种热阱装置（1），其包括具有至少一个入口（3），至少一个出口（5）至少一个加热装置（7）和至少一个收集器装置（10）的外壳（2）），用于将反应副产物转化成产物，其中收集器装置布置在入口和出口之间的外壳内，其直径基本上与外壳的直径相匹配并具有至少一个开口（18）。

4. 发明申请

US20110252969A1 HOT-TRAP ASSEMBLY FOR TRAPPING UNREACTED GAS BY- PRODUCTS 失效
标题翻译：用于跟踪无关气体副产品的热带组件
公开(公告)号：US20110252969A1
公开(公告)日：2011-10-20
申请号：US13059855
申请日：2009-06-15
申请人： Tobias Fischer , Stefan Schneider , Hagen Gottlich , Kavreet Bhangu , Benjamin Vogler , Christoph Widmeier , Arno Zindel
发明人： Tobias Fischer , Stefan Schneider , Hagen Gottlich , Kavreet Bhangu , Benjamin Vogler , Christoph Widmeier , Arno Zindel
IPC分类号： B01D45/08 , C23C16/00
CPC分类号： C23C16/4412
摘要： The present invention provides a hot-trap device (1) comprising an enclosure (2) with at least one inlet (3), at least one outlet (5) at least one heating means (7) and at least one collector means (10) for the conversion of reaction by-products into products, wherein the collector means is arranged within the enclosure between the inlet and the outlet has a diameter that substantially matches the diameter of the enclosure and has at least one opening (18).
摘要翻译：本发明提供一种热阱装置（1），其包括具有至少一个入口（3），至少一个出口（5）至少一个加热装置（7）和至少一个收集器装置（10）的外壳（2）），用于将反应副产物转化成产物，其中收集器装置布置在入口和出口之间的外壳内，其直径基本上与外壳的直径相匹配并具有至少一个开口（18）。

5. 发明授权

US07556692B2 Device for coating a continuous web of material 失效
标题翻译：用于涂覆连续纤维网的装置
公开(公告)号：US07556692B2
公开(公告)日：2009-07-07
申请号：US10552822
申请日：2004-03-11
申请人： Rolf Metzger , Bruno Holtmann , Arno Zindel
发明人： Rolf Metzger , Bruno Holtmann , Arno Zindel
IPC分类号： B05C3/02
CPC分类号： B05C5/008 , G03C1/74 , Y10S118/04
摘要： Known devices for coating a continuous web of material (13) comprise a casting container (1) which consists of a casting surface (8) for the discharge of the coating material in a free falling curtain (C); at least one distribution chamber (2) which extends in a transversal manner in relation to the direction of circulation of the web of material and which comprises a supply line (10) for the coating material and an discharge slit (9) which discharges onto the casting surface (8), and two lateral guiding elements (7, 12) which extend in a downward direction for the edges of the curtain (C). According to the invention, the lateral guiding elements (7, 12) are curved on the upper end thereof corresponding to the course of the casting surface, (8) whereon (8) the lateral guiding elements are fixed in an adjustable transversal manner and the coating material supply line (10) leads into the valve chamber (2) in the central area of the casting container (1).
摘要翻译：用于涂覆连续的材料网（13）的已知装置包括铸造容器（1），其由用于在自由落下的帘幕（C）中排出涂层材料的铸造表面（8）组成; 至少一个分配室（2），其相对于所述材料幅材的循环方向以横向方式延伸，并且包括用于所述涂覆材料的供应管线（10）和排出狭缝（9），所述排出狭缝（9）铸造表面（8）和两个侧向引导元件（7,12），其沿帘幕（C）的边缘向下延伸。根据本发明，横向引导元件（7,12）在其对应于铸造表面的过程的上端弯曲，（8）其中（8）横向引导元件以可调横向的方式固定，并且涂料供应管线（10）进入铸造容器（1）的中心区域中的阀室（2）。

6. 发明申请

US20080213477A1 INLINE VACUUM PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATES THEREIN 审中-公开
标题翻译：在线真空处理装置及其处理基板的方法
公开(公告)号：US20080213477A1
公开(公告)日：2008-09-04
申请号：US12040292
申请日：2008-02-29
申请人： Arno Zindel , Markus Poppeller , Dmitry Zimin , Hansjorg Kuhn , Jorg Kerschbaumer
发明人： Arno Zindel , Markus Poppeller , Dmitry Zimin , Hansjorg Kuhn , Jorg Kerschbaumer
IPC分类号： C23C16/00
CPC分类号： C23C14/568 , C23C14/541 , C23C16/54
摘要： An inline vacuum processing apparatus for processing of substrates in vacuum comprises at least one load-lock chamber, at least two subsequent deposition chambers to be operated with essentially the same set of coating parameters and at least one unload-lock chamber plus means for transferring, post-processing and/or handling substrates through and in the various chambers. A method for depositing a thin film on a substrate in such processing system comprises the steps of introducing a first substrate into a load-lock chamber, lowering the pressure in said chamber; transferring the substrate into a first deposition chamber; depositing a layer of a first material on said first substrate using a first set of coating parameters; transferring said first substrate into a second, subsequent deposition chamber of said inline system without breaking vacuum and depositing a further layer of said first material on said first substrate using substantially the same set of parameters. Simultaneously to step f) a second substrate is being treated in said inline vacuum system according to step d).
摘要翻译：用于在真空中处理基板的在线真空处理设备包括至少一个装载锁定室，至少两个随后的沉积室，其基本上具有相同的涂层参数组，以及至少一个卸载锁定室加装置，后处理和/或处理基板通过和在各个室中。一种在这种处理系统中在衬底上沉积薄膜的方法包括以下步骤：将第一衬底引入加载锁定室，降低所述腔室中的压力; 将衬底转移到第一沉积室中; 使用第一组涂层参数在所述第一衬底上沉积第一材料层; 将所述第一衬底转移到所述在线系统的第二后续沉积室中，而不会破坏真空并且使用基本上相同的参数集将所述第一材料的另一层沉积在所述第一衬底上。在步骤f）的同时，根据步骤d）在所述在线真空系统中处理第二衬底。

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