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    • 2. 发明申请
    • PHASE MASKS FOR USE IN HOLOGRAPHIC DATA STORAGE
    • 相位掩码用于全息数据存储
    • US20100091631A1
    • 2010-04-15
    • US12639821
    • 2009-12-16
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • G11B7/00
    • G02F1/292G02F1/13363G02F2001/133565G03H1/02G03H1/16G03H2001/0224G03H2223/13G11B7/0065G11B7/128G11B7/1369
    • A spatial light modulator (SLM) having a phase mask that is provided as an internal component thereof. The phase mask can be provided as a multilevel surface of relatively higher index of refraction material on an inner surface of a transmissive cover window or as a separate transmissive window between the cover window and the pixels of the SLM. If the phase mask is to be used with a liquid crystal SLM, then it may be desirable to planarize the surface of the cover window contacting the liquid crystal by providing a layer of relatively lower index of refraction material adjacent the multilevel surface. The phase mask can also be provided on the transmissive cover window by patterned ion deposition, exposing patterned light to a photopolymeric material, or in some other suitable fashion. Arranging for the pixel electrodes to be at one of multiple levels rather than lying in an exactly planar relationship can also effectively create the phase mask.
    • 具有作为其内部部件提供的相位掩模的空间光调制器(SLM)。 相位掩模可以被提供为在透射盖窗的内表面上的相对较高的折射率材料的多层表面,或者作为在窗口窗口和SLM的像素之间的单独透射窗口。 如果相位掩模与液晶SLM一起使用,则可能需要通过提供相邻较低折射率材料层与多层表面相邻来平坦化与液晶接触的盖窗的表面。 相位掩模也可以通过图案化离子沉积在透射覆盖窗口上提供,将图案化光曝光到光聚合物材料上,或以某种其它合适的方式。 将像素电极排列成多个电平中的一个而不是处于精确的平面关系,也可以有效地产生相位掩模。
    • 3. 发明授权
    • Phase masks for use in holographic data storage
    • 用于全息数据存储的相位掩模
    • US07656768B2
    • 2010-02-02
    • US11046197
    • 2005-01-27
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • G11B7/00
    • G02F1/292G02F1/13363G02F2001/133565G03H1/02G03H1/16G03H2001/0224G03H2223/13G11B7/0065G11B7/128G11B7/1369
    • A spatial light modulator (SLM) having a phase mask that is provided as an internal component thereof. The phase mask can be provided as a multilevel surface of relatively higher index of refraction material on an inner surface of a transmissive cover window or as a separate transmissive window between the cover window and the pixels of the SLM. If the phase mask is to be used with a liquid crystal SLM, then it may be desirable to planarize the surface of the cover window contacting the liquid crystal by providing a layer of relatively lower index of refraction material adjacent the multilevel surface. The phase mask can also be provided on the transmissive cover window by patterned ion deposition, exposing patterned light to a photopolymeric material, or in some other suitable fashion. Arranging for the pixel electrodes to be at one of multiple levels rather than lying in an exactly planar relationship can also effectively create the phase mask.
    • 具有作为其内部部件提供的相位掩模的空间光调制器(SLM)。 相位掩模可以被提供为在透射盖窗的内表面上的相对较高的折射率材料的多层表面,或者作为在窗口窗口和SLM的像素之间的单独透射窗口。 如果相位掩模与液晶SLM一起使用,则可能需要通过提供相邻较低折射率材料层与多层表面相邻来平坦化与液晶接触的盖窗的表面。 相位掩模也可以通过图案化离子沉积在透射覆盖窗口上提供,将图案化光曝光到光聚合物材料上,或以某种其它合适的方式。 将像素电极排列成多个电平中的一个而不是处于精确的平面关系,也可以有效地产生相位掩模。
    • 5. 发明授权
    • Diffractive light modulator
    • 衍射光调制器
    • US5182665A
    • 1993-01-26
    • US578647
    • 1990-09-07
    • Michael J. O'CallaghanMark A. Handschy
    • Michael J. O'CallaghanMark A. Handschy
    • G02F1/141G02F1/29
    • G02F1/292G02F1/141G02F2201/124G02F2203/24
    • An arrangement (apparatus and method) for selectively modulating incident unpolarized light passing through a birefringent material, such as ferroelectric crystal. The apparatus includes a plate having one or more birefringent layers. The birefringent layer has an optic axis selectably set in a first orientation and a second orientation. A switching means controls the optical axis state of voltages to the areas of the birefringent layer. Light having passed through the birefringent layer at locations having the first orientation have a different phase from, and same polarization as, light having passed through locations with the second orientation, independent of a polarization state of the incident light. As a result, the birefringent material has a uniform state at locations where the corresponBACKGROUND OF THE INVENTIONGovernment Contract ClauseThis invention was made with Government support un contract F29601-89-C-0075 awarded by the Department of the Air Force. The Government may have certain rights in this invention.
    • 用于选择性地调制通过诸如铁电晶体的双折射材料的入射非偏振光的装置(装置和方法)。 该装置包括具有一个或多个双折射层的板。 双折射层具有可选择地设置在第一取向和第二取向的光轴。 开关装置控制双折射层的区域的电压的光轴状态。 在具有第一取向的位置处通过双折射层的光与入射光的偏振状态无关,具有与通过具有第二取向的位置的光不同的相位和相同的偏振。 结果,双折射材料在第一和第二区域之间的相应光轴平行的位置处具有均匀的状态,并且由穿过具有第一取向的光与具有第一取向的光之间的相互作用产生的衍射状态和具有 穿过具有第二方向的区域。 该装置对于反射调制器,多层调制器或偏振保存调制器是有效的,并且具有用于强度调制,模糊调制和波束转向的应用。
    • 6. 发明授权
    • Phase masks for use in holographic data storage
    • 用于全息数据存储的相位掩模
    • US08107344B2
    • 2012-01-31
    • US12639821
    • 2009-12-16
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • Mark A. HandschyMichael J. O'CallaghanChristopher M. Walker
    • G11B7/00
    • G02F1/292G02F1/13363G02F2001/133565G03H1/02G03H1/16G03H2001/0224G03H2223/13G11B7/0065G11B7/128G11B7/1369
    • A spatial light modulator (SLM) having a phase mask that is provided as an internal component thereof. The phase mask can be provided as a multilevel surface of relatively higher index of refraction material on an inner surface of a transmissive cover window or as a separate transmissive window between the cover window and the pixels of the SLM. If the phase mask is to be used with a liquid crystal SLM, then it may be desirable to planarize the surface of the cover window contacting the liquid crystal by providing a layer of relatively lower index of refraction material adjacent the multilevel surface. The phase mask can also be provided on the transmissive cover window by patterned ion deposition, exposing patterned light to a photopolymeric material, or in some other suitable fashion. Arranging for the pixel electrodes to be at one of multiple levels rather than lying in an exactly planar relationship can also effectively create the phase mask.
    • 具有作为其内部部件提供的相位掩模的空间光调制器(SLM)。 相位掩模可以被提供为在透射盖窗的内表面上的相对较高的折射率材料的多层表面,或者作为在窗口窗口和SLM的像素之间的单独透射窗口。 如果相位掩模与液晶SLM一起使用,则可能需要通过提供相邻较低折射率材料层与多层表面相邻来平坦化与液晶接触的盖窗的表面。 相位掩模也可以通过图案化离子沉积在透射覆盖窗口上提供,将图案化光曝光到光聚合物材料上,或以某种其它合适的方式。 将像素电极排列成多个电平中的一个而不是处于精确的平面关系,也可以有效地产生相位掩模。
    • 9. 发明授权
    • Diffractive light modulator
    • 衍射光调制器
    • US5552916A
    • 1996-09-03
    • US8764
    • 1993-01-25
    • Michael J. O'CallaghanMark A. Handschy
    • Michael J. O'CallaghanMark A. Handschy
    • G02F1/141G02F1/29G02F1/13
    • G02F1/292G02F1/141G02F2201/124G02F2203/24
    • An arrangement (apparatus and method) for selectively modulating incident unpolarized light passing through a birefringent material, such as ferroelectric crystal. The apparatus includes a plate having one or more birefringent layers corresponding to first and second alignment regions. The birefringent layer corresponding to the first alignment region has a first optic axis selectably set in a first orientation and a second orientation. The birefringent layer corresponding to the second alignment region has a second optic axis selectably set in a third orientation and a fourth orientation. A switching means controls the optical axis states of the birefringent material by applying switching voltages to the areas of the birefringent layer. Light having passed through the birefringent layer at locations having the first orientation has a different phase from, and same polarization as, light having passed through locations with the third orientation, independent of a polarization state of the incident light. As a result, the birefringent material has a uniform state at locations where the corresponding optic axes between the first and second alignment regions are parallel, and a diffracting state produced by an interaction between the light having passed through areas having the first orientation and the light having passed through areas having the second orientation. The arrangement is effective for reflective modulators, multilayer modulators or polarization-preserving modulators, and has applications for intensity modulation, blurring modulation and beam steering.
    • 用于选择性地调制通过诸如铁电晶体的双折射材料的入射非偏振光的装置(装置和方法)。 该装置包括具有对应于第一和第二对准区域的一个或多个双折射层的板。 对应于第一对准区域的双折射层具有可选地设置在第一取向和第二取向的第一光轴。 对应于第二对准区域的双折射层具有可选地设置在第三取向和第四取向的第二光轴。 开关装置通过向双折射层的区域施加开关电压来控制双折射材料的光轴状态。 在具有第一取向的位置处穿过双折射层的光与通过具有第三取向的位置的光具有不同的相位和相同的偏振,与入射光的偏振状态无关。 结果,双折射材料在第一和第二对准区域之间的相应光轴平行的位置处具有均匀的状态,以及通过具有第一取向的光与光之间的相互作用产生的衍射状态 已通过具有第二方向的区域。 该装置对于反射调制器,多层调制器或偏振保存调制器是有效的,并且具有用于强度调制,模糊调制和波束转向的应用。