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1. 发明授权

US5218867A Single axis attitude sensor 失效
标题翻译：单轴姿态传感器
公开(公告)号：US5218867A
公开(公告)日：1993-06-15
申请号：US873222
申请日：1992-04-24
申请人： Malcolm P. Varnham , Diana Hodgins , Timothy S. Norris , Hugh D. Thomas , Charles Day
发明人： Malcolm P. Varnham , Diana Hodgins , Timothy S. Norris , Hugh D. Thomas , Charles Day
IPC分类号： G01C19/5691
CPC分类号： G01C19/5691
摘要： This invention relates to a single axis solid state attitude sensor in which, the spatial orientation of a resonant rode on a resonant body is maintained in alignment with the inertial angle K8 of the resonant body.
摘要翻译：本发明涉及一种单轴固态姿态传感器，其中谐振体上的谐振环的空间取向保持与谐振体的惯性角K8对齐。

2. 发明授权

US5226321A Vibrating planar gyro 失效
标题翻译：振动平面陀螺仪
公开(公告)号：US5226321A
公开(公告)日：1993-07-13
申请号：US701533
申请日：1991-05-17
申请人： Malcolm P. Varnham , Diana Hodgins , Timothy S. Norris , Huw D. Thomas
发明人： Malcolm P. Varnham , Diana Hodgins , Timothy S. Norris , Huw D. Thomas
IPC分类号： G01C19/5684 , G01P15/08 , G01P15/14
CPC分类号： G01C19/5684 , G01P15/14 , H03H2009/02354
摘要： A vibrating planar ring or hoop-like structure is disclosed. The structure is suspended in space by a suitable support mount for detecting turning rate, linear acceleration and angular acceleration. Turning rate is sensed by detecting vibrations coupled by Coriolis forces, whereas linear acceleration and angular acceleration are sensed by lateral, vertical and rocking movement of the entire ring or hoop-like structure within its mount.

3. 发明授权

US5540094A Scale factor compensation for piezo-electric rate sensors 失效
标题翻译：压电速率传感器的比例因子补偿
公开(公告)号：US5540094A
公开(公告)日：1996-07-30
申请号：US188326
申请日：1994-01-24
申请人： Malcolm Varnham , Timothy S. Norris , James McInnes , Diana Hodgins
发明人： Malcolm Varnham , Timothy S. Norris , James McInnes , Diana Hodgins
IPC分类号： G01C19/5691 , G01P1/00 , G01P3/44 , G01C19/00
CPC分类号： G01C19/5691 , G01P1/006
摘要： A method of and apparatus for scale factor compensation for piezo-electric rate sensors maintains the magnitude of vibration at a primary pick-off point substantially constant to enable one of the variables of a vibrating structure--the piezo-electric charge coefficient .beta. to be determined, and thereby enables variation of the scale factor of the sensor from a calibrated value to be determined. This enables correction of the sensor output by a computational scale factor control unit to ensure that the output therefrom allows for a more accurate sensor. Thus, sensors are provided for applications requiring a higher degree of accuracy than they were previously able to provide for.
摘要翻译：用于压电速率传感器的比例因子补偿的方法和装置保持主要拾取点处的振动幅度基本上恒定，以使振动结构中的一个变量能够确定压电电荷系数β ，从而能够使传感器的比例因子从校准值变化来确定。这使得能够通过计算比例因子控制单元来校正传感器输出，以确保其输出允许更准确的传感器。因此，传感器被提供用于需要比之前能够提供的更高精度的应用。

4. 发明授权

US5447601A Method of manufacturing a motion sensor 失效
标题翻译：制作运动传感器的方法
公开(公告)号：US5447601A
公开(公告)日：1995-09-05
申请号：US222817
申请日：1994-04-05
申请人： Timothy S. Norris
发明人： Timothy S. Norris
IPC分类号： G01C19/5684 , G01P15/08 , G01P15/125 , H01L29/84 , H01L21/302
CPC分类号： G01C19/5684 , G01P15/0802 , Y10S148/135
摘要： The method comprises the steps of providing a substrate wafer (10); depositing a first layer of resist (12) upon the substrate wafer (10); removing selected areas of the first resist layer (12), thereby to provide first etch windows; forming first cavities (16) in the substrate wafer (10) by a first etching process through the first windows; bonding a relatively thick membrane wafer (24) to the substrate wafer (10), thereby covering the cavities (16); polishing the surface of the relatively thick membrane wafer (24) thereby to produce a relatively thin membrane (24a); depositing a second layer of resist (33) on the relatively thin membrane (24a); removing selected areas of the second deposited resist layer, thereby to provide second etch windows (40); etching away the relatively thin membrane (24a) in the region of the second etch windows (40) until the first cavities (16) are exposed, thereby to form in the relatively thin membrane (24a) a free standing resonator structure (18 ) suspended on a plurality of compliant beam mounts (38) extending from a fixed portion (50).
摘要翻译：该方法包括以下步骤：提供衬底晶片（10）; 在所述衬底晶片（10）上沉积第一抗蚀剂层（12）; 去除第一抗蚀剂层（12）的选定区域，从而提供第一蚀刻窗口; 通过所述第一窗口的第一蚀刻工艺在所述基板晶片（10）中形成第一空腔（16）; 将相对厚的膜晶片（24）接合到基板晶片（10），从而覆盖空腔（16）; 抛光相对厚的膜晶片（24）的表面，从而产生相对薄的膜（24a）; 在所述相对薄的膜（24a）上沉积第二层抗蚀剂（33）; 去除第二沉积抗蚀剂层的选定区域，从而提供第二蚀刻窗口（40）; 在第二蚀刻窗口（40）的区域中蚀刻相对薄的膜（24a）直到第一空腔（16）暴露，从而在相对薄的膜（24a）中形成悬置的自立式共振器结构（18）在从固定部分（50）延伸的多个柔性梁安装件（38）上。

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