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    • 2. 发明授权
    • Thermal development apparatus
    • 热开发设备
    • US06885391B2
    • 2005-04-26
    • US10404453
    • 2003-04-02
    • Takehiro ShiraishiMakoto SumiMakoto Horiuchi
    • Takehiro ShiraishiMakoto SumiMakoto Horiuchi
    • G03D13/00G03G13/06G03G15/06
    • G03D13/002
    • There is described a thermal development apparatus, which makes it possible to prevent generation of density variations caused by changes of the processing temperature during the thermal developing operation when the thermal developing photosensitive material is continuously processed, without increasing the cost of the apparatus so much. The thermal development apparatus includes a thermal developing processor to apply a thermal development processing to the thermal developing photosensitive material, a detector to detect the thermal developing photosensitive material to be conveyed into the thermal developing processor and a controller to control the thermal developing processor in a feed forward controlling mode based on a processing condition of the thermal developing processor. The processing condition is established in advance, corresponding to a load of processing the thermal developing photosensitive material detected in advance by the detector.
    • 描述了一种热显影装置,这使得可以防止当热显影感光材料被连续处理时在热显影操作期间由加工温度的变化引起的密度变化的产生,而不会增加装置的成本。 热显影装置包括热显影处理器,用于将热显影处理应用于热显影感光材料;检测器,用于检测要传送到热显影处理器的热显影感光材料;以及控制器,以控制热显影处理器 基于热显影处理器的处理条件的前馈控制模式。 对应于预先由检测器检测到的热显影感光材料的负载,预先确定处理条件。