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1. 发明授权

US07051671B2 Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article 有权
标题翻译：使用具有相互不同的频率的高频功率来产生处理物品的等离子体的真空处理装置
公开(公告)号：US07051671B2
公开(公告)日：2006-05-30
申请号：US10875404
申请日：2004-06-25
申请人： Makoto Aoki , Toshiyasu Shirasuna , Hiroaki Niino , Kazuyoshi Akiyama , Hitoshi Murayama , Shinji Tsuchida , Daisuke Tazawa , Yukihiro Abe
发明人： Makoto Aoki , Toshiyasu Shirasuna , Hiroaki Niino , Kazuyoshi Akiyama , Hitoshi Murayama , Shinji Tsuchida , Daisuke Tazawa , Yukihiro Abe
IPC分类号： C23C16/00
CPC分类号： H01J37/32174 , G03G5/08278 , H01J37/32082 , H01J37/32165 , H01J37/32183 , H01J37/32568
摘要： A vacuum processing method including placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having different frequencies to the same high-frequency electrode to generate plasma in the reaction container by the high-frequency powers introduced into the reaction container from the high-frequency electrode. The frequencies and power values of the at least two high-frequency powers supplied satisfy a required relationship.
摘要翻译：一种真空处理方法，包括将待处理的物品放置在反应容器中，同时向相同的高频电极提供具有不同频率的至少两个高频电源，以通过被引入到高频电极的高频功率在反应容器中产生等离子体来自高频电极的反应容器。提供的至少两个高频功率的频率和功率值满足所需的关系。

2. 发明授权

US06861373B2 Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode 失效
标题翻译：真空处理方法和半导体器件制造方法，其中具有相互不同频率的高频功率被施加到至少一个电极
公开(公告)号：US06861373B2
公开(公告)日：2005-03-01
申请号：US10011776
申请日：2001-12-11
申请人： Makoto Aoki , Toshiyasu Shirasuna , Hiroaki Niino , Kazuyoshi Akiyama , Hitoshi Murayama , Shinji Tsuchida , Daisuke Tazawa , Yukihiro Abe
发明人： Makoto Aoki , Toshiyasu Shirasuna , Hiroaki Niino , Kazuyoshi Akiyama , Hitoshi Murayama , Shinji Tsuchida , Daisuke Tazawa , Yukihiro Abe
IPC分类号： H05H1/46 , C23C16/505 , G03G5/08 , G03G5/082 , H01J37/32 , H01L21/205 , G03G5/00
CPC分类号： H01J37/32174 , G03G5/08278 , H01J37/32082 , H01J37/32165 , H01J37/32183 , H01J37/32568
摘要： A vacuum processing method that includes placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to at least one high-frequency electrode to generate plasma in the reaction container by the high-frequency powers introduced into the reaction container from the high-frequency electrode(s), thereby processing the article. The frequencies and power values of the at least two high-frequency powers supplied satisfy required relationships.
摘要翻译：一种真空处理方法，其特征在于，将待处理物品放置在反应容器中，同时向至少一个高频电极供给具有相互不同频率的至少两个高频电力，以通过高频率在反应容器中产生等离子体从高频电极引入反应容器，从而处理制品。提供的至少两个高频功率的频率和功率值满足所需的关系。

3. 发明授权

US06849123B2 Plasma processing method and method for manufacturing semiconductor device 失效
标题翻译：等离子体处理方法及制造半导体器件的方法
公开(公告)号：US06849123B2
公开(公告)日：2005-02-01
申请号：US10195398
申请日：2002-07-16
申请人： Hiroaki Niino , Toshiyasu Shirasuna , Hitoshi Murayama , Makoto Aoki
发明人： Hiroaki Niino , Toshiyasu Shirasuna , Hitoshi Murayama , Makoto Aoki
IPC分类号： G03G5/08 , C23C16/24 , C23C16/32 , C23C16/509 , H01J37/32 , H01L21/205 , H01L31/18 , H01L31/20 , C30B25/10
CPC分类号： H01J37/32082 , C23C16/24 , C23C16/325 , C23C16/509 , H01J37/32165 , H01L31/1804 , H01L31/202 , Y02E10/547 , Y02P70/521
摘要： To plasma-process a substrate having a large area uniformly at a high process speed to form a deposition film with uniform thickness and quality and favorable characteristics. A first high frequency power (with a frequency f1 and a power P1) and a second high frequency power (with a frequency f2 and a power P2) supplied to an electrode from a first high frequency power supply and a second high frequency power supply, respectively, are set so that the frequencies are equal to or higher than 10 MHz and equal to or lower than 250 MHz, a ratio of the frequency f2 to the frequency f1 (f2/f1) is equal to or higher than 0.1 and equal to or lower than 0.9, and a ratio of the power P2 to a total power (P1+P2) is equal to or higher than 0.1 and equal to or lower than 0.9. The frequency f2 is changed during processing the substrate.
摘要翻译：为了以高处理速度对具有大面积均匀的基板进行等离子体处理，以形成均匀厚度和质量以及良好特性的沉积膜。从第一高频电源和第二高频电源提供给电极的第一高频功率（具有频率f1和功率P1）和第二高频功率（具有频率f2和功率P2）分别被设定为使得频率等于或高于10MHz且等于或低于250MHz，频率f2与频率f1（f2 / f1）的比率等于或高于0.1并且等于或低于0.9，功率P2与总功率（P1 + P2）的比例等于或大于0.1且等于或低于0.9。频率f2在处理衬底期间改变。

4. 发明授权

US06696108B2 Vacuum processing method 失效
标题翻译：真空加工方法
公开(公告)号：US06696108B2
公开(公告)日：2004-02-24
申请号：US10006689
申请日：2001-12-10
申请人： Hitoshi Murayama , Toshiyasu Shirasuna , Hiroaki Niino , Makoto Aoki
发明人： Hitoshi Murayama , Toshiyasu Shirasuna , Hiroaki Niino , Makoto Aoki
IPC分类号： H05H146
CPC分类号： H01J37/32082 , G03G5/08278 , H01J37/32165
摘要： A vacuum processing method comprises placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to the same high-frequency electrode to generate plasma in the reaction container by the high-frequency powers admitted into the reaction container from the high-frequency electrode so as to process the article to be processed. In the method, at least the high-frequency power having a frequency f1 and the high-frequency power having a frequency f2 are used and satisfy the following two conditions as the high-frequency powers: 250 MHz≧f1>f2≧10 MHz 0.9≧f2/f1≧0.1.
摘要翻译：真空处理方法包括将待处理物品放置在反应容器中，同时向相同的高频电极提供具有相互不同频率的至少两个高频电源，以通过高频电源在反应容器中产生等离子体从高频电极进入反应容器，以处理待处理的物品。在该方法中，至少使用具有频率f1的高频功率和具有频率f2的高频功率，并且满足以下两个条件作为高频功率：

5. 发明授权

US06280895B1 Light-receiving member with outer layer made by alternatively forming and etching 有权
标题翻译：具有通过交替形成和蚀刻制成的外层的光接收构件
公开(公告)号：US06280895B1
公开(公告)日：2001-08-28
申请号：US09361804
申请日：1999-07-27
申请人： Shigenori Ueda , Junichiro Hashizume , Makoto Aoki , Shinji Tsuchida
发明人： Shigenori Ueda , Junichiro Hashizume , Makoto Aoki , Shinji Tsuchida
IPC分类号： G03G1504
CPC分类号： C23C16/44 , G03G5/08235 , G03G5/08264 , G03G5/08278
摘要： In a reactor capable of reducing an internal pressure thereof, a non-single-crystalline material layer containing at least one kind of carbon atoms, hydrogen atoms or nitrogen atoms is formed and etched on a non-single-crystalline photoconductive layer mainly composed of silicon atoms, formed on a substrate, under application of a high-frequency power of 50 MHz to 450 MHz, and the formation and the etching are alternately repeated plural times to form a surface layer. A light-receiving member having such a surface layer does not damage cleaning performance over a long period of time, hardly allows adhesion of corona discharge products, and can be free from faint images, smeared images and uneven image density even if no heating means for the drum is provided.
摘要翻译：在能够降低其内部压力的反应器中，形成含有至少一种碳原子，氢原子或氮原子的非单晶材料层，并在主要由硅构成的非单晶光电导层上进行蚀刻原子，形成在基板上，在施加50MHz至450MHz的高频功率下，并且形成和蚀刻交替重复多次以形成表面层。具有这种表面层的光接收元件不会长时间损坏清洁性能，即使没有提供用于鼓的加热装置，几乎不允许电晕放电产物的粘附，并且可以没有微弱的图像，模糊图像和不均匀的图像密度。

6. 发明授权

US5958644A Process to form light-receiving member with outer layer made by alternately forming and etching 失效
标题翻译：通过交替成形和蚀刻形成外层的光接收元件的工艺
公开(公告)号：US5958644A
公开(公告)日：1999-09-28
申请号：US637188
申请日：1996-04-24
申请人： Shigenori Ueda , Junichiro Hashizume , Makoto Aoki , Shinji Tsuchida
发明人： Shigenori Ueda , Junichiro Hashizume , Makoto Aoki , Shinji Tsuchida
IPC分类号： G03G5/08 , C23C16/44 , C23F4/00 , G03G5/082 , H01L21/302 , H01L21/3065 , H01L31/08 , G03G5/00
CPC分类号： C23C16/44 , G03G5/08235 , G03G5/08264 , G03G5/08278
摘要： In a reactor capable of reducing an internal pressure thereof, a non-single-crystalline material layer containing at least one kind of carbon atoms, hydrogen atoms or nitrogen atoms is formed and etched on a non-single-crystalline photoconductive layer mainly composed of silicon atoms, formed on a substrate, under application of a high-frequency power of 50 MHz to 450 MHz, and the formation and the etching are alternately repeated plural times to form a surface layer.A light-receiving member having such a surface layer does not damage cleaning performance over a long period of time, hardly allows adhesion of corona discharge products, and can be free from faint images, smeared images and uneven image density even if no heating means for the drum is provided.
摘要翻译：在能够降低其内部压力的反应器中，形成含有至少一种碳原子，氢原子或氮原子的非单晶材料层，并在主要由硅构成的非单晶光电导层上进行蚀刻原子，在50MHz〜450MHz的高频功率下，在基板上形成，并且形成和蚀刻交替重复多次以形成表面层。具有这种表面层的光接收部件长时间不损坏清洗性能，几乎不能使电晕放电产物附着，并且即使没有加热装置，也不会产生微弱的图像，模糊图像和不均匀的图像浓度提供鼓。

7. 发明授权

US11973905B2 Information processing system, information processing method, non-transitory recording medium, and information processing apparatus 有权
公开(公告)号：US11973905B2
公开(公告)日：2024-04-30
申请号：US18178873
申请日：2023-03-06
申请人： Hajime Kawasaki , Makoto Aoki
发明人： Hajime Kawasaki , Makoto Aoki
IPC分类号： G06F3/12 , G06K15/02 , H04N1/00
CPC分类号： H04N1/00334 , G06K15/1806 , H04N2201/0082
摘要： An information processing system, an information processing method, a non-transitory recording medium, and an information processing apparatus. The information processing system captures a plurality of images at respective locations each associated with a location where the object is managed, or a process performed on the object to be managed, generates print data of a second slip associated with the plurality of objects to be managed, the second slip being different from a first slip associated with each of the plurality of objects, and controls a display to display, based on detection of the printed second slip from the image captured by the imaging device, the plurality of objects to be managed associated with the printed second slip, as being placed at the location or the process associated with the imaging device that captured the image of the second slip.

8. 发明授权

US08721933B2 Optical sheet manufacture method and optical sheet 有权
标题翻译：光学片制造方法和光学片
公开(公告)号：US08721933B2
公开(公告)日：2014-05-13
申请号：US12047233
申请日：2008-03-12
申请人： Hiroshi Mizuno , Akihiro Horii , Noriyuki Hirai , Masashi Ogawa , Yuu Miura , Kei Obata , Makoto Aoki
发明人： Hiroshi Mizuno , Akihiro Horii , Noriyuki Hirai , Masashi Ogawa , Yuu Miura , Kei Obata , Makoto Aoki
IPC分类号： B29D11/00
CPC分类号： B29C59/04 , B29D11/00663 , B32B37/1027 , B32B38/06 , B32B2307/40
摘要： A manufacture method of an optical sheet made of a transparent thermoplastic resin sheet on whose surface a regular geometric design working is performed, the optical sheet manufacture method comprising steps of performing a geometric design working on the resin sheet at a temperature not lower than a glass transition temperature of the resin sheet, by using a metal endless working belt formed with a geometric design on a surface thereof, rapidly cooling the resin sheet on which the geometric design working is performed to a temperature lower than the glass transition temperature, and detaching the rapidly cooled resin sheet from the metal endless working belt.
摘要翻译：一种由透明热塑性树脂片制成的光学片的制造方法，其表面进行规则的几何设计，光学片制造方法包括以下步骤：在不低于玻璃的温度下对树脂片进行几何设计通过使用在其表面上形成有几何设计的金属环形工作带，将其上进行几何设计的树脂板快速冷却至低于玻璃化转变温度的温度，并且分离所述树脂片的转变温度从金属环形工作带快速冷却树脂板。

9. 发明授权

US07992048B2 Computer system and method for performing failure detecting processing for a logical path 有权
标题翻译：用于对逻辑路径执行故障检测处理的计算机系统和方法
公开(公告)号：US07992048B2
公开(公告)日：2011-08-02
申请号：US12611272
申请日：2009-11-03
申请人： Yuki Komatsu , Makoto Aoki
发明人： Yuki Komatsu , Makoto Aoki
IPC分类号： G06F11/00 , G06F11/34
CPC分类号： G06F11/201 , G06F3/0611 , G06F3/0635 , G06F3/067
摘要： Provided is a computer system including at least one host computer; and at least one storage system, characterized in that: the storage system has a disk drive and a disk controller, and provides a storage area of the disk drive as at least one logical unit; upon detecting a failure in a logical path serving as an access route from the host computer to the logical unit, the host computer specifies logical paths for accessing the same logical unit that is connected to the logical path where the failure is detected; the host computer executes failure detecting processing for the specified logical paths to judge whether the specified logical paths are normal or not; the host computer selects normal logical paths out of the specified logical paths; and the host computer accesses the logical unit via the normal logical paths selected.
摘要翻译：提供了一种包括至少一台主机的计算机系统; 以及至少一个存储系统，其特征在于：所述存储系统具有磁盘驱动器和磁盘控制器，并且提供所述磁盘驱动器的存储区域作为至少一个逻辑单元; 在检测到从主计算机到逻辑单元的访问路由的逻辑路径中的故障时，主计算机指定用于访问连接到检测到故障的逻辑路径的相同逻辑单元的逻辑路径; 主计算机对指定的逻辑路径执行故障检测处理，以判断指定的逻辑路径是否正常; 主机从指定的逻辑路径中选择正常的逻辑路径; 并且主机通过所选择的正常逻辑路径访问逻辑单元。

10. 发明授权

US07961278B2 Optical sheet stack and liquid crystal display device 有权
标题翻译：光学片叠和液晶显示装置
公开(公告)号：US07961278B2
公开(公告)日：2011-06-14
申请号：US11936599
申请日：2007-11-07
申请人： Eiji Ohta , Toru Abiko , Yasuyuki Kudo , Shogo Shinkai , Shigehiro Yamakita , Makoto Aoki
发明人： Eiji Ohta , Toru Abiko , Yasuyuki Kudo , Shogo Shinkai , Shigehiro Yamakita , Makoto Aoki
IPC分类号： G02F1/1335
CPC分类号： G02F1/133606 , G02B5/045 , G02F2201/54 , G02F2202/28
摘要： There is provided an optical sheet stack which includes a first optical sheet having a large number of irregularities consecutively arranged on one surface thereof, and a second optical sheet stacked thereon. In the optical sheet stack, the second optical sheet has, on a bonding surface thereof, an adhesive layer bonded with apexes of the irregularities, and while assuming pitch of arrangement of the irregularities as P, and width of bonding of each apex of the irregularities bonded to the adhesive layer as Pw, the relation of 0
摘要翻译：提供了一种光学片堆叠，其包括在其一个表面上连续布置有大量不规则的第一光学片和叠置在其上的第二光学片。在光学片堆叠中，第二光学片在其接合表面上具有与凹凸的顶点接合的粘合剂层，并且在假设凹凸的间距为P的情况下，以及不规则部的各顶点的接合宽度与Pw粘合到粘合剂层，满足0

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