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    • 3. 发明申请
    • INERTIAL ELECTROSTATIC CONFINEMENT (IEC) FUSION DEVICE WITH GATE-VALVE PULSING
    • 具有门阀脉冲的惯性静电装置(IEC)熔断装置
    • WO9924990A2
    • 1999-05-20
    • PCT/US9824034
    • 1998-11-12
    • MILEY GEORGE HJURCZYK BRIAN EGU YIBINSTUBBERS ROBERT AWILLIAMS MICHAEL J
    • MILEY GEORGE HJURCZYK BRIAN EGU YIBINSTUBBERS ROBERT AWILLIAMS MICHAEL J
    • G21B1/03H05H3/06G21G
    • H05H3/06
    • A pulsed neutron/proton source based upon the design of a steady-state spherical inertial electrostatic confinement (IEC) configuration and using a pulsed gate valve grid (GVP). The IEC-GVP device comprises a grounded conductive vessel, serving as an anode, and a central cathode or primary grid that is connected to a high voltage source. In addition, an intermediate second grid and an outside third grid are disposed concentrically with the central cathode within the vessel. Electron extractor/emitter devices are disposed substantially symmetrically about the perimeter of the vessel and include electron extractor deflector grids and electron emitters that contribute to the enhanced timed ion flow in the device. Two techniques for pulsing the second grid are used. A first is a low repetition rate GVP (LR-GVP) operation and a second is a tuned high-frequency pulsing, termed Resonant Ion Driven Oscillation (RIDO) GVP operation.
    • 基于稳态球形惯性静电限制(IEC)配置和使用脉冲闸阀网格(GVP)的设计的脉冲中子/质子源。 IEC-GVP装置包括用作阳极的接地导电容器和连接到高电压源的中央阴极或主电网。 此外,中间第二格栅和外部第三格栅与中心阴极同心地设置在容器内。 电子提取器/发射器件围绕容器的周边基本上对称地设置,并且包括有助于器件中增强的定时离子流的电子提取器偏转器栅格和电子发射器。 使用两种用于脉冲第二格栅的技术。 第一个是低重复率GVP(LR-GVP)操作,第二个是调谐的高频脉冲,称为谐振离子驱动振荡(RIDO)GVP操作。