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    • 2. 发明申请
    • INTERFEROMETRIC BROADBAND IMAGING
    • 干涉宽带成像
    • WO1997045773A1
    • 1997-12-04
    • PCT/US1997009005
    • 1997-05-28
    • MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    • MASSACHUSETTS INSTITUTE OF TECHNOLOGYEVERETT, Patrick, N.MOON, Euclid, EberleSMITH, Henry, I.
    • G03F09/00
    • G03F9/70G01B9/02043G01B9/02072G01B9/02078G01B9/0209G01B2290/30
    • Alignment marks on first and second plates include a plurality of periodic gratings. A grating on a first plate has a period or pitch p1 paired up with a grating on the second plate that has a slightly different period p2. A grating on the first plate having a period p3 is paired up with a grating on the second plate having a slightly different period p4. Illuminating the gratings produces a first interference pattern characterized by a first interference phase where beams diffracted from the first and second gratings overlap and a second interference pattern characterized by a second interference phase where beams diffracted from the third and fourth gratings overlap. The plates are moved until the difference between the first and second interference phases correspond to a predetermined interference phase difference. Further invention uses an interrupted-grating pattern on the second plate with certain advantages. Further advantages are obtained using a checkerboard pattern on the second plate. In addition two inventions are made for measuring gap. One method uses the same marks on the second plate as used in aligning, and the second uses no marks on the second plate, which is an advantage in some cases.
    • 第一和第二板上的对准标记包括多个周期性光栅。 第一板上的光栅具有与第二板上的光栅成对的周期或间距p1,其具有稍微不同的周期p2。 具有周期p3的第一板上的光栅与第二板上的光栅配对,具有稍微不同的周期p4。 照亮光栅产生第一干涉图案,其特征在于第一干涉相位,其中从第一和第二光栅衍射的光束重叠,以及第二干涉图案,其特征在于第二干涉相位,其中从第三和第四光栅衍射的光束重叠。 板移动直到第一和第二干涉相位之间的差对应于预定的干涉相位差。 另外,本发明使用了具有某些优点的第二板上的中断光栅图案。 使用第二板上的棋盘图案获得更多的优点。 另外还有两个发明用于测量差距。 一种方法在对准中使用与第二板相同的标记,而第二板在第二板上不使用标记,这在某些情况下是有利的。
    • 3. 发明申请
    • INTERFEROMETRIC BROADBAND IMAGING
    • 干涉宽带成像
    • WO1996038706A1
    • 1996-12-05
    • PCT/US1996005976
    • 1996-04-30
    • MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    • MASSACHUSETTS INSTITUTE OF TECHNOLOGYEVERETT, Patrick, N.MOON, Euclid, EberleSMITH, Henry, I.
    • G01B09/02
    • G03F9/70G01B9/02043G01B9/02072G01B9/02078G01B9/0209
    • Alignment marks on first and second plates (13, 21) include a plurality of periodic gratings. A grating (gm1) on a first plate (13) has a period or pitch P1 paired up with a grating (gS1) on the second plate (21) that has a slightly different period P2. A grating (gm2) on the first plate (13) having a period p3 is paired up with a grating (gS2) on the second plate (21) having a slightly different period p4. Illuminating the gratings produces a first interference pattern (fig. 7) characterized by a first interference phase where beams diffracted from the first and second gratings overlap and a second interference pattern characterized by a second interference phase where beams diffracted from the third and fourth gratings overlap. The plates are moved until the first and second interference phases correspond to a first predetermined interference phase and a second predetermined interference phase respectively (fig. 6).
    • 第一和第二板(13,21)上的对准标记包括多个周期性光栅。 在第一板(13)上的光栅(gm1)具有与第二板(21)上具有稍微不同的周期P2的光栅(gS1)配对的周期或间距P1。 具有周期p3的第一板(13)上的光栅(gm2)与具有稍微不同的周期p4的第二板(21)上的光栅(gS2)配对。 照亮光栅产生第一干涉图案(图7),其特征在于第一干涉相位,其中从第一和第二光栅衍射的光束重叠,以及第二干涉图案,其特征在于第二干涉相位,其中从第三和第四光栅衍射的光束重叠 。 板移动直到第一和第二干涉相分别对应于第一预定干涉相位和第二预定干涉相位(图6)。