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1. 发明授权

US06341521B1 Process and device for measuring the amount of impurities in a gas sample to be analyzed 失效
标题翻译：用于测量要分析的气体样品中的杂质量的方法和装置
公开(公告)号：US06341521B1
公开(公告)日：2002-01-29
申请号：US09416758
申请日：1999-10-12
申请人： Mélanie Bartolomey , Jean-Marc Girard , Patrick Mauvais , James McAndrew
发明人： Mélanie Bartolomey , Jean-Marc Girard , Patrick Mauvais , James McAndrew
IPC分类号： G01N2111
CPC分类号： G01N21/3504 , G01N2021/3536 , G01N2021/354 , G01N2021/399
摘要： Provided is a process for measuring the amount of impurities in a gas sample filling a laser absorption spectroscopy analysis cell. The process includes calculating the value of a characteristic representative of the absorbance of the gas sample, from a measurement of the gas sample at a single given pressure, and quantifying the impurities on the basis of a predetermined law for the variation of the characteristic as a function of the amount of impurities. The characteristic is the ratio of the difference between the luminous intensity (Iana) of a light beam transmitted through the gas and the luminous intensity (Iref) of the incident beam to the luminous intensity (Iref) of the incident beam. The impurities are quantified on the basis of a value of the coefficient of proportionality between the amount of impurities and the characteristic, determined on the basis of a table of variation of the characteristic as a function of pressure, for a given amount of impurities.
摘要翻译：提供了一种用于测量填充激光吸收光谱分析单元的气体样品中的杂质量的方法。该过程包括从单一给定压力下的气体样品的测量值计算代表气体样品的吸光度的特性的值，并根据预定定律对特性的变化量化为杂质功能量杂质。特征是透过气体的光束的发光强度（Iana）与入射光束的发光强度（Iref）与入射光束的发光强度（Iref）之间的差值之比。基于对于给定量的杂质，基于作为压力的函数的特性的变化表确定的杂质量与特性之间的比例系数的值来量化杂质。

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