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1. 发明申请

US20060114437A1 Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus 有权
标题翻译：平版印刷设备和使用这种光刻投影设备的设备制造方法
公开(公告)号：US20060114437A1
公开(公告)日：2006-06-01
申请号：US11000507
申请日：2004-12-01
申请人： M'hamed Akhssay , Johannes Baselmans , Franciscus Antonius Chrysogonus Commissaris , Simon De Groot , Andre Jeunink , Wim Tel , Alexander Hendrikus Van Der Hoff , Arnout Van De Stadt
发明人： M'hamed Akhssay , Johannes Baselmans , Franciscus Antonius Chrysogonus Commissaris , Simon De Groot , Andre Jeunink , Wim Tel , Alexander Hendrikus Van Der Hoff , Arnout Van De Stadt
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/705 , G03F7/706
摘要： A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.
摘要翻译：光刻投影设备包括用于随时间测量投影系统像差的变化的测量系统，以及用于根据模型参数随时间预测投影系统像差的变化的预测控制系统，以及用于产生用于补偿时变的控制信号属性，例如投影系统的透镜的OVL值（XY调整）和FOC值（Z调整）。提供了一种在线模型识别系统，用于基于由预测控制系统提供的投影系统像差值和测量系统提供的测量投影系统像差值来估计模型参数误差，并且更新系统利用模型参数误差来更新预测控制系统的模型参数，以便将时变性能保持在可接受的性能标准内。

2. 发明申请

US20060008716A1 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权
标题翻译：光刻投影装置和使用这种光刻投影装置的装置制造方法
公开(公告)号：US20060008716A1
公开(公告)日：2006-01-12
申请号：US10886051
申请日：2004-07-08
申请人： Andre Jeunink , M'Hamed Akhssay , Johannes Baselmans , Franciscus Antonius Commissaris , Simon De Groot , Wim Tel , Alexander Hendrikus Van Der Hoff , Arnout Van De Stadt , Remco Van Dijk
发明人： Andre Jeunink , M'Hamed Akhssay , Johannes Baselmans , Franciscus Antonius Commissaris , Simon De Groot , Wim Tel , Alexander Hendrikus Van Der Hoff , Arnout Van De Stadt , Remco Van Dijk
IPC分类号： G03C5/00 , G03B27/00 , G06F17/50 , G03F9/00
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that are of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion. In order to compensate for the aberrations in a manner that gives precedence to those aberrations of particular significance to the required application, the method incorporates the steps of predicting projection system aberration changes with time, determining the application-specific effect on certain parameters of the image of such predicted projection system aberration changes with respect to certain measured aberration values, generating a control signal specific to the required patterned beam according to such predicted projection system aberration changes in the projection system aberrations with time and their application-specific effect on certain parameters of the image; and carrying out imaging adjustments in dependence on the control signal to compensate for the application-specific effect of the predicted changes in the aberrations on the image. The adjustments are therefore determined optimally for the given application.
摘要翻译：在光刻投影设备中使用制造方法，以便能够补偿所有像差，但是对于特定应用（特定图案，照明模式等）具有最重要意义的那些像差优先于像差，与该特定应用相关的意义较小。该方法使用具有用于接收图像的目标部分的基板，用于根据所需图案化应用来施加图案的掩模以及投影系统，以将所选择的辐射束投影到掩模上，以产生特定的所需图案束提供目标部分上的图案的图像。为了以对所需应用具有特别意义的那些像差优先的方式补偿像差，该方法包括随时间预测投影系统像差变化的步骤，确定对图像的某些参数的应用特定影响这种预测的投影系统像差相对于某些测量的像差值发生变化，根据投影系统像差随时间的这种预测的投影系统像差变化产生对所需图案化光束特有的控制信号及其对某些参数的应用特定影响图片; 并且根据控制信号执行成像调整，以补偿预测图像上像差变化的应用特定效果。因此，对于给定的应用，最佳地确定调整。

3. 发明授权

US07262831B2 Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus 有权
标题翻译：平版印刷设备和使用这种光刻投影设备的设备制造方法
公开(公告)号：US07262831B2
公开(公告)日：2007-08-28
申请号：US11000507
申请日：2004-12-01
申请人： M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Andre Bernardus Jeunink , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt
发明人： M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Andre Bernardus Jeunink , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt
IPC分类号： G03B27/52 , G03B27/42 , G03B27/68
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/705 , G03F7/706
摘要： A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.
摘要翻译：光刻投影设备包括用于随时间测量投影系统像差的变化的测量系统，以及用于根据模型参数随时间预测投影系统像差的变化的预测控制系统，以及用于产生用于补偿时变的控制信号属性，例如投影系统的透镜的OVL值（XY调整）和FOC值（Z调整）。提供了一种在线模型识别系统，用于基于由预测控制系统提供的投影系统像差值和由测量系统提供的测量的投影系统像差值来估计模型参数误差，并且更新系统利用模型参数误差来更新预测控制系统的模型参数，以便将时变性能保持在可接受的性能标准内。

4. 发明授权

US07626684B2 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权
标题翻译：光刻投影装置和使用这种光刻投影装置的装置制造方法
公开(公告)号：US07626684B2
公开(公告)日：2009-12-01
申请号：US12213150
申请日：2008-06-16
申请人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van der Hoff , Arnout Van de Stadt , Remco Marcel Van Dijk
发明人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van der Hoff , Arnout Van de Stadt , Remco Marcel Van Dijk
IPC分类号： G03B27/32 , G03B27/42 , G03B27/68
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
摘要翻译：公开了一种光刻投影装置，其包括预测系统，该预测系统被配置为相对于测量的像差值预测投影系统像差随时间的变化，建模系统被配置为确定所述预测投影系统像差变化对至少一个像素的应用特定影响用于所选图案的图像的参数;控制系统，被配置为根据所述预测的投影系统像差变化及其对图像的至少一个参数的应用特定影响来生成特定于所选择的图案的控制信号，以及图像响应于控制信号调整系统，以补偿所述预测的投影系统像差变化对图像的应用特定效果。

5. 发明授权

US07403264B2 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权
标题翻译：光刻投影装置和使用这种光刻投影装置的装置制造方法
公开(公告)号：US07403264B2
公开(公告)日：2008-07-22
申请号：US10886051
申请日：2004-07-08
申请人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt , Remco Marcel Van Dijk
发明人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt , Remco Marcel Van Dijk
IPC分类号： G03B27/54 , G03B27/68
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image. Adjustments may therefore be determined optimally for a given application.
摘要翻译：公开了一种光刻投影装置，其包括预测系统，该预测系统被配置为相对于测量的像差值预测投影系统像差随时间的变化，建模系统被配置为确定所述预测投影系统像差变化对至少一个像素的应用特定影响用于所选图案的图像的参数;控制系统，被配置为根据所述预测的投影系统像差变化及其对图像的至少一个参数的应用特定影响来生成特定于所选择的图案的控制信号，以及图像响应于控制信号调整系统，以补偿所述预测的投影系统像差变化对图像的应用特定效果。因此，对于给定的应用可以最佳地确定调整。

6. 发明申请

US20080252870A1 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权
标题翻译：光刻投影装置和使用这种光刻投影装置的装置制造方法
公开(公告)号：US20080252870A1
公开(公告)日：2008-10-16
申请号：US12213150
申请日：2008-06-16
申请人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Amout Van De Stadt , Remco Marcel Van Dijk
发明人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Amout Van De Stadt , Remco Marcel Van Dijk
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
摘要翻译：公开了一种光刻投影装置，其包括预测系统，该预测系统被配置为相对于测量的像差值预测投影系统像差随时间的变化，建模系统被配置为确定所述预测投影系统像差变化对至少一个像素的应用特定影响用于所选图案的图像的参数;控制系统，被配置为根据所述预测的投影系统像差变化及其对图像的至少一个参数的应用特定影响来生成特定于所选择的图案的控制信号，以及图像响应于控制信号调整系统，以补偿所述预测的投影系统像差变化对图像的应用特定效果。

7. 发明授权

US07889316B2 Method for patterning a radiation beam, patterning device for patterning a radiation beam 有权
标题翻译：图案化辐射束的方法，用于图案化辐射束的图案形成装置
公开(公告)号：US07889316B2
公开(公告)日：2011-02-15
申请号：US11433766
申请日：2006-05-15
申请人： Wilhelmus Petrus De Boeij , Simon De Groot , Ewoud Vreugdenhil , Johannes Wilhelmus De Klerk
发明人： Wilhelmus Petrus De Boeij , Simon De Groot , Ewoud Vreugdenhil , Johannes Wilhelmus De Klerk
IPC分类号： G03B27/42
CPC分类号： G03B27/34 , G03F7/70425 , G03F7/70433
摘要： A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.
摘要翻译：多模掩模图案布置成具有相同取向相同图案的模具。用于布置模具的方法包括分析单个模具的图案以识别不均匀分布在模具区域上的图案特性。如果发现分布是不对称的，则将裸片区域分成两个半裸片区域的线被定义为不对称性是显而易见的。具有相同图案特性的不同模具的半裸片区域在掩模图案中分组在一起。所得到的掩模区域上的图案特性分布分布的增强的对称增加了光刻加工性能，从而提高了模头产量。

8. 发明申请

US20070263190A1 Method for patterning a radiation beam, patterning device for patterning a radiation beam 有权
标题翻译：图案化辐射束的方法，用于图案化辐射束的图案形成装置
公开(公告)号：US20070263190A1
公开(公告)日：2007-11-15
申请号：US11433766
申请日：2006-05-15
申请人： Wilhelmus De Boeij , Simon De Groot , Ewoud Vreugdenhil , Johannes De Klerk
发明人： Wilhelmus De Boeij , Simon De Groot , Ewoud Vreugdenhil , Johannes De Klerk
IPC分类号： G03B27/42
CPC分类号： G03B27/34 , G03F7/70425 , G03F7/70433
摘要： A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.
摘要翻译：多模掩模图案布置成具有相同取向相同图案的模具。用于布置模具的方法包括分析单个模具的图案以识别不均匀分布在模具区域上的图案特性。如果发现分布是不对称的，则将裸片区域分成两个半裸片区域的线被定义为不对称性是显而易见的。具有相同图案特性的不同模具的半裸片区域在掩模图案中分组在一起。所得到的掩模区域上的图案特性分布分布的增强的对称增加了光刻加工性能，从而提高了模头产量。

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