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1. 发明授权

US06453924B1 Fluid distribution system and process, and semiconductor fabrication facility utilizing same 有权
标题翻译：流体分配系统和过程以及利用其的半导体制造设备
公开(公告)号：US06453924B1
公开(公告)日：2002-09-24
申请号：US09624478
申请日：2000-07-24
申请人： Luping Wang , Terry A. Tabler , James A. Dietz
发明人： Luping Wang , Terry A. Tabler , James A. Dietz
IPC分类号： F17C1100
CPC分类号： F17D1/04 , F17C11/00 , F17C13/04 , F17C2205/0146 , F17C2205/0323 , F17C2205/0338 , F17C2221/05 , F17C2223/0153 , F17C2223/033 , F17C2250/032 , F17C2250/0626 , F17C2250/0636 , F17C2265/01 , F17C2270/0518 , Y10T137/0318 , Y10T137/4807 , Y10T137/6416 , Y10T137/86187
摘要： A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant. The system includes a main fluid supply vessel coupled by flow circuitry to a local sorbent-containing supply vessel from which fluid, e.g., low pressure compressed gas, is dispensed to a fluid-consuming unit, e.g., a semiconductor manufacturing tool. A fluid pressure regulator is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. The system and associated method are particularly suited to the supply and utilization of liquefied compressed gases such as trimethylsilane, arsine, phosphine, and dichlorosilane.
摘要翻译：一种用于向诸如半导体制造工厂之类的处理设备供应气体的流体分配系统。该系统包括通过流动回路耦合到局部吸附剂的供应容器的主要流体供应容器，从该液体供应容器将诸如低压压缩气体的流体从其分配到诸如半导体制造工具的流体消耗单元。流体压力调节器设置在流动回路或主液体供应容器中，并且确保流到流体消耗单元的气体处于期望的压力。该系统和相关方法特别适用于供应和利用液化压缩气体如三甲基硅烷，胂，膦和二氯硅烷。

2. 发明授权

US06561213B2 Fluid distribution system and process, and semiconductor fabrication facility utilizing same 有权
公开(公告)号：US06561213B2
公开(公告)日：2003-05-13
申请号：US09874084
申请日：2001-06-05
申请人： Luping Wang , Terry A. Tabler , James A. Dietz
发明人： Luping Wang , Terry A. Tabler , James A. Dietz
IPC分类号： F17C1100
CPC分类号： F17D1/04 , F17C11/00 , F17C13/04 , F17C2205/0146 , F17C2205/0323 , F17C2205/0338 , F17C2221/05 , F17C2223/0153 , F17C2223/033 , F17C2250/032 , F17C2250/0626 , F17C2250/0636 , F17C2265/01 , F17C2270/0518 , Y10T137/0318 , Y10T137/4807 , Y10T137/6416 , Y10T137/86187
摘要： A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant. The system includes a main fluid supply vessel coupled by flow circuitry to a local sorbent-containing supply vessel from which fluid, e.g., low pressure compressed gas, is dispensed to a fluid-consuming unit, e.g., a semiconductor manufacturing tool. A fluid pressure regulator is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. The system and associated method are particularly suited to the supply and utilization of liquefied compressed gases such as trimethylsilane, arsine, phosphine, and dichlorosilane.

3. 发明授权

US06474076B2 Fluid storage and dispensing system featuring externally adjustable regulator assembly for high flow dispensing 有权
标题翻译：流体存储和分配系统，具有外部可调整的调节器组件，用于高流量分配
公开(公告)号：US06474076B2
公开(公告)日：2002-11-05
申请号：US10017970
申请日：2001-11-12
申请人： Luping Wang , Glenn M. Tom , James A. Dietz , Steven M. Lurcott , Steven J. Hultquist
发明人： Luping Wang , Glenn M. Tom , James A. Dietz , Steven M. Lurcott , Steven J. Hultquist
IPC分类号： F17C704
CPC分类号： F17C7/04 , F17C7/02 , F17C13/025 , F17C13/04 , F17C2201/0109 , F17C2201/0114 , F17C2201/032 , F17C2201/058 , F17C2203/0643 , F17C2203/0646 , F17C2205/018 , F17C2205/0338 , F17C2205/0341 , F17C2205/0382 , F17C2205/0385 , F17C2205/0391 , F17C2223/0123 , F17C2223/0153 , F17C2223/035 , F17C2250/032 , F17C2250/034 , F17C2250/043 , F17C2250/0636 , F17C2265/04 , F17C2270/025 , F17C2270/05 , F17C2270/0518
摘要： A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a superatmospheric pressure set point for dispensing.
摘要翻译：一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。容器包括用于从容器排出流体的流体排出口。流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压力设定点。

4. 发明授权

US06360546B1 Fluid storage and dispensing system featuring externally adjustable regulator assembly for high flow dispensing 失效
标题翻译：流体储存和分配系统，具有外部可调节调节器组件，用于高流量分配
公开(公告)号：US06360546B1
公开(公告)日：2002-03-26
申请号：US09635961
申请日：2000-08-10
申请人： Luping Wang , Glenn M. Tom , James A Dietz , Steven M. Lurcott , Steven J. Hultquist
发明人： Luping Wang , Glenn M. Tom , James A Dietz , Steven M. Lurcott , Steven J. Hultquist
IPC分类号： F17C704
CPC分类号： F17C7/04 , F17C7/02 , F17C13/025 , F17C13/04 , F17C2201/0109 , F17C2201/0114 , F17C2201/032 , F17C2201/058 , F17C2203/0643 , F17C2203/0646 , F17C2205/018 , F17C2205/0338 , F17C2205/0341 , F17C2205/0382 , F17C2205/0385 , F17C2205/0391 , F17C2223/0123 , F17C2223/0153 , F17C2223/035 , F17C2250/032 , F17C2250/034 , F17C2250/043 , F17C2250/0636 , F17C2265/04 , F17C2270/025 , F17C2270/05 , F17C2270/0518
摘要： A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a super atmospheric pressure set point for dispensing.
摘要翻译：一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。容器包括用于从容器排出流体的流体排出口。流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压设定点。

5. 发明授权

US07614421B2 Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases 有权
标题翻译：基于压力的气体输送系统和降低高压气体储存和输送相关风险的方法
公开(公告)号：US07614421B2
公开(公告)日：2009-11-10
申请号：US11360732
申请日：2006-02-23
申请人： W. Karl Olander , Matthew B. Donatucci , Luping Wang , Michael J. Wodjenski
发明人： W. Karl Olander , Matthew B. Donatucci , Luping Wang , Michael J. Wodjenski
IPC分类号： F16K3/36 , B08B9/027 , G05B11/01
CPC分类号： F17C13/04 , F17C5/00 , F17C2201/0109 , F17C2201/0119 , F17C2201/032 , F17C2201/056 , F17C2201/058 , F17C2205/0111 , F17C2205/0176 , F17C2205/0326 , F17C2205/0332 , F17C2205/0335 , F17C2205/0338 , F17C2205/0341 , F17C2205/0391 , F17C2205/0394 , F17C2221/012 , F17C2221/014 , F17C2221/016 , F17C2221/037 , F17C2221/05 , F17C2223/0123 , F17C2223/036 , F17C2225/0123 , F17C2225/033 , F17C2225/035 , F17C2225/038 , F17C2227/044 , F17C2227/045 , F17C2250/032 , F17C2250/043 , F17C2260/036 , F17C2260/044 , F17C2270/0518 , Y02E60/321 , Y10T137/0324 , Y10T137/0419 , Y10T137/2569 , Y10T137/4259 , Y10T137/7759 , Y10T137/7761 , Y10T137/7762 , Y10T137/7793 , Y10T137/8158 , Y10T137/87249
摘要： Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.
摘要翻译：使用与气体歧管以选择性流动关系耦合的气体源分配气体的装置和方法。气体歧管包括用于将气体排放到气体使用区域的流动回路，并且气体源包括在超大气压下容纳气体的压力调节气体源容器。压力调节的气体源容器可以布置有在容器内或容器内的压力调节器，以及与容器流动关系的流量控制阀，使得从容器分配的气体在流过流量控制器之前流过调节器阀，并进入气体歧管。该装置和方法允许提高半导体工艺中使用的有毒或其他有害气体的储存和分配的安全性。

6. 发明申请

US20090099016A1 PRODUCTION OF CARBON NANOTUBES 有权
标题翻译：生产碳纳米管
公开(公告)号：US20090099016A1
公开(公告)日：2009-04-16
申请号：US12158318
申请日：2006-12-19
申请人： J. Donald Carruthers , Xueping Xu , Luping Wang
发明人： J. Donald Carruthers , Xueping Xu , Luping Wang
IPC分类号： D01F9/12 , C23C16/02 , C01B31/08 , B01J8/00
CPC分类号： B01J20/205 , B01J20/20 , B01J21/185 , B01J23/74 , B01J23/881 , B01J23/882 , B01J23/883 , B82Y30/00 , B82Y40/00 , C01B32/162 , C01B2202/02 , C01B2202/08 , C01B2202/36 , Y02P20/582
摘要： A method and apparatus for manufacture of carbon nanotubes, in which a substrate is contacted with a hydrocarbonaceous feedstock containing a catalytically effective metal to deposit the feedstock on the substrate, followed by oxidation of the deposited feedstock to remove hydrocarbonaceous and carbonaceous components from the substrate, while retaining the catalytically effective metal thereon, and contacting of the substrate having retained catalytically effective metal thereon with a carbon source material to grow carbon nanotubes on the substrate. The manufacture can be carried out with a petroleum feedstock such as an oil refining atmospheric tower residue, to produce carbon nanotubes in high volume at low cost. Also disclosed is a composite including porous material having single-walled carbon nanotubes in pores thereof.
摘要翻译：一种用于制造碳纳米管的方法和装置，其中将基底与含有催化有效金属的含烃原料接触以将原料沉积在基底上，随后氧化沉积的原料以从基底中除去含碳和碳质的组分，同时在其上保留催化有效的金属，并且将具有保留的催化有效金属的基材与碳源材料接触以在基材上生长碳纳米管。可以用石油原料如炼油大气塔渣进行制造，以低成本大量生产碳纳米管。还公开了一种复合材料，其包括在其孔中具有单壁碳纳米管的多孔材料。

7. 发明授权

US07437060B2 Delivery systems for efficient vaporization of precursor source material 有权
标题翻译：用于高效蒸发前体源材料的输送系统
公开(公告)号：US07437060B2
公开(公告)日：2008-10-14
申请号：US11157733
申请日：2005-06-21
申请人： Luping Wang , Thomas H. Baum , Chongying Xu
发明人： Luping Wang , Thomas H. Baum , Chongying Xu
IPC分类号： B01D7/00
CPC分类号： C23C16/4481 , B01D1/0082
摘要： A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.
摘要翻译：一种用于以对于半导体制造应用具有特殊用途的受控速率蒸发并递送蒸发的固体和液体前体材料的输送系统。该系统包括蒸发容器，处理工具和它们之间的连接蒸汽管线，其中系统还包括输入流量控制器和/或输出流量控制器，以向蒸发容器提供可蒸发的源材料的受控输送，蒸发的原料流向加工工具的流量。

8. 发明申请

US20050263075A1 Delivery systems for efficient vaporization of precursor source material 有权
标题翻译：用于高效蒸发前体源材料的输送系统
公开(公告)号：US20050263075A1
公开(公告)日：2005-12-01
申请号：US11157733
申请日：2005-06-21
申请人： Luping Wang , Thomas Baum , Chongying Xu
发明人： Luping Wang , Thomas Baum , Chongying Xu
IPC分类号： B01D1/00 , B01D7/00 , C23C14/00 , C23C16/00 , C23C16/448
CPC分类号： C23C16/4481 , B01D1/0082
摘要： A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.
摘要翻译：一种用于以对于半导体制造应用具有特殊用途的受控速率蒸发并递送蒸发的固体和液体前体材料的输送系统。该系统包括蒸发容器，处理工具和它们之间的连接蒸汽管线，其中系统还包括输入流量控制器和/或输出流量控制器，以向蒸发容器提供可蒸发的源材料的受控输送，蒸发的原料流向加工工具的流量。

9. 发明授权

US06620225B2 Adsorbents for low vapor pressure fluid storage and delivery 有权
标题翻译：用于低蒸汽压液体储存和输送的吸附剂
公开(公告)号：US06620225B2
公开(公告)日：2003-09-16
申请号：US10043731
申请日：2002-01-10
申请人： Luping Wang , Doug Neugold
发明人： Luping Wang , Doug Neugold
IPC分类号： B01D5304
CPC分类号： F17C11/007 , F17C11/00 , F17C2205/0338 , F17C2205/0391 , F17C2270/0518 , Y02E60/321 , Y10S95/90 , Y10S502/526
摘要： The invention relates to a fluid storage and delivery system utilizing a porous metal matrix that comprises at least one Group VIII metal or Group IB metal therein. In one aspect of the invention, such porous metal matrix forms a solid-phase metal adsorbent medium, characterized by an average pore diameter of from about 0.5 nm to about 2.0 nm and a porosity of from about 10% to about 30%. Such solid-phase metal adsorbent medium is particularly useful for sorptively storing and desoprotively dispensing a low vapor pressure fluid, e.g., ClF3, HF, GeF4, Br2, etc. In another aspect of the invention, such porous metal matrix forms a solid-phase metal sorbent, characterized by an average pore diameter of from about 0.25 &mgr;m to about 500 &mgr;m and a porosity of from about 15% to about 95%, which can effectively immobilize low vapor pressure liquefied gas.
摘要翻译：本发明涉及一种利用多孔金属基质的流体储存和输送系统，该多孔金属基质包含至少一种第VIII族金属或IB族金属。在本发明的一个方面，这种多孔金属基质形成固相金属吸附剂介质，其特征在于平均孔径为约0.5nm至约2.0nm，孔隙率为约10％至约30％。这样的固相金属吸附剂介质特别适用于吸附储存和反向分配低蒸气压流体，例如ClF 3，HF，GeF 4，Br 2等。在本发明的另一方面，这种多孔金属基质形成固相金属吸附剂，其特征在于平均孔径为约0.25μm至约500μm，孔隙率为约15％至约95％，其可以有效地固定低蒸气压液化气体。

10. 发明申请

US20090272272A1 SEMICONDUCTOR MANUFACTURING FACILITY UTILIZING EXHAUST RECIRCULATION 有权
标题翻译：半导体制造设施利用排气回收
公开(公告)号：US20090272272A1
公开(公告)日：2009-11-05
申请号：US12364800
申请日：2009-02-03
申请人： W. Karl Olander , Joseph D. Sweeney , Luping Wang
发明人： W. Karl Olander , Joseph D. Sweeney , Luping Wang
IPC分类号： B03C3/38 , B01D50/00
CPC分类号： C23C14/48 , B01D53/74 , C23C14/564 , Y10S438/905 , Y10S438/909
摘要： A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.
摘要翻译：一种半导体制造工艺设备，其中需要使用其中的排气用于其操作，这种设施包括洁净室和灰色房间部件，洁净室在其中具有至少一个半导体制造工具，并且其中排气流过干净的区域房间。该设施包括排气处理设备，其布置成（i）在其流过所述洁净室的所述区域之后接收排气，（ii）产生经处理的排气，以及（iii）将经处理的排气再循环到环境空气环境在设施中，例如，到设施的灰色房间。

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