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1. 发明授权

US08294125B2 High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture 有权
标题翻译：高灵敏度和高通量的电子束检查柱，通过可调节的光束限制孔径实现
公开(公告)号：US08294125B2
公开(公告)日：2012-10-23
申请号：US12634444
申请日：2009-12-09
申请人： Liqun Han , Marian Mankos , Xinrong Jiang , Rex Runyon , John Greene
发明人： Liqun Han , Marian Mankos , Xinrong Jiang , Rex Runyon , John Greene
IPC分类号： H01J37/20 , H01J37/29 , G01N23/225
CPC分类号： H01J37/09 , G01B15/00 , H01J37/28 , H01J2237/0455 , H01J2237/0458 , H01J2237/2817 , H01L22/12
摘要： One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.
摘要翻译：一个实施例涉及一种用于缺陷检查和/或检查基板或用于测量基板上的特征的关键尺寸的电子束装置。该装置包括电子枪和电子柱。电子枪包括被配置为产生用于电子束的电子的电子源和可调节的光束限制孔，其被配置为从一定范围的孔径尺寸中选择和使用一个孔径尺寸。另一实施例涉及在装置中提供电子束。有利地，所公开的装置和方法在保持高光束电流的同时减少斑点模糊，以便获得高灵敏度和高吞吐量。

2. 发明授权

US08461526B2 Electron beam column and methods of using same 有权
标题翻译：电子束柱及其使用方法
公开(公告)号：US08461526B2
公开(公告)日：2013-06-11
申请号：US12958174
申请日：2010-12-01
申请人： Marian Mankos , Liqun Han , Xinrong Jiang , Rex Runyon , Carmela Moreno
发明人： Marian Mankos , Liqun Han , Xinrong Jiang , Rex Runyon , Carmela Moreno
IPC分类号： G01N23/00
CPC分类号： H01J37/04 , H01J2237/0458 , H01J2237/0492 , H01J2237/063 , H01J2237/1035 , H01J2237/14 , H01J2237/186 , H01J2237/24535
摘要： In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.
摘要翻译：在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。发射电子的源被定位在第一真空室内。光束限制孔被配置成通过发射电子的有限角度范围。磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。可控制偏转器被配置为在衬底表面的区域上扫描束斑。还公开了其它特征和实施例。

3. 发明授权

US07821187B1 Immersion gun equipped electron beam column 有权
标题翻译：沉枪配电子束柱
公开(公告)号：US07821187B1
公开(公告)日：2010-10-26
申请号：US12204841
申请日：2008-09-05
申请人： Xinrong Jiang , Marian Mankos , Liqun Han
发明人： Xinrong Jiang , Marian Mankos , Liqun Han
IPC分类号： H01J27/02
CPC分类号： H01J37/063 , H01J37/145
摘要： An electron gun of the type having an electron emitter for emitting electrons, including an electrostatic lens and a magnetic lens formed by pole pieces with a winding coil disposed between the magnetic pole pieces. The magnetic lens forms a rotationally symmetrical magnetic field in a gap formed by the pole pieces. The magnetic field forms the magnetic lens and focuses the electrons emitted from the emitter. A vacuum tube separates the electron gun from the magnetic lens. The electron gun is sealed in a vacuum by the vacuum tube and the magnetic lens is shielded in air.
摘要翻译：一种具有用于发射电子的电子发射器的电子枪，包括静电透镜和由极片形成的磁性透镜，该磁极具有设置在磁极片之间的绕组线圈。磁性透镜在由极片形成的间隙中形成旋转对称的磁场。磁场形成磁透镜并聚焦从发射器发射的电子。真空管将电子枪与磁性透镜分开。电子枪由真空管密封在真空中，磁性透镜在空气中被屏蔽。

4. 发明授权

US08092927B2 Shielding, particulate reducing high vacuum components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US08092927B2
公开(公告)日：2012-01-10
申请号：US13034770
申请日：2011-02-25
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： B32B15/04 , B32B15/18 , F16C29/00 , F16C29/02
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种形成用于电子枪的高真空环境中的闸阀的方法，该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯，并且具有拉伸强度强度为约750兆帕，加工镍铁包层，将芯焊接到包层以形成闸阀，并加工闸阀，以消除芯和包层之间的界面处的任何尺寸差异。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后一部分提供了由镍合金壳提供的场屏蔽，由非磁性合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，该合金具有低氧化速度的优点，所以由于诸如电子束轰击的条件，存在较少的污染物积聚。

5. 发明授权

US07919193B1 Shielding, particulate reducing high vacuum components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US07919193B1
公开(公告)日：2011-04-05
申请号：US11877713
申请日：2007-10-24
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： B32B15/04 , B32B15/18
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A component for use in a high vacuum environment, the component including a core of non-magnetic Hastelloy with a cladding of nickel-iron covering the core at least in part. The component can be, for example, at least one of a gate valve for use in a high vacuum environment of an electron gun, a bearing, a slide way, a gate valve bearing, a rotary slide, a linear slide, an electron beam column, and electron beam chamber, and a vacuum chamber. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic Hastelloy, good vacuum performance, and tight mechanical tolerance control. Also, because Hastelloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种用于高真空环境的部件，该部件包括非磁性哈氏合金的核心，其中镍铁包层至少部分地覆盖芯部。该部件可以是例如用于电子枪的高真空环境中的闸阀中的至少一个，轴承，滑动方式，闸阀轴承，旋转滑块，线性滑块，电子束柱和电子束室，以及真空室。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后部分提供了由镍合金壳提供的场屏蔽，由非磁性哈氏合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，哈氏合金具有低氧化速度的优点，因为诸如电子束轰击的条件，污染物积聚较少。

6. 发明申请

US20110142382A1 Shielding, Particulate Reducing High Vacuum Components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US20110142382A1
公开(公告)日：2011-06-16
申请号：US13034770
申请日：2011-02-25
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： F16C29/00 , B23K31/02 , B32B15/00
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种形成用于电子枪的高真空环境中的闸阀的方法，该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯，并且具有拉伸强度强度为约750兆帕，加工镍铁包层，将芯焊接到包层以形成闸阀，并加工闸阀，以消除芯和包层之间的界面处的任何尺寸差异。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后一部分提供了由镍合金壳提供的场屏蔽，由非磁性合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，该合金具有低氧化速度的优点，所以由于诸如电子束轰击的条件，存在较少的污染物积聚。

7. 发明授权

US08258474B1 Compact arrangement for dual-beam low energy electron microscope 有权
标题翻译：双光束低能电子显微镜的紧凑布置
公开(公告)号：US08258474B1
公开(公告)日：2012-09-04
申请号：US13071412
申请日：2011-03-24
申请人： Marian Mankos
发明人： Marian Mankos
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , H01J37/04 , H01J37/252 , H01J2237/04926 , H01J2237/2538
摘要： One embodiment relates to an apparatus for generating two spatially overlapping electron beams on a specimen. A first electron beam source is configured to generate a low-energy electron beam, and an energy-dispersive device bends the low-energy electron beam towards an semitransparent electron mirror. The semitransparent electron mirror is biased to reflect the low-energy electron beam. A second electron beam source is configured to generate a high-energy electron beam that passes through an opening in the semitransparent electron mirror. Both the low- and high-energy electron beams enter the same energy-dispersive device that bends both beams towards the specimen. A deflection system positioned between the high-energy electron source and semitransparent electron mirror is configured to deflect the high-energy electron beam by an angle that compensates for the difference in bending angles between the low- and high-energy electron beams introduced by the energy-dispersive device. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及用于在样本上产生两个空间上重叠的电子束的装置。第一电子束源被配置为产生低能电子束，并且能量分散器件将低能电子束弯曲成半透明电子镜。半透明电子镜被偏置以反射低能电子束。第二电子束源被配置为产生穿过半透明电子反射镜中的开口的高能电子束。低能量和高能量电子束都进入同样的能量分散装置，使两个光束朝向样品弯曲。位于高能电子源和半透明电子反射镜之间的偏转系统被配置为使高能电子束偏转角度，该角度补偿由能量引入的低能量和高能量电子束之间的弯曲角度的差异 - 分散设备还公开了其他实施例。

8. 发明授权

US07692167B1 High-fidelity reflection electron beam lithography 失效
标题翻译：高保真反射电子束光刻
公开(公告)号：US07692167B1
公开(公告)日：2010-04-06
申请号：US11588492
申请日：2006-10-26
申请人： Marian Mankos
发明人： Marian Mankos
IPC分类号： H01J37/302
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/30483 , H01J2237/31789
摘要： One embodiment pertains to an apparatus for reflection electron beam lithography, including at least illumination electron-optics, an electron-reflective pattern generator, projection electron-optics, a moving stage holding a target substrate, control circuitry, and a deflection system. The illumination electron-optics is configured to form an illumination electron beam. The electron-reflective pattern generator configured to generate an electron-reflective pattern of pixels and to reflect the illumination electron beam using the pattern to form a patterned electron beam. The projection electron-optics is configured to project the patterned electron beam onto the moving target substrate. The control circuitry is configured to shift the generated pattern in discrete steps in synchronization with the stage motion. The deflection system is configured to deflect said projected patterned electron beam so as to compensate for said stage motion in between discrete shifts of said generated pattern. Other features and embodiments are also disclosed.
摘要翻译：一个实施例涉及用于反射电子束光刻的装置，至少包括照明电子光学，电子反射图案发生器，投射电子光学，保持目标衬底的移动台，控制电路和偏转系统。照明电子光学被配置为形成照明电子束。电子反射型图形发生器被配置为产生像素的电子反射图案并且使用该图案反射照射电子束以形成图案化的电子束。投影电子学被配置为将图案化电子束投影到移动目标衬底上。控制电路被配置为与台阶运动同步地以离散步进移位生成的图案。偏转系统被配置为偏转所述投影的图案化电子束，以补偿所述生成图案的离散位移之间的所述阶段运动。还公开了其它特征和实施例。

9. 发明授权

US07217924B1 Holey mirror arrangement for dual-energy e-beam inspector 有权
标题翻译：双能量电子束检查器的多孔镜配置
公开(公告)号：US07217924B1
公开(公告)日：2007-05-15
申请号：US11205367
申请日：2005-08-16
申请人： Marian Mankos , Eric Munro
发明人： Marian Mankos , Eric Munro
IPC分类号： H01J37/26 , G01N23/225
CPC分类号： H01J37/05 , H01J37/147 , H01J37/153 , H01J37/26 , H01J37/29 , H01J2237/0044 , H01J2237/063 , H01J2237/151 , H01J2237/2446 , H01J2237/262
摘要： One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam source is configured to generate a higher-energy electron beam. A holey mirror is biased to reflect the lower-energy electron beam. The holey mirror also includes an opening therein through which passes the higher-energy electron beam, thereby forming the dual-energy electron beam. A prism array combiner introduces a first dispersion between the lower-energy electron beam and the higher-energy electron beam within the dual-energy electron beam. A prism array separator is configured to separate the dual-energy electron beam traveling to a substrate from a scattered electron beam traveling away from the substrate. The prism array separator introduces a second dispersion which compensates for the dispersion of the prism array combiner. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及一种用于产生双能量电子束的装置。第一电子束源被配置为产生较低能量的电子束，并且第二电子束源被配置为产生较高能量的电子束。有孔镜被偏置以反射较低能量的电子束。多孔镜还包括其中通过高能电子束的开口，从而形成双能电子束。棱镜阵列组合器在双能电子束内引入低能电子束与高能电子束之间的第一色散。棱镜阵列分离器被配置为将从衬底传播的散射电子束分离到衬底行进的双能电子束。棱镜阵列分离器引入补偿棱镜阵列组合器的色散的第二色散。还公开了其他实施例。

10. 发明授权

US06538256B1 Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance 失效
标题翻译：使用具有用于产生透射共振的孔径图案的光电阴极的电子束光刻系统
公开(公告)号：US06538256B1
公开(公告)日：2003-03-25
申请号：US09641099
申请日：2000-08-17
申请人： Marian Mankos , Vidhya Krishnamurthi , Kim Y. Lee
发明人： Marian Mankos , Vidhya Krishnamurthi , Kim Y. Lee
IPC分类号： H01J3708
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70375 , H01J1/34 , H01J37/073 , H01J37/3175 , H01J2237/31779
摘要： A method and system for electron beam lithography at high throughput with shorter electron beam column length, reduced electron-electron interactions, and higher beam current. The system includes a photocathode having a pattern composed of a periodic array of apertures with a specific geometry. The spacing of the apertures is chosen so as to maximize the transmission of the laser beam through apertures significantly smaller than the photon wavelength. The patterned photocathode is illuminated by an array of laser beams to allow blanking and gray-beam modulation of the individual beams at the source level by the switching of the individual laser beams in the array. Potential applications for this invention include electron beam direct write on wafers and mask patterning.
摘要翻译：用于电子束光刻的方法和系统，其具有较短的电子束柱长度，减少的电子 - 电子相互作用和更高的束电流。该系统包括具有由具有特定几何形状的周期性孔径阵列组成的图案的光电阴极。选择孔的间距以便通过明显小于光子波长的孔的最大化激光束的透射。图案化的光电阴极被激光束阵列照射，以通过阵列中的各个激光束的切换来允许源极处的各个光束的消隐和灰光束调制。本发明的潜在应用包括晶片上的电子束直接写入和掩模图案化。

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