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1. 发明授权

US07191520B2 Method of optmizing inkjet printheads using a plasma-etching process 失效
标题翻译：使用等离子体蚀刻工艺优化喷墨打印头的方法
公开(公告)号：US07191520B2
公开(公告)日：2007-03-20
申请号：US10795050
申请日：2004-03-05
申请人： Lingadahalli G. Shantharama , John A. Lebens , Thomas M. Stephany
发明人： Lingadahalli G. Shantharama , John A. Lebens , Thomas M. Stephany
IPC分类号： B21D53/76 , G01D15/00
CPC分类号： B41J2/1603 , B41J2/1628 , Y10T29/49005 , Y10T29/49128 , Y10T29/4913 , Y10T29/49401
摘要： A method for creating an inkjet chamber. The method comprises the steps of firstly providing a substrate having a nozzle opening and secondly etching the substrate through the nozzle opening by alternating between anisotropic and isotropic etching processes for forming a chamber having a shape approximating a cylinder by using multiple hemispheric etches.
摘要翻译：一种用于产生喷墨室的方法。该方法包括以下步骤：首先提供具有喷嘴开口的基板，并且通过使用多个半球蚀刻形成具有接近圆柱形状的室的各向异性和各向同性蚀刻工艺之间的交替，通过喷嘴开口二次蚀刻基板。

2. 发明授权

US07600856B2 Liquid ejector having improved chamber walls 有权
标题翻译：液体喷射器具有改进的室壁
公开(公告)号：US07600856B2
公开(公告)日：2009-10-13
申请号：US11609365
申请日：2006-12-12
申请人： John A. Lebens , Lingadahalli G. Shantharama
发明人： John A. Lebens , Lingadahalli G. Shantharama
IPC分类号： B41J2/05
CPC分类号： B41J2/1404 , B41J2/14129 , B41J2/1603 , B41J2/1606 , B41J2/1628 , B41J2/1629 , B41J2/1639 , B41J2/1642 , B41J2/1646 , B41J2002/14403
摘要： A liquid drop ejector includes a substrate and a plurality of liquid chambers. Portions of the substrate define a liquid supply. Each liquid chamber is positioned over the substrate and includes a nozzle plate and a chamber wall. The nozzle plate and the chamber wall include an inorganic material. The inorganic material of the nozzle plate and the chamber wall is contactable with liquid when liquid is present in each liquid chamber. A region of organic material is positioned over the substrate and located relative to the nozzle plate and the chamber wall such that the region of organic material is not contactable with liquid when liquid is present in each liquid chamber. The region of organic material is bounded by chamber walls of neighboring liquid chambers located on opposite sides of the liquid supply.
摘要翻译：液滴喷射器包括基板和多个液体室。衬底的一部分限定了液体供应。每个液体室位于基板上方并且包括喷嘴板和室壁。喷嘴板和室壁包括无机材料。当液体存在于每个液体室中时，喷嘴板和室壁的无机材料可与液体接触。有机材料的区域位于衬底上并且相对于喷嘴板和室壁定位，使得当每个液体室中存在液体时，有机材料的区域不能与液体接触。有机材料的区域由位于液体供应的相对侧上的相邻液体室的室壁界定。

3. 发明申请

US20080136867A1 LIQUID EJECTOR HAVING IMPROVED CHAMBER WALLS 有权
标题翻译：具有改进的室壁的液体喷射器
公开(公告)号：US20080136867A1
公开(公告)日：2008-06-12
申请号：US11609365
申请日：2006-12-12
申请人： John A. Lebens , Lingadahalli G. Shantharama
发明人： John A. Lebens , Lingadahalli G. Shantharama
IPC分类号： B41J2/16
CPC分类号： B41J2/1404 , B41J2/14129 , B41J2/1603 , B41J2/1606 , B41J2/1628 , B41J2/1629 , B41J2/1639 , B41J2/1642 , B41J2/1646 , B41J2002/14403
摘要： A liquid drop ejector includes a substrate and a plurality of liquid chambers. Portions of the substrate define a liquid supply. Each liquid chamber is positioned over the substrate and includes a nozzle plate and a chamber wall. The nozzle plate and the chamber wall include an inorganic material. The inorganic material of the nozzle plate and the chamber wall is contactable with liquid when liquid is present in each liquid chamber. A region of organic material is positioned over the substrate and located relative to the nozzle plate and the chamber wall such that the region of organic material is not contactable with liquid when liquid is present in each liquid chamber. The region of organic material is bounded by chamber walls of neighboring liquid chambers located on opposite sides of the liquid supply.
摘要翻译：液滴喷射器包括基板和多个液体室。衬底的一部分限定了液体供应。每个液体室位于基板上方并且包括喷嘴板和室壁。喷嘴板和室壁包括无机材料。当液体存在于每个液体室中时，喷嘴板和室壁的无机材料可与液体接触。有机材料的区域位于衬底上并且相对于喷嘴板和室壁定位，使得当每个液体室中存在液体时，有机材料的区域不能与液体接触。有机材料的区域由位于液体供应的相对侧上的相邻液体室的室壁界定。

4. 发明授权

US07012942B2 Modulating the properties of the gain region at spaced locations in an organic vertical cavity laser array device 失效
标题翻译：在有机垂直腔激光器阵列器件的间隔位置调制增益区的属性
公开(公告)号：US07012942B2
公开(公告)日：2006-03-14
申请号：US10633196
申请日：2003-08-01
申请人： Keith B. Kahen , John A. Lebens , Lingadahalli G. Shantharama
发明人： Keith B. Kahen , John A. Lebens , Lingadahalli G. Shantharama
IPC分类号： H01S3/14
CPC分类号： H01S5/041 , H01S5/18383 , H01S5/36 , H01S5/423
摘要： A vertical cavity laser array device including a substrate, top and bottom dielectric stacks, and an active region for producing laser light. The active region includes one or more periodic gain region(s) and spacer layers disposed on either side of the periodic gain region(s) and arranged so that the periodic gain region(s) is aligned with the antinodes of the device's standing wave electromagnetic field. A structure is provided for modulating the properties of the periodic gain region(s) at spaced locations so as to provide an array of spaced laser pixels which have higher net gain than the interpixel regions; and the spaced laser pixels having the same or different sizes and the spacings between pixels having the same or different lengths to cause the output of the vertical cavity laser array device to produce single or multimode laser output.
摘要翻译：一种垂直腔激光器阵列器件，包括衬底，顶部和底部电介质堆叠以及用于产生激光的有源区域。有源区域包括一个或多个周期性增益区域和间隔层，其设置在周期性增益区域的两侧，并且被布置成使得周期性增益区域与器件驻波电磁波的波腹对准领域。提供了一种用于调制间隔位置处的周期性增益区域的特性的结构，以便提供具有比图像间隔区域更高的净增益的间隔开的激光像素阵列; 并且间隔开的激光像素具有相同或不同的尺寸以及具有相同或不同长度的像素之间的间距，以使垂直腔激光器阵列器件的输出产生单模或多模激光输出。

5. 发明授权

US07370944B2 Liquid ejector having internal filters 有权
标题翻译：液体喷射器具有内部过滤器
公开(公告)号：US07370944B2
公开(公告)日：2008-05-13
申请号：US10929816
申请日：2004-08-30
申请人： Antonio Cabal , Thomas M. Stephany , Roger G. Markham , John A. Lebens , William R. Zimmerli
发明人： Antonio Cabal , Thomas M. Stephany , Roger G. Markham , John A. Lebens , William R. Zimmerli
IPC分类号： B41J2/04 , B41J2/05
CPC分类号： B41J2/1404 , B41J2/14137 , B41J2002/14403
摘要： A liquid drop ejector is provided. The ejector includes a liquid chamber and a liquid supply. Portions of the liquid chamber define a nozzle bore. A liquid supply passageway is positioned between the liquid chamber and the liquid supply. The liquid supply passageway is in fluid communication with the liquid chamber and the liquid supply. A plurality of pillars is suspended in the liquid supply passageway. A wall of the liquid chamber can extend to the liquid supply passageway. A center pillar can also be included with a portion of the center pillar being positioned in the liquid chamber and another portion of the center pillar being positioned in the liquid supply passageway.
摘要翻译：提供液滴喷射器。喷射器包括液体室和液体供应源。液体室的一部分限定了喷嘴孔。液体供应通道位于液体室和液体供应源之间。液体供应通道与液体室和液体供应流体连通。多个支柱悬挂在液体供应通道中。液体室的壁可以延伸到液体供应通道。中心支柱也可以包括在中心柱的一部分位于液体室中，而另一部分中心柱定位在液体供应通道中。

6. 发明授权

US07029099B2 Method of producing ink jet chambers using photo-imageable materials 失效
标题翻译：使用可光成像材料制造喷墨室的方法
公开(公告)号：US07029099B2
公开(公告)日：2006-04-18
申请号：US10697595
申请日：2003-10-30
申请人： John A. Lebens , Thomas M. Stephany
发明人： John A. Lebens , Thomas M. Stephany
IPC分类号： B41J2/04
CPC分类号： B41J2/1603 , B41J2/1631
摘要： A method for creating one or more ink jet chambers, the method includes the steps of providing a substrate having a thermal element covered with substantially one type of uncured photo-imageable material; providing a first mask spanning the thermal element which creates both masked and unmasked uncured photo-imageable regions; exposing the unmasked photo-imageable region; providing a second mask covering at least a portion of the thermal element; exposing a portion of the remaining unexposed photo-imageable region for forming an output nozzle; curing the exposed portions of the photo-imageable material; and removing all the remaining uncured photo-imageable material for creating the ink jet chamber.
摘要翻译：一种用于产生一个或多个喷墨室的方法，所述方法包括提供具有被基本上一种类型的未固化可光成像材料覆盖的热元件的基板的步骤; 提供跨越热元件的第一掩模，其产生掩蔽和未掩模的未固化可光成像区域; 曝光未曝光的可光成像区域; 提供覆盖所述热元件的至少一部分的第二掩模; 暴露剩余的未曝光的可光成像区域的一部分以形成输出喷嘴; 固化可光成像材料的暴露部分; 并除去用于创建喷墨室的所有剩余的未固化的可光成像材料。

7. 发明授权

US08820883B2 Microfluidic device having improved epoxy layer adhesion 有权
标题翻译：具有改善的环氧树脂层粘附性的微流体装置
公开(公告)号：US08820883B2
公开(公告)日：2014-09-02
申请号：US13170693
申请日：2011-06-28
申请人： Yongcai Wang , Weibin Zhang , John A. Lebens , James D. Huffman , Robert E. McCovick
发明人： Yongcai Wang , Weibin Zhang , John A. Lebens , James D. Huffman , Robert E. McCovick
IPC分类号： B41J2/15 , B41J2/16
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/162 , B41J2/1623 , B41J2/1645
摘要： A microfluidic device includes a substrate; at least one inorganic layer provided on the substrate; a patterned epoxy layer formed over the at least one inorganic layer, the patterned epoxy layer including a wall that defines a location for a fluid in the microfluidic device; and an alkoxysilane material containing a primary or secondary amine for promoting adhesion between the at least one inorganic layer and the patterned epoxy layer.
摘要翻译：微流体装置包括：基底; 设置在基板上的至少一个无机层; 形成在所述至少一个无机层上的图案化环氧树脂层，所述图案化环氧树脂层包括限定所述微流体装置中的流体位置的壁; 和含有伯胺或仲胺的烷氧基硅烷材料，用于促进至少一个无机层和图案化的环氧树脂层之间的粘附。

8. 发明申请

US20140216790A1 CONDUCTIVE MICRO-WIRE STRUCTURE WITH OFFSET INTERSECTIONS 审中-公开
标题翻译：导电微结构与偏移相互作用
公开(公告)号：US20140216790A1
公开(公告)日：2014-08-07
申请号：US13759106
申请日：2013-02-05
申请人： David P. Trauernicht , John A. Lebens , Yongcai Wang
发明人： David P. Trauernicht , John A. Lebens , Yongcai Wang
IPC分类号： H05K1/02
CPC分类号： H05K1/0296 , G06F3/044 , H05K2201/09681
摘要： A conductive micro-wire structure includes a substrate and a plurality of micro-wires formed on or in the substrate in an intersecting pattern and forming intersection corners. A portion of a first micro-wire is coincident with a portion of a second micro-wire to form a coincident portion such that the coincident portion is non-visually resolvable by the human visual system and the coincident portion has a length greater than the sum of the widths of the first and second micro-wires or has one or more rounded intersection corners.
摘要翻译：导电微线结构包括基板和以交叉图案形成在基板上或基板上的多条微线，并形成交叉角。第一微线的一部分与第二微线的一部分重合，以形成重合部分，使得重合部分由人类视觉系统不可视地分辨，并且重合部分具有大于总和的长度的第一和第二微细线的宽度或具有一个或多个圆角交叉点。

9. 发明申请

US20110261126A1 PRINTHEAD INCLUDING POLYMERIC FILTER 审中-公开
标题翻译：包括聚合物过滤器
公开(公告)号：US20110261126A1
公开(公告)日：2011-10-27
申请号：US12767827
申请日：2010-04-27
申请人： Charles F. Faisst , John A. Lebens , Yonglin Xie
发明人： Charles F. Faisst , John A. Lebens , Yonglin Xie
IPC分类号： B41J2/175
CPC分类号： B41J2/09 , B41J2002/14403
摘要： A printhead includes a substrate and a filter membrane structure in contact with the substrate. A first portion of the substrate defines a plurality of nozzles. A second portion of the substrate defines a plurality of liquid chambers. Each liquid chamber is in fluid communication with a nozzle. The filter membrane structure includes a polymeric material layer and a plurality of pores. The plurality of pores are positioned to filter liquid provided to the plurality of liquid chambers.
摘要翻译：打印头包括与基板接触的基板和滤膜结构。衬底的第一部分限定多个喷嘴。衬底的第二部分限定多个液体室。每个液体室与喷嘴流体连通。过滤膜结构包括聚合材料层和多个孔。多个孔定位成过滤设置到多个液体室的液体。

10. 发明授权

US07836600B2 Fluid ejector having an anisotropic surface chamber etch 有权
标题翻译：具有各向异性表面腔蚀刻的流体喷射器
公开(公告)号：US07836600B2
公开(公告)日：2010-11-23
申请号：US11685259
申请日：2007-03-13
申请人： James M. Chwalek , John A. Lebens , Christopher N. Delametter , David P. Trauernicht , Gary A. Kneezel
发明人： James M. Chwalek , John A. Lebens , Christopher N. Delametter , David P. Trauernicht , Gary A. Kneezel
IPC分类号： B23P17/00 , B21D53/76 , B41J2/14 , B41J2/16
CPC分类号： B41J2/1601 , B41J2/14137 , B41J2/1628 , B41J2/1629 , B41J2/1635 , B41J2/1637 , B41J2002/1437 , B41J2002/14467 , Y10T29/49401
摘要： A method of forming a fluid chamber and a source of fluid impedance includes providing a substrate having a surface; depositing a first material layer on the surface of the substrate, the first material layer being differentially etchable with respect to the substrate; removing a portion of the first material layer thereby forming a patterned first material layer and defining the fluid chamber boundary location; depositing a sacrificial material layer over the patterned first layer; removing a portion of the sacrificial material layer thereby forming a patterned sacrificial material layer and further defining the fluid chamber boundary location; depositing at least one additional material layer over the patterned sacrificial material layer; forming a hole extending from the at least one additional material layer to the sacrificial material layer, the hole being positioned within the fluid chamber boundary location; removing the sacrificial material layer in the fluid chamber boundary location by introducing an etchant through the hole; forming the fluid chamber by introducing an etchant through the hole; and forming a source of fluid impedance.
摘要翻译：形成流体室和流体阻抗源的方法包括提供具有表面的基底; 在所述衬底的表面上沉积第一材料层，所述第一材料层相对于所述衬底可差分蚀刻; 去除第一材料层的一部分，从而形成图案化的第一材料层并限定流体室边界位置; 在所述图案化的第一层上沉积牺牲材料层; 去除牺牲材料层的一部分，从而形成图案化的牺牲材料层并进一步限定流体室边界位置; 在图案化的牺牲材料层上沉积至少一个附加材料层; 形成从所述至少一个附加材料层延伸到所述牺牲材料层的孔，所述孔位于所述流体室边界位置内; 通过在孔中引入蚀刻剂来除去流体室边界位置中的牺牲材料层; 通过在孔中引入蚀刻剂来形成流体室; 并形成流体阻抗源。

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