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1. 发明授权

US09256138B2 Method for measuring distortion of projection objective 有权
标题翻译：测量投影物镜失真的方法
公开(公告)号：US09256138B2
公开(公告)日：2016-02-09
申请号：US14002917
申请日：2012-03-21
申请人： Li Fang , Gang Sun , Jinhua Min , Jun Zhang
发明人： Li Fang , Gang Sun , Jinhua Min , Jun Zhang
IPC分类号： G03F7/20 , G03F1/44
CPC分类号： G03F7/706 , G03F1/44 , G03F7/70633 , G03F7/70725
摘要： A method for measuring distortion of a projection objective, which includes: obtaining a plurality of first positional deviations between two groups of patterns formed respectively after two exposures performed in a same exposure field during a stepping and exposing process of the reticle stage (S21); obtaining a plurality of second positional deviations between two groups of patterns formed respectively after another two exposures performed in a same exposure field during a stepping and exposing process of the workpiece stage (S22); subtracting motional errors of the reticle stage and/or workpiece stage from each of the plurality of first and second positional deviations to obtain corresponding first and second corrected deviations (S43, S44); calculating differences each between a pair of corrected deviations (S45); and calculating the distortion of the projection objective by a fitting process (S46).
摘要翻译：一种用于测量投影物镜的失真的方法，包括：在所述标线片平台的步进和曝光处理期间，在相同的曝光场中执行的两次曝光之后分别得到两组图案之间的多个第一位置偏差; 在工件台阶的步进和曝光过程中分别在相同曝光场中执行的另外两次曝光之后形成的两组图案之间获得多个第二位置偏差; 从所述多个第一和第二位置偏差中的每一个减去所述标线片台和/或工件台的运动误差，以获得对应的第一和第二校正偏差（S43，S44）; 计算一对校正偏差之间的差异（S45）; 以及通过拟合处理计算投影物镜的失真（S46）。

2. 发明申请

US20130335718A1 METHOD FOR MEASURING DISTORTION OF PROJECTION OBJECTIVE 有权
标题翻译：用于测量投影目标失真的方法
公开(公告)号：US20130335718A1
公开(公告)日：2013-12-19
申请号：US14002917
申请日：2012-03-21
申请人： Li Fang , Gang Sun , Jinhua Min , Jun Zhang
发明人： Li Fang , Gang Sun , Jinhua Min , Jun Zhang
IPC分类号： G03F1/44
CPC分类号： G03F7/706 , G03F1/44 , G03F7/70633 , G03F7/70725
摘要： A method for measuring distortion of a projection objective, which includes: obtaining a plurality of first positional deviations between two groups of patterns formed respectively after two exposures performed in a same exposure field during a stepping and exposing process of the reticle stage (S21); obtaining a plurality of second positional deviations between two groups of patterns formed respectively after another two exposures performed in a same exposure field during a stepping and exposing process of the workpiece stage (S22); subtracting motional errors of the reticle stage and/or workpiece stage from each of the plurality of first and second positional deviations to obtain corresponding first and second corrected deviations (S43, S44); calculating differences each between a pair of corrected deviations (S45); and calculating the distortion of the projection objective by a fitting process (S46).
摘要翻译：一种用于测量投影物镜的失真的方法，包括：在所述标线片平台的步进和曝光处理期间，在相同的曝光场中执行的两次曝光之后分别得到两组图案之间的多个第一位置偏差; 在工件台阶的步进和曝光过程中分别在相同曝光场中执行的另外两次曝光之后形成的两组图案之间获得多个第二位置偏差; 从所述多个第一和第二位置偏差中的每一个减去所述标线片台和/或工件台的运动误差，以获得对应的第一和第二校正偏差（S43，S44）; 计算一对校正偏差之间的差异（S45）; 以及通过拟合处理计算投影物镜的失真（S46）。

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