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    • 1. 发明专利
    • Array substrate for liquid crystal display device and fabrication method thereof
    • 用于液晶显示装置的阵列基板及其制造方法
    • JP2007219493A
    • 2007-08-30
    • JP2006328649
    • 2006-12-05
    • Lg Philips Lcd Co Ltdエルジー フィリップス エルシーディー カンパニー リミテッド
    • OH JAE YOUNGKIM SOO POOL
    • G02F1/1368G02F1/1343H01L21/3205H01L23/52H01L29/423H01L29/49
    • H01L27/124H01L27/1288
    • PROBLEM TO BE SOLVED: To provide an array substrate for a liquid crystal display device with improved productivity by reducing the number of mask processes. SOLUTION: The array substrate includes: a gate line 221 and a gate electrode 222 extending from the gate line 221 formed on a substrate; a data line 261 intersected with the gate line 221 and configured with a gate insulating layer 230, a semiconductor layer 240 and a data metal layer 260; a pixel electrode 281 formed of a first transparent metal layer 281a at a pixel which is defined by the gate line 221 and data line 261; a source electrode 262 extending from the data line 261, and a drain electrode 263 spaced apart from the source electrode 262 to expose a channel; a pattern of a second transparent metal layer 291 formed on the data line 261, the source electrode 262 and the drain electrode 263, and the gate line 221, connecting the drain electrode 263 to the pixel electrode 281m, and having a cut portion over the gate line 221; and a partition wall 293 formed near the second transparent metal layer 291 on the pixel electrode 281. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:通过减少掩模过程的数量来提供一种通过降低生产率的液晶显示装置的阵列基板。 解决方案:阵列基板包括:栅极线221和从形成在基板上的栅极线221延伸的栅电极222; 与栅极线221相交并配置有栅极绝缘层230,半导体层240和数据金属层260的数据线261; 在由栅极线221和数据线261限定的像素处由第一透明金属层281a形成的像素电极281; 从数据线261延伸的源电极262以及与源电极262间隔开以露出沟道的漏电极263; 形成在数据线261上的第二透明金属层291,源电极262和漏电极263以及连接漏电极263与像素电极281m的栅极线221的图案,并且在第 栅极线221; 以及形成在像素电极281上的第二透明金属层291附近的分隔壁293。版权所有(C)2007,JPO&INPIT
    • 3. 发明公开
    • THIN FILM TRANSISTOR ARRAY SBUSTRATE AND FABRICATING METHOD THEREOF
    • 薄膜晶体管阵列及其制作方法
    • KR20070078472A
    • 2007-08-01
    • KR20060008708
    • 2006-01-27
    • LG PHILIPS LCD CO LTD
    • KIM SOO POOLOH JAE YOUNG
    • H01L29/786
    • G02F1/13458G02F1/136227G02F1/136286
    • A TFT(Thin Film Transistor) array substrate and its manufacturing method are provided to improve the stability of a substrate manufacturing process and to prevent the failure of contact between upper and lower electrodes due to undercut by preventing the generation of the undercut at a predetermined portion between a gate insulating layer and an inorganic protection layer using an improved contact hole structure composed of a contact hole lower portion and a contact hole upper portion with a large width compared to that of the contact hole lower portion. A gate line is formed on a lower substrate. An organic gate insulating layer(146) is formed on the resultant structure to cover the gate line. An inorganic protection layer(152) is formed on the organic gate insulating layer. A gate pad lower electrode(126) is formed on the resultant structure to be connected with the gate line. A first contact hole for exposing the gate pad lower electrode is formed through the inorganic protection layer and the organic gate insulating layer. A gate pad upper electrode(128) is connected to the gate pad lower electrode through the first contact hole. The first contact hole is composed of a lower portion and an upper portion. The width of the upper portion is larger than that of the lower portion in the first contact hole.
    • 提供TFT(薄膜晶体管)阵列基板及其制造方法以提高基板制造工艺的稳定性,并且通过防止在预定部分产生底切来防止由于底切而引起的上下电极之间的接触故障 使用与接触孔下部相比具有大的宽度的接触孔下部和接触孔上部构成的改进的接触孔结构,在栅极绝缘层和无机保护层之间。 栅极线形成在下基板上。 在所得结构上形成有机栅极绝缘层(146)以覆盖栅极线。 在有机栅极绝缘层上形成无机保护层(152)。 在所得结构上形成栅极焊盘下电极(126)以与栅极线连接。 通过无机保护层和有机栅极绝缘层形成用于暴露栅极焊盘下部电极的第一接触孔。 栅极焊盘上部电极(128)通过第一接触孔与栅极焊盘下部电极连接。 第一接触孔由下部和上部构成。 上部的宽度大于第一接触孔中的下部的宽度。
    • 4. 发明公开
    • LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME
    • 液晶显示装置及其制造方法
    • KR20070112989A
    • 2007-11-28
    • KR20060046634
    • 2006-05-24
    • LG PHILIPS LCD CO LTD
    • OH JAE YOUNGJEE YOUNG SEUNGKIM JEONG OHKIM SOO POOL
    • G02F1/136
    • G02F1/136286G02F1/1335G02F2001/136231H01L29/786
    • An LCD and a manufacturing method thereof are provided to form PR patterns with different heights by using an exposure device including a DMD(Digital Micro mirror Device) chip, thereby reducing the number of masks by not using a diffraction photo mask or a semitransparent mask and accordingly, manufacturing a TFT(Thin Film Transistor) substrate without using the exposure device with the DMD in all manufacturing processes. A method for manufacturing an LCD(Liquid Crystal Display) comprises the following steps of: providing an exposure device(100) where a light source and plural minute mirrors are arranged, wherein the plural minute mirrors are separately and electrically controlled to reflect light from the light source toward a position of a target selectively; forming at least one thin film(221,223) on a substrate(201) for the LCD; forming PR(PhotoResist) on the thin film; arranging the substrate on the position of the target; and driving the light source, controlling each of the minute mirrors of the exposure device, radiating light to the first position of the PR with first light intensity, and radiating light to the second position of the PR with second light intensity; developing the PR and remaining PR patterns(225a,225b) with different heights on the thin film; and patterning the thin film by using the PR patterns as a mask.
    • 提供LCD及其制造方法,通过使用包括DMD(数字微镜装置)芯片的曝光装置形成具有不同高度的PR图案,从而通过不使用衍射光掩模或半透明掩模来减少掩模的数量, 因此,在所有制造工艺中不使用具有DMD的曝光装置制造TFT(薄膜晶体管)基板。 一种用于制造LCD(液晶显示器)的方法包括以下步骤:提供设置有光源和多个分钟镜的曝光装置(100),其中多个分钟反射镜被分开并电控制以反射来自 选择性地朝向目标位置的光源; 在用于所述LCD的基板(201)上形成至少一个薄膜(221,223); 在薄膜上形成PR(PhotoResist); 将基板布置在目标的位置上; 并驱动光源,控制曝光装置的每个微反射镜,以第一光强度将光照射到PR的第一位置,并以第二光强度将光照射到PR的第二位置; 在薄膜上开发不同高度的PR和剩余PR图案(225a,225b); 并通过使用PR图案作为掩模对薄膜进行图案化。