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    • 1. 发明专利
    • Thin film transistor, method of manufacturing the same, and display element
    • 薄膜晶体管,其制造方法和显示元件
    • JP2008016807A
    • 2008-01-24
    • JP2006348032
    • 2006-12-25
    • Lg Philips Lcd Co Ltdエルジー フィリップス エルシーディー カンパニー リミテッド
    • SAI MOTONARIHEO JAE SEOKJUN WOONG GI
    • H01L29/786H01L21/312H01L21/316H01L21/318H01L21/336
    • H01L29/78669H01L27/1248H01L27/1292H01L29/458H01L29/4908H01L29/66765H01L51/0533H01L51/0545
    • PROBLEM TO BE SOLVED: To provide a thin film transistor, a method of manufacturing the same, and a display element which can obtain a gate insulating film with a high dielectric constant by stacking a first gate insulating film of sol-gel type with a high dielectric constant and a second gate insulating film made of amorphous silicon or a polymeric organic substance with a relatively low dielectric constant, so that the gate insulating film having a double layer is formed. SOLUTION: The method of manufacturing the thin film transistor includes the steps of: forming a gate electrode on a substrate; forming a semiconductor layer which is insulated from the gate electrode and partially overlaps the gate electrode; forming a first gate insulating film and a second gate insulating film in this order between the gate electrode and the semiconductor layer, the first gate insulating film containing a sol compound of silicon alkoxide and metal alkoxide, the second gate insulating film containing a different substance; and forming source/drain electrodes on both sides of the semiconductor layer. COPYRIGHT: (C)2008,JPO&INPIT
    • 解决的问题:为了提供薄膜晶体管及其制造方法,以及通过层叠溶胶凝胶型第一栅极绝缘膜,能够获得具有高介电常数的栅极绝缘膜的显示元件 具有高介电常数和由非晶硅或具有相对低的介电常数的聚合有机物质制成的第二栅极绝缘膜,从而形成具有双层的栅极绝缘膜。 解决方案:制造薄膜晶体管的方法包括以下步骤:在衬底上形成栅电极; 形成与栅电极绝缘并部分地与栅电极重叠的半导体层; 在栅极和半导体层之间依次形成第一栅极绝缘膜和第二栅极绝缘膜,第一栅极绝缘膜含有硅醇盐和金属醇盐的溶胶化合物,第二栅极绝缘膜含有不同的物质; 以及在半导体层的两侧形成源/漏电极。 版权所有(C)2008,JPO&INPIT