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    • 4. 发明专利
    • Light emitting element, and its manufacturing method
    • 发光元件及其制造方法
    • JP2007227939A
    • 2007-09-06
    • JP2007045407
    • 2007-02-26
    • Lg Electronics IncLg Innotek Co Ltdエルジー イノテック カンパニー リミテッドエルジー エレクトロニクス インコーポレイティド
    • KIN SHOKYOKUCHO HYUN KYONGCHO SHUNGO
    • H01L33/12H01L33/32
    • H01L33/08H01L33/20
    • PROBLEM TO BE SOLVED: To provide a light emitting element which enables light generated from an active layer to be emitted outside before it is absorbed and scattered inside the element and is reduced to a prescribed intensity or less by forming at least one mutually isolated groove by etching from a transparent electrode (or an ohmic layer) to a part of an n-type semiconductor layer, and can improve light extraction efficiency, and to provide its manufacturing method. SOLUTION: The light emitting element is constituted by comprising a nitride semiconductor layer which is constituted of a first semiconductor layer (n-type nitride semiconductor layer) 120, an active layer 130 and a second semiconductor layer (p-type nitride semiconductor layer) 140 laminated one by one, and wherein a part of the first semiconductor layer 120 is exposed by carrying out mesa-etching from the second semiconductor layer 140 to a part of the first semiconductor layer 120, and at least one groove 180 which is formed passing through a part of the first semiconductor layer 120, the active layer 130 and the second semiconductor layer 140. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种发光元件,其使得能够在有源层产生的光在被吸收并散射在元件内之前被发射到外部,并且通过形成至少一个相互作用而被减小到规定的强度或更小 通过从透明电极(或欧姆层)蚀刻到n型半导体层的一部分来隔离凹槽,并且可以提高光提取效率,并提供其制造方法。 解决方案:发光元件由包括由第一半导体层(n型氮化物半导体层)120,有源层130和第二半导体层(p型氮化物半导体)构成的氮化物半导体层构成 层)140,并且其中通过从第二半导体层140到第一半导体层120的一部分进行台面蚀刻来暴露第一半导体层120的一部分,以及至少一个凹槽180 形成穿过第一半导体层120,有源层130和第二半导体层140的一部分。版权所有:(C)2007,JPO&INPIT
    • 10. 发明专利
    • LASER DIODE AND FABRICATION THEREOF
    • JPH1174609A
    • 1999-03-16
    • JP18776598
    • 1998-07-02
    • LG ELECTRONICS INC
    • CHO SHUNGOSUNG KANG-HYON
    • H01S5/00H01L33/00H01S5/10H01S5/20H01S5/22H01S5/227H01S5/30H01S5/323H01S3/18
    • PROBLEM TO BE SOLVED: To enhance the optical characteristics and the current characteristics of a ridge structure employing wet etching or reactive ion etching by forming a second conductivity type InGaP layer having a constant width being the same as that of a second conductivity type second clad layer and a vertical side face in a specified region on an etch stop layer. SOLUTION: An n-type buffer layer, an n-type clad layer, an active layer, a p-type primary clad layer, a p-type InGaP etch stop layer 16, a p-type secondary clad layer 17, a p-type InGaP layer 18, and a p-type GaAs layer 19 are grown sequentially on an n-type substrate. Subsequently, a stripe type and a taper type ridge structure are formed. Residual thickness (t) of the p-type secondary clad layer 17 on the p-type InGaP etch stop layer 16 is then adjusted and the remaining p-type secondary clad layer 17 having thickness (t) is removed by wet etching. Thereafter, the remaining photoresist and insulation film are removed to obtain a ridge pattern keeping a substantially vertical structure. Finally, a current cut-off layer and a current conduction layer are formed sequentially on the entire surface including the ridge.