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JP2005346062A Lithography apparatus and pattern forming method using the same 审中-公开
标题翻译：使用该方法的成像装置和图案形成方法
公开(公告)号：JP2005346062A
公开(公告)日：2005-12-15
申请号：JP2005155296
申请日：2005-05-27
申请人： Lg Electronics Inc , エルジー電子株式会社
发明人： LEE KI DONG , AHN SEH-WON , PIEH SUNG HOON , PARK BYOUNG HO , KIM GYU TAE
IPC分类号： G02F1/13 , G03F1/84 , G03F7/20 , H01L21/027 , H01L21/28 , H01L21/3205 , H01L21/768 , H01L23/52 , H01L23/522 , G03F1/08
CPC分类号： G03F7/70291 , G03F7/7065
摘要： PROBLEM TO BE SOLVED: To selectively form a desired pattern, while observing a substrate.
SOLUTION: The lithography apparatus comprises a stage 19 on which a test material is mounted; a first light source unit 15 for providing the light used in the case of observing the test material on stage; an optical system 11 equipped with an eyepiece for observing the test material on the stage; an image-obtaining means 21 for obtaining the image of the test material observed through the optical system; an image edit means 23 for editing the image obtained by the image-obtaining means; a liquid crystal panel 5 coupled to the optical system and for displaying the image from image signals of the image edited by the image edit means and for performing photograph mask function; and a second light source unit 1 for providing a light for exposing the test material, using the image displayed on the liquid crystal panel for a photomask.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：在观察基板的同时选择性地形成期望的图案。解决方案：光刻设备包括其上安装测试材料的台19; 第一光源单元15，用于在观察舞台上的测试材料的情况下提供使用的光; 装备有用于观察台上测试材料的目镜的光学系统11; 用于获得通过光学系统观察的测试材料的图像的图像获取装置21; 用于编辑由图像获取装置获得的图像的图像编辑装置23; 耦合到光学系统并用于从由图像编辑装置编辑的图像的图像信号显示图像并用于执行照片掩码功能的液晶面板5; 以及第二光源单元1，用于使用显示在用于光掩模的液晶面板上的图像来提供用于暴露测试材料的光。版权所有（C）2006，JPO＆NCIPI

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