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1. 发明授权

US07335969B2 Method of monitoring introduction of interfacial species 失效
标题翻译：监测界面物种引进方法
公开(公告)号：US07335969B2
公开(公告)日：2008-02-26
申请号：US11076371
申请日：2005-03-09
申请人： Lance Genicola , Mark J. Hurley , Jeremy J. Kempisty , Paul D. Kirsch , Ravikumar Ramachandran , Suri Hedge
发明人： Lance Genicola , Mark J. Hurley , Jeremy J. Kempisty , Paul D. Kirsch , Ravikumar Ramachandran , Suri Hedge
IPC分类号： H01L21/66
CPC分类号： H01L21/67167 , H01L21/02329 , H01L21/28167 , H01L21/28185 , H01L21/28202 , H01L21/2822 , H01L21/28238 , H01L21/3144 , H01L21/3185 , H01L21/67213 , H01L21/67253 , H01L29/513 , H01L29/518 , Y10T29/41
摘要： A method for monitoring a nitridation process, including: (a) providing a semiconductor substrate; (b) forming a first dielectric layer on a top surface of the substrate; (c) introducing a quantity of interfacial species into the substrate; (d) removing the first dielectric layer; (e) forming a second dielectric layer on the top surface of the substrate; (f) measuring the density of interface traps between the substrate and the second dielectric layer; (g) providing a predetermined relationship between the quantity of the interfacial species and the density of the interface traps; and (h) determining the quantity of the interfacial species introduced based on the relationship.
摘要翻译：一种用于监测氮化工艺的方法，包括：（a）提供半导体衬底; （b）在所述基板的顶表面上形成第一电介质层; （c）将一定量的界面物质引入底物; （d）去除第一电介质层; （e）在所述衬底的顶表面上形成第二电介质层; （f）测量衬底和第二介电层之间的界面陷阱的密度; （g）提供界面物质的量与界面捕集阱的密度之间的预定关系; 和（h）基于关系确定引入的界面物质的数量。

2. 发明授权

US06929964B2 Method of monitoring introduction on interfacial species 失效
标题翻译：监测界面种类介绍的方法
公开(公告)号：US06929964B2
公开(公告)日：2005-08-16
申请号：US10605244
申请日：2003-09-17
申请人： Lance Genicola , Mark J. Hurley , Jeremy J. Kempisty , Paul D. Kirsch , Ravikumar Ramachandran , Suri Hedge
发明人： Lance Genicola , Mark J. Hurley , Jeremy J. Kempisty , Paul D. Kirsch , Ravikumar Ramachandran , Suri Hedge
IPC分类号： H01L21/00 , H01L21/28 , H01L21/314 , H01L21/318 , H01L29/51 , H01L21/66
CPC分类号： H01L21/67167 , H01L21/02329 , H01L21/28167 , H01L21/28185 , H01L21/28202 , H01L21/2822 , H01L21/28238 , H01L21/3144 , H01L21/3185 , H01L21/67213 , H01L21/67253 , H01L29/513 , H01L29/518 , Y10T29/41
摘要： A method for monitoring a nitridation process, including: (a) providing a semiconductor substrate; (b) forming a first dielectric layer on a top surface of the substrate; (c) introducing a quantity of interfacial species into the substrate; (d) removing the first dielectric layer; (e) forming a second dielectric layer on the top surface of the substrate; (f) measuring the density of interface traps between the substrate and the second dielectric layer; (g) providing a predetermined relationship between the quantity of the interfacial species and the density of the interface traps; and (h) determining the quantity of the interfacial species introduced based on the relationship.
摘要翻译：一种用于监测氮化工艺的方法，包括：（a）提供半导体衬底; （b）在所述基板的顶表面上形成第一电介质层; （c）将一定量的界面物质引入底物; （d）去除第一电介质层; （e）在所述衬底的顶表面上形成第二电介质层; （f）测量衬底和第二介电层之间的界面陷阱的密度; （g）提供界面物质的量与界面捕集阱的密度之间的预定关系; 和（h）基于关系确定引入的界面物质的数量。

3. 发明申请

US20050059225A1 METHOD OF MONITORING INTRODUCTION ON INTERFACIAL SPECIES 失效
标题翻译：监测界面物种介绍的方法
公开(公告)号：US20050059225A1
公开(公告)日：2005-03-17
申请号：US10605244
申请日：2003-09-17
申请人： Lance Genicola , Mark Hurley , Jeremy Kempisty , Paul Kirsch , Ravikumar Ramachandran , Suri Hedge
发明人： Lance Genicola , Mark Hurley , Jeremy Kempisty , Paul Kirsch , Ravikumar Ramachandran , Suri Hedge
IPC分类号： H01L21/00 , H01L21/28 , H01L21/314 , H01L21/318 , H01L29/51 , H01L21/31 , H01L21/425 , H01L21/469
CPC分类号： H01L21/67167 , H01L21/02329 , H01L21/28167 , H01L21/28185 , H01L21/28202 , H01L21/2822 , H01L21/28238 , H01L21/3144 , H01L21/3185 , H01L21/67213 , H01L21/67253 , H01L29/513 , H01L29/518 , Y10T29/41
摘要： A method for monitoring a nitridation process, including: (a) providing a semiconductor substrate; (b) forming a first dielectric layer on a top surface of the substrate; (c) introducing a quantity of interfacial species into the substrate; (d) removing the first dielectric layer; (e) forming a second dielectric layer on the top surface of the substrate; (f) measuring the density of interface traps between the substrate and the second dielectric layer; (g) providing a predetermined relationship between the quantity of the interfacial species and the density of the interface traps; and (h) determining the quantity of the interfacial species introduced based on the relationship.
摘要翻译：一种用于监测氮化工艺的方法，包括：（a）提供半导体衬底; （b）在所述基板的顶表面上形成第一电介质层; （c）将一定量的界面物质引入底物; （d）去除第一电介质层; （e）在所述衬底的顶表面上形成第二电介质层; （f）测量衬底和第二介电层之间的界面陷阱的密度; （g）提供界面物质的量与界面捕集阱的密度之间的预定关系; 和（h）基于关系确定引入的界面物质的数量。

4. 发明申请

US20050153467A1 Method of monitoring introduction of interfacial species 失效
标题翻译：监测界面物种引进方法
公开(公告)号：US20050153467A1
公开(公告)日：2005-07-14
申请号：US11076371
申请日：2005-03-09
申请人： Lance Genicola , Mark Hurley , Jeremy Kempisty , Paul Kirsch , Ravikumar Ramachandran , Suri Hedge
发明人： Lance Genicola , Mark Hurley , Jeremy Kempisty , Paul Kirsch , Ravikumar Ramachandran , Suri Hedge
IPC分类号： H01L21/00 , H01L21/28 , H01L21/314 , H01L21/318 , H01L29/51 , H01L21/66 , G01R31/26 , G06F19/00 , H01L21/336
CPC分类号： H01L21/67167 , H01L21/02329 , H01L21/28167 , H01L21/28185 , H01L21/28202 , H01L21/2822 , H01L21/28238 , H01L21/3144 , H01L21/3185 , H01L21/67213 , H01L21/67253 , H01L29/513 , H01L29/518 , Y10T29/41
摘要： A method for monitoring a nitridation process, including: (a) providing a semiconductor substrate; (b) forming a first dielectric layer on a top surface of the substrate; (c) introducing a quantity of interfacial species into the substrate; (d) removing the first dielectric layer; (e) forming a second dielectric layer on the top surface of the substrate; (f) measuring the density of interface traps between the substrate and the second dielectric layer; (g) providing a predetermined relationship between the quantity of the interfacial species and the density of the interface traps; and (h) determining the quantity of the interfacial species introduced based on the relationship.
摘要翻译：一种用于监测氮化工艺的方法，包括：（a）提供半导体衬底; （b）在所述基板的顶表面上形成第一电介质层; （c）将一定量的界面物质引入底物; （d）去除第一电介质层; （e）在所述衬底的顶表面上形成第二电介质层; （f）测量衬底和第二介电层之间的界面陷阱的密度; （g）提供界面物质的量与界面捕集阱的密度之间的预定关系; 和（h）基于关系确定引入的界面物质的数量。

5. 发明申请

US20130330899A1 PREVENTING FULLY SILICIDED FORMATION IN HIGH-K METAL GATE PROCESSING 审中-公开
标题翻译：防止高K金属加工过程中的完全硅化物形成
公开(公告)号：US20130330899A1
公开(公告)日：2013-12-12
申请号：US13527063
申请日：2012-06-19
申请人： Huiming Bu , Ming Cai , Kevin K. Chan , Dechao Guo , Ravikumar Ramachandran , Liyang Song , Chun-Chen Yeh
发明人： Huiming Bu , Ming Cai , Kevin K. Chan , Dechao Guo , Ravikumar Ramachandran , Liyang Song , Chun-Chen Yeh
IPC分类号： H01L21/336 , H01L21/04
CPC分类号： H01L29/78 , H01L29/4966 , H01L29/51 , H01L29/665 , H01L29/66628
摘要： A method of forming gate stack structure for a transistor device includes forming a gate dielectric layer over a substrate; forming a first silicon gate layer over the gate dielectric layer; forming a dopant-rich monolayer over the first silicon gate layer; and forming a second silicon gate layer over the dopant-rich monolayer, wherein the dopant-rich monolayer prevents silicidation of the first silicon gate layer during silicidation of the second silicon gate layer.
摘要翻译：一种形成用于晶体管器件的栅叠层结构的方法包括在衬底上形成栅介电层; 在所述栅极介电层上形成第一硅栅极层; 在所述第一硅栅极层上形成富含掺杂剂的单层; 以及在所述富掺杂剂单层上形成第二硅栅极层，其中所述富掺杂剂层在所述第二硅栅极层的硅化期间防止所述第一硅栅极层的硅化。

6. 发明申请

US20120175711A1 Self-Aligned Contacts for High k/Metal Gate Process Flow 有权
标题翻译：用于高k /金属栅极工艺流程的自对准触点
公开(公告)号：US20120175711A1
公开(公告)日：2012-07-12
申请号：US12987221
申请日：2011-01-10
申请人： Ravikumar Ramachandran , Ramachandra Divakaruni , Ying Li
发明人： Ravikumar Ramachandran , Ramachandra Divakaruni , Ying Li
IPC分类号： H01L29/772 , H01L21/283
CPC分类号： H01L29/401 , H01L21/76895 , H01L21/76897 , H01L29/49 , H01L29/4983 , H01L29/51 , H01L29/66545 , H01L29/6656
摘要： A semiconductor structure is provided that includes a semiconductor substrate having a plurality of gate stacks located on a surface of the semiconductor substrate. Each gate stack includes, from bottom to top, a high k gate dielectric layer, a work function metal layer and a conductive metal. A spacer is located on sidewalls of each gate stack and a self-aligned dielectric liner is present on an upper surface of each spacer. A bottom surface of each self-aligned dielectric liner is present on an upper surface of a semiconductor metal alloy. A contact metal is located between neighboring gate stacks and is separated from each gate stack by the self-aligned dielectric liner. The structure also includes another contact metal having a portion that is located on and in direct contact with an upper surface of the contact metal and another portion that is located on and in direct contact with the conductive metal of one of the gate stacks. Methods of forming the semiconductor structure using a replacement gate and a non-replacement gate scheme are also disclosed.
摘要翻译：提供一种半导体结构，其包括具有位于半导体衬底的表面上的多个栅极叠层的半导体衬底。每个栅极堆叠包括从底部到顶部的高k栅极电介质层，功函数金属层和导电金属。间隔件位于每个栅极堆叠的侧壁上，并且自对准电介质衬垫存在于每个间隔件的上表面上。每个自对准电介质衬垫的底表面存在于半导体金属合金的上表面上。接触金属位于相邻的栅极堆叠之间，并通过自对准电介质衬垫与每个栅极堆叠分离。该结构还包括另一个接触金属，其具有位于接触金属的上表面上且与触头金属的上表面直接接触的部分，以及位于与其中一个栅极叠层的导电金属直接接触的另一部分。还公开了使用替换栅极和非替代栅极方案形成半导体结构的方法。

7. 发明授权

US08193099B1 Protecting exposed metal gate structures from etching processes in integrated circuit manufacturing 有权
标题翻译：保护暴露的金属栅极结构免受集成电路制造中的蚀刻工艺
公开(公告)号：US08193099B1
公开(公告)日：2012-06-05
申请号：US13049933
申请日：2011-03-17
申请人： Mukesh V. Khare , Renee T. Mo , Ravikumar Ramachandran , Richard S. Wise , Hongwen Yan
发明人： Mukesh V. Khare , Renee T. Mo , Ravikumar Ramachandran , Richard S. Wise , Hongwen Yan
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/32136 , H01L21/823437 , H01L21/823481 , H01L21/823828 , H01L21/823878
摘要： A method of forming a semiconductor device includes forming a transistor gate stack over a substrate having an active area and a shallow trench isolation (STI) region. First sidewall spacers are formed on the transistor gate stack, and an isotropic etch process is applied to isotropically remove an excess portion of a metal layer included within the transistor gate stack, the excess portion left unprotected by the first sidewall spacers. Second sidewall spacers are formed on the transistor gate stack, the second sidewall spacers completely encapsulating the metal layer of the transistor gate stack.
摘要翻译：形成半导体器件的方法包括在具有有源区和浅沟槽隔离（STI）区的衬底上形成晶体管栅叠。第一侧壁间隔物形成在晶体管栅极堆叠上，并且各向同性蚀刻工艺被应用于各向同性地去除包括在晶体管栅极叠层内的金属层的过剩部分，剩余部分未被第一侧壁间隔物保护。第二侧壁间隔物形成在晶体管栅极叠层上，第二侧壁间隔物完全封装晶体管栅极叠层的金属层。

8. 发明申请

US20100187610A1 SEMICONDUCTOR DEVICE HAVING DUAL METAL GATES AND METHOD OF MANUFACTURE 有权
标题翻译：具有双金属门的半导体器件及其制造方法
公开(公告)号：US20100187610A1
公开(公告)日：2010-07-29
申请号：US12359520
申请日：2009-01-26
申请人： Unoh Kwon , Siddarth A. Krishnan , Takashi Ando , Michael P. Chudzik , Martin M. Frank , William K. Henson , Rashmi Jha , Yue Liang , Vijay Narayanan , Ravikumar Ramachandran , Keith Kwong Hon Wong
发明人： Unoh Kwon , Siddarth A. Krishnan , Takashi Ando , Michael P. Chudzik , Martin M. Frank , William K. Henson , Rashmi Jha , Yue Liang , Vijay Narayanan , Ravikumar Ramachandran , Keith Kwong Hon Wong
IPC分类号： H01L29/78 , H01L21/3205
CPC分类号： H01L21/823842 , H01L21/28088 , H01L21/823807 , H01L21/823857 , H01L29/1054 , H01L29/4966 , H01L29/517
摘要： A semiconductor device includes: a semiconductor substrate; a PFET formed on the substrate, the PFET includes a SiGe layer disposed on the substrate, a high-K dielectric layer disposed on the SiGe layer, a first metallic layer disposed on the high-k dielectric layer, a first intermediate layer disposed on the first metallic layer, a second metallic layer disposed on the first intermediate layer, a second intermediate layer disposed on the second metallic layer, and a third metallic layer disposed on the second intermediate layer; an NFET formed on the substrate, the NFET includes the high-k dielectric layer, the high-k dielectric layer being disposed on the substrate, the second intermediate layer, the second intermediate layer being disposed on the high-k dielectric layer, and the third metallic layer, the third metallic layer being disposed on the second intermediate layer. Alternatively, the first metallic layer is omitted. A method to fabricate the device includes providing SiO2 and alpha-silicon layers or a dBARC layer.
摘要翻译：半导体器件包括：半导体衬底; 形成在衬底上的PFET，PFET包括设置在衬底上的SiGe层，设置在SiGe层上的高K电介质层，设置在高k电介质层上的第一金属层，设置在第一中间层上的第一中间层第一金属层，设置在第一中间层上的第二金属层，设置在第二金属层上的第二中间层和设置在第二中间层上的第三金属层; 形成在衬底上的NFET，NFET包括高k电介质层，高k电介质层设置在衬底上，第二中间层，第二中间层设置在高k电介质层上，并且第三金属层，第三金属层设置在第二中间层上。或者，省略第一金属层。制造该器件的方法包括提供SiO 2和α-硅层或dBARC层。

9. 发明授权

US07670901B2 Method of fabricating a bottle trench and a bottle trench capacitor 失效
标题翻译：制造瓶沟槽和瓶槽电容器的方法
公开(公告)号：US07670901B2
公开(公告)日：2010-03-02
申请号：US12033984
申请日：2008-02-20
申请人： Oh-Jung Kwon , Kenneth T. Settlemyer, Jr. , Ravikumar Ramachandran , Min-Soo Kim
发明人： Oh-Jung Kwon , Kenneth T. Settlemyer, Jr. , Ravikumar Ramachandran , Min-Soo Kim
IPC分类号： H01L21/762
CPC分类号： H01L27/1087 , H01L29/66181
摘要： A method of fabricating a bottle trench and a bottle trench capacitor. The method including: providing a substrate; forming a trench in the substrate, the trench having sidewalls and a bottom, the trench having an upper region adjacent to a top surface of the substrate and a lower region adjacent to the bottom of the trench; forming an oxidized layer of the substrate in the bottom region of the trench; and removing the oxidized layer of the substrate from the bottom region of the trench, a cross-sectional area of the lower region of the trench greater than a cross-sectional area of the upper region of the trench.
摘要翻译：制造瓶沟槽和瓶沟电容器的方法。该方法包括：提供衬底; 在所述衬底中形成沟槽，所述沟槽具有侧壁和底部，所述沟槽具有与所述衬底的顶表面相邻的上部区域和与所述沟槽的底部相邻的下部区域; 在沟槽的底部区域形成衬底的氧化层; 并且从沟槽的底部区域去除衬底的氧化层，沟槽的下部区域的横截面面积大于沟槽的上部区域的横截面面积。

10. 发明授权

US07498271B1 Nitrogen based plasma process for metal gate MOS device 有权
标题翻译：金属栅MOS器件的氮基等离子体工艺
公开(公告)号：US07498271B1
公开(公告)日：2009-03-03
申请号：US12145035
申请日：2008-06-24
申请人： Ricardo A. Donaton , Rashmi Jha , Siddarth A. Krishnan , Xi Li , Renee T. Mo , Naim Moumen , Wesley C. Natzle , Ravikumar Ramachandran , Richard S. Wise
发明人： Ricardo A. Donaton , Rashmi Jha , Siddarth A. Krishnan , Xi Li , Renee T. Mo , Naim Moumen , Wesley C. Natzle , Ravikumar Ramachandran , Richard S. Wise
IPC分类号： H01L21/31
CPC分类号： H01L21/31138 , H01L21/28202 , H01L21/31155 , H01L21/823828 , H01L21/823878 , H01L29/495 , H01L29/4966 , H01L29/513 , H01L29/517 , H01L29/518
摘要： The present invention, in one embodiment, provides a method of forming a gate structure including providing a substrate including a semiconducting device region, a high-k dielectric material present atop the semiconducting device region, and a metal gate conductor atop the high-k dielectric material, applying a photoresist layer atop the metal gate conductor; patterning the photoresist layer to provide an etch mask overlying a portion of the metal gate conductor corresponding to a gate stack; etching the metal gate conductor and the high-k dielectric material selective to the etch mask; and removing the etch mask with a substantially oxygen free nitrogen based plasma.
摘要翻译：本发明在一个实施例中提供了一种形成栅极结构的方法，该栅极结构包括提供包括半导体器件区域的衬底，在半导体器件区域顶部存在的高k电介质材料以及高k电介质顶部的金属栅极导体材料，在金属栅极导体顶上施加光致抗蚀剂层; 图案化光致抗蚀剂层以提供覆盖对应于栅极堆叠的金属栅极导体的一部分的蚀刻掩模; 蚀刻对蚀刻掩模有选择性的金属栅极导体和高k电介质材料; 并用基本上不含氧的氮气等离子体去除蚀刻掩模。

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