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1. 发明授权

US08802662B2 Anti-hepatitis C composition and method for preparing drug for inhibiting hepatitis C viruses or treating hepatitis C 有权
标题翻译：抗丙型肝炎组合物及制备丙型肝炎病毒药物或治疗丙型肝炎的方法
公开(公告)号：US08802662B2
公开(公告)日：2014-08-12
申请号：US12573116
申请日：2009-10-04
申请人： Lain-Tze Lee , Shau-Feng Chang , Hui-Ping Tsai , Zong-Keng Kuo , Chen-Fang Chung
发明人： Lain-Tze Lee , Shau-Feng Chang , Hui-Ping Tsai , Zong-Keng Kuo , Chen-Fang Chung
IPC分类号： A61K31/58
CPC分类号： A61K31/58 , C07J71/0005 , C07J71/0021
摘要： The invention provides an anti-hepatitis C composition including: an effective amount of limonoid compound, wherein the structure of the limonoid compound is shown as Structure (I): where R1 comprises H or OAc and R2 comprises H or COCH(CH3)2; and a pharmaceutically acceptable carrier or salt, and the anti-hepatitis C composition is used for inhibiting hepatitis C virus or treating hepatitis C. The invention also provides a method for treating hepatitis C and a method for preparing a drug for inhibiting hepatitis C viruses or treating hepatitis C.
摘要翻译：本发明提供了一种抗丙型肝炎组合物，其包括：有效量的柠檬醛化合物，其中所述类柠檬醛化合物的结构显示为结构式（I）：其中R 1包含H或OAc，R 2包含H或COCH（CH 3）2; 和药学上可接受的载体或盐，抗丙型肝炎组合物用于抑制丙型肝炎病毒或治疗丙型肝炎。本发明还提供了一种治疗丙型肝炎的方法和一种制备用于抑制丙型肝炎病毒或治疗丙型肝炎

2. 发明授权

US06676812B2 Alignment mark shielding ring without arcing defect and method for using 有权
标题翻译：对准标记屏蔽环没有电弧缺陷和使用方法
公开(公告)号：US06676812B2
公开(公告)日：2004-01-13
申请号：US10143623
申请日：2002-05-09
申请人： Chen-Fang Chung
发明人： Chen-Fang Chung
IPC分类号： C23C1434
CPC分类号： H01L21/68721 , H01J37/32477
摘要： An alignment mark shielding ring for use in a physical vapor deposition chamber and a method for using the ring to avoid arcing problems on the wafer. The alignment mark shielding ring can be constructed of a ring that has a generally L-shaped cross-section, at least one hood portion to function as the shield for the alignment mark, at least one alignment pin for engaging at least one alignment sleeve mounted in a lower chamber shield for holding the alignment mark shielding ring in place. The alignment sleeve is constructed in two halves, each having an aperture therethrough. The aperture in the top half is larger than the aperture in the bottom half such that even when the apertures are coated with a metal layer deposited in the PVD process, the alignment pin does not electrically short to the lower chamber shield and thus, any possibility of arcing is avoided.
摘要翻译：用于物理气相沉积室的对准标记屏蔽环以及使用该环以避免晶片上的电弧问题的方法。对准标记屏蔽环可以由具有大致L形横截面的环构成，至少一个罩部分用作对准标记的屏蔽件，至少一个对准销用于接合至少一个对准套筒安装在用于将对准标记屏蔽环保持在适当位置的下室屏蔽件中。对准套筒构造成两半，每个具有穿过其中的孔。上半部分的孔径大于下半部分中的孔径，使得即使当在PVD工艺中沉积的金属层涂覆孔时，对准销不会与下室屏蔽件电短路，因此，任何可能性的电弧避免。

3. 发明授权

US06328815B1 Multiple chamber vacuum processing system configuration for improving the stability of mark shielding process 有权
标题翻译：多室真空处理系统配置，提高标记屏蔽过程的稳定性
公开(公告)号：US06328815B1
公开(公告)日：2001-12-11
申请号：US09253292
申请日：1999-02-19
申请人： Shwangming Jeng , Chen-Fang Chung
发明人： Shwangming Jeng , Chen-Fang Chung
IPC分类号： B08B102
CPC分类号： H01L21/67167 , H01L21/67184 , H01L21/67745 , Y10S134/902 , Y10S438/908
摘要： A new configuration of a basic concatenatable integrated modular multiple chamber vacuum processing system for wafer manufacturing vacuum processes is disclosed. The basic system includes at least one multiple ported transfer vacuum chamber, an R-&thgr; transfer means contained within each chamber, a multiplicity of ports adaptable for appending a variety of vacuum process chambers as well as forming entrance/exit ports with at least one dual port pass through chamber attached to one entrance/exit port. Each pass through chamber contains a wafer alignment and/or orientation means for aligning or orienting the wafer as necessary in any of the appended process chambers. The configuration minimizes alignment or orientation errors due to inherent instability of the concatenated transfer means operations.
摘要翻译：公开了一种用于晶片制造真空工艺的基本可连接的集成模块化多室真空处理系统的新配置。基本系统包括至少一个多端口转移真空室，每个室内包含的R-θ转移装置，适用于附加各种真空处理室的多个端口，以及形成具有至少一个双重端口的入口/出口端口港口通过一个入口/出口连接室。每个通过室包含用于在任何附加的处理室中根据需要对准或定向晶片的晶片对准和/或取向装置。由于连接的传送装置操作的固有不稳定性，该配置使对准或取向误差最小化。

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