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1. 发明申请

WO2010053642A1 COMPOSITION OF A CLEANING MATERIAL FOR PARTICLE REMOVAL 审中-公开
标题翻译：用于颗粒去除的清洁材料的组成
公开(公告)号：WO2010053642A1
公开(公告)日：2010-05-14
申请号：PCT/US2009/059292
申请日：2009-10-01
申请人： LAM RESEARCH CORPORATION , ZHU, Ji , MENDIRATTA, Arjun , MUI, Davie
发明人： ZHU, Ji , MENDIRATTA, Arjun , MUI, Davie
IPC分类号： C11D3/37
CPC分类号： C11D7/5004 , C11D3/222 , C11D3/3765 , C11D3/3773 , C11D3/3776
摘要： The embodiments of the present invention provide improved materials for cleaning patterned substrates with fine features. The cleaning materials have advantages in cleaning patterned substrates with fine features without substantially damaging the features. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. To assist removing of particles from the wafer (or substrate) surfaces, the polymeric compound of the polymers can contain a polar functional group, which can establish polar-polar molecular interaction and hydrogen bonds with hydrolyzed particles on the wafer surface. The polymers of a polymeric compound(s) with a large molecular weight form long polymer chains and network. The long polymer chains and/or polymer network show superior capabilities of capturing and entrapping contaminants, in comparison to conventional cleaning materials. The polymeric compound(s) of the polymers may also include a functional group that carries charge in the cleaning solution. The charge of the functional group of the polymers improves the particle removal efficiency.
摘要翻译：本发明的实施例提供用于清洁具有精细特征的图案化衬底的改进材料。清洁材料在清洁具有精细特征的图案化基材上具有优点，而基本上不损坏特征。清洁材料是流体，液相或液相/气相，并围绕装置特征变形; 因此，清洁材料基本上不会损坏设备特征或将损伤全部降低在一起。为了帮助从晶片（或衬底）表面去除颗粒，聚合物的聚合物可以含有极性官能团，其可以与晶片表面上的水解颗粒建立极性极性的分子相互作用和氢键。具有大分子量的高分子化合物的聚合物形成长的聚合物链和网络。与传统清洁材料相比，长的聚合物链和/或聚合物网络显示出捕获和捕获污染物的优异性能。聚合物的聚合物还可以包括在清洁溶液中携带电荷的官能团。聚合物官能团的电荷提高了颗粒去除效率。

2. 发明申请

WO2010053643A1 COMPOSITION AND APPLICATION OF A TWO-PHASE CONTAMINANT REMOVAL MEDIUM 审中-公开
标题翻译：两相污染物去除介质的组成和应用
公开(公告)号：WO2010053643A1
公开(公告)日：2010-05-14
申请号：PCT/US2009/059293
申请日：2009-10-01
申请人： LAM RESEARCH CORPORATION , ZHU, Ji , MENDIRATTA, Arjun , MUI, David
发明人： ZHU, Ji , MENDIRATTA, Arjun , MUI, David
IPC分类号： B08B3/08
CPC分类号： B08B3/02 , C11D3/2079 , C11D3/222 , C11D3/37 , C11D3/3707 , C11D3/3723 , C11D3/3753 , C11D3/3765 , C11D3/3773 , C11D3/378 , C11D3/43 , C11D7/265 , C11D7/268 , C11D7/5004 , C11D11/0047 , C11D17/0013 , C11D17/003 , Y10S134/902
摘要： The embodiments provide substrate cleaning techniques to remove contaminants from the substrate surface to improve device yield. The substrate cleaning techniques utilize a cleaning material with solid components and polymers with a large molecular weight dispersed in a cleaning liquid to form the cleaning material, which is fluidic The solid components remove contaminants on the substrate surface by making contact with the contaminants The polymers with large molecular weight form polymer chains and a polymeric network that capture and entrap solids in the cleaning materials, which prevent solids from falling on the substrate surface In addition, the polymers can also assist in removing contaminants form the substrate surface by making contacts with contaminants on the substrate surface In one embodiment, the cleaning material glides around protruding features on the substrate surface without making a forceful impact on the protruding features to damage them.
摘要翻译：这些实施例提供了从衬底表面去除污染物以提高器件产量的衬底清洁技术。基材清洗技术利用具有分散在清洁液体中的具有大分子量的固体组分和聚合物的清洁材料以形成流体性的清洁材料固体组分通过与污染物接触来去除基底表面上的污染物聚合物与大分子量形式的聚合物链和聚合物网络，捕获和捕获清洁材料中的固体，防止固体落在基材表面上。此外，聚合物还可以通过与污染物接触来帮助从基材表面上除去污染物基板表面在一个实施例中，清洁材料围绕基板表面上的突出特征滑动，而不会对突出特征产生强烈的冲击以损坏它们。

3. 发明申请

WO2009078975A2 MATERIALS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA 审中-公开
标题翻译：通过单相和两相介质去除颗粒的材料
公开(公告)号：WO2009078975A2
公开(公告)日：2009-06-25
申请号：PCT/US2008/013714
申请日：2008-12-12
申请人： LAM RESEARCH CORPORATION , MUI, David S. L. , SRINIVASAN, Satish , PENG, Grant , ZHU, Ji , KON, Shih-Chung , PODLESNIK, Dragan , MENDIRATTA, Arjun
发明人： MUI, David S. L. , SRINIVASAN, Satish , PENG, Grant , ZHU, Ji , KON, Shih-Chung , PODLESNIK, Dragan , MENDIRATTA, Arjun
IPC分类号： H01L21/302 , H01L21/30
CPC分类号： C11D7/5009 , C11D3/3723 , C11D3/3765 , C11D3/3773 , C11D7/261 , C11D7/3263 , C11D7/34 , C11D11/0047 , H01L21/02057 , H01L21/67051 , Y10S134/902
摘要： The embodiments of the present invention provide improved materials for cleaning patterned substrates with fine features. The cleaning materials have advantages in cleaning patterned substrates with fine features without substantially damaging the features. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. The cleaning materials containing polymers of a polymeric compound with large molecular weight capture the contaminants on the substrate. In addition, the cleaning materials entrap the contaminants and do not return the contaminants to the substrate surface. The polymers of one or more polymeric compounds with large molecular weight form long polymer chains, which can also be cross-linked to form a network (or polymeric network). The long polymer chains and/or polymer network show superior capabilities of capturing and entrapping contaminants, in comparison to conventional cleaning materials.
摘要翻译：本发明的实施例提供用于清洁具有精细特征的图案化衬底的改进材料。清洁材料在清洁具有精细特征的图案化基材上具有优点，而基本上不损坏特征。清洁材料是流体，液相或液相/气相，并围绕装置特征变形; 因此，清洁材料基本上不会损坏设备特征或将损伤全部降低在一起。包含具有大分子量的聚合物的聚合物的清洁材料捕获基底上的污染物。此外，清洁材料夹带污染物并且不会将污染物返回到基底表面。一种或多种具有大分子量的聚合物的聚合物形成长的聚合物链，其也可以交联以形成网络（或聚合物网络）。与传统清洁材料相比，长的聚合物链和/或聚合物网络显示出捕获和捕获污染物的优异性能。

4. 发明申请

WO2009079422A1 METHOD AND APPARATUS FOR REMOVING CONTAMINANTS FROM SUBSTRATE 审中-公开
标题翻译：从基材中除去污染物的方法和装置
公开(公告)号：WO2009079422A1
公开(公告)日：2009-06-25
申请号：PCT/US2008/086742
申请日：2008-12-14
申请人： LAM RESEARCH CORPORATION , ZHU, Ji , MENDIRATTA, Arjun , MUI, David
发明人： ZHU, Ji , MENDIRATTA, Arjun , MUI, David
IPC分类号： H01L21/302 , H01L21/304
CPC分类号： C11D7/5009 , C11D3/3723 , C11D3/3765 , C11D3/3773 , C11D7/261 , C11D7/3263 , C11D7/34 , C11D11/0047 , H01L21/02057 , H01L21/67051 , Y10S134/902
摘要： A cleaning material is applied to a surface of a substrate. The cleaning material includes one or more polymeric materials for entrapping contaminants present on the surface of the substrate. A rinsing fluid is applied to the surface of the substrate at a controlled velocity to effect removal of the cleaning material and contaminants entrapped within the cleaning material from the surface of the substrate. The controlled velocity of the rinsing fluid is set to cause the cleaning material to behave in an elastic manner when impacted by the rinsing fluid, thereby improving contaminant removal from the surface of the substrate.
摘要翻译：将清洁材料施加到基板的表面。清洁材料包括用于捕获存在于基底表面上的污染物的一种或多种聚合物材料。冲洗流体以受控的速度施加到基底的表面，以从衬底的表面去除被清除材料和被污染的清洁材料中的污染物。洗涤流体的受控速度被设定为使得清洁材料在被冲洗流体冲击时以弹性方式表现，从而改善从基材表面去除污染物质。

5. 发明申请

WO2009078969A1 APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA 审中-公开
标题翻译：用于单相和两相介质去除颗粒的装置
公开(公告)号：WO2009078969A1
公开(公告)日：2009-06-25
申请号：PCT/US2008/013697
申请日：2008-12-12
申请人： LAM RESEARCH CORPORATION , MUI, David, S., L. , SRINIVASAN, Satish , PENG, Grant , ZHU, Ji , KON, Shih-Chung , PODLESNIK, Dragan , MENDIRATTA, Arjun
发明人： MUI, David, S., L. , SRINIVASAN, Satish , PENG, Grant , ZHU, Ji , KON, Shih-Chung , PODLESNIK, Dragan , MENDIRATTA, Arjun
IPC分类号： H01L21/302 , H01L21/304
CPC分类号： C11D7/5009 , C11D3/3723 , C11D3/3765 , C11D3/3773 , C11D7/261 , C11D7/3263 , C11D7/34 , C11D11/0047 , H01L21/02057 , H01L21/67051 , Y10S134/902
摘要： The embodiments of the present invention provide apparatus for cleaning patterned substrates with fine features with cleaning materials. The apparatus using the cleaning materials has advantages in cleaning patterned substrates with fine features without substantially damaging the features. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. The cleaning materials containing polymers of a polymeric compound with large molecular weight capture the contaminants on the substrate. In addition, the cleaning materials entrap the contaminants and do not return the contaminants to the substrate surface. The polymers of one or more polymeric compounds with large molecular weight form long polymer chains, which can also be cross-linked to form a network (or polymeric network). The long polymer chains and/or polymer network show superior capabilities of capturing and entrapping contaminants, in comparison to conventional cleaning materials.
摘要翻译：本发明的实施例提供了用清洁材料清洁具有精细特征的图案化衬底的设备。使用清洁材料的设备具有清洁具有精细特征的图案化基材而不会显着损害特征的优点。清洁材料是流体，液相或液相/气相，并围绕装置特征变形; 因此，清洁材料基本上不会损坏设备特征或将损伤全部降低在一起。包含具有大分子量的聚合物的聚合物的清洁材料捕获基底上的污染物。此外，清洁材料夹带污染物并且不会将污染物返回到基底表面。一种或多种具有大分子量的聚合物的聚合物形成长的聚合物链，其也可以交联以形成网络（或聚合物网络）。与传统清洁材料相比，长的聚合物链和/或聚合物网络显示出捕获和捕获污染物的优异性能。

6. 发明申请

WO2011008658A1 MATERIALS AND SYSTEMS FOR ADVANCED SUBSTRATE CLEANING 审中-公开
标题翻译：高级基板清洗的材料和系统
公开(公告)号：WO2011008658A1
公开(公告)日：2011-01-20
申请号：PCT/US2010/041630
申请日：2010-07-09
申请人： LAM RESEARCH CORPORATION , MUI, David , ZHU, Ji , MENDIRATTA, Arjun
发明人： MUI, David , ZHU, Ji , MENDIRATTA, Arjun
IPC分类号： C11D1/66 , C11D1/76
CPC分类号： B08B7/0014 , C11D3/222 , C11D3/225 , C11D3/3707 , C11D3/3723 , C11D3/3746 , C11D3/3753 , C11D3/3765 , C11D3/3773 , C11D3/3776 , C11D3/378 , C11D3/38 , C11D3/43 , C11D7/268 , C11D7/5004 , C11D11/0047 , H01L21/02063 , H01L21/02071 , H01L21/6704 , H01L21/67051
摘要： The embodiments of the present invention provide improved materials, apparatus, and methods for cleaning wafer surfaces, especially surfaces of patterned wafers (or substrates). The cleaning materials, apparatus, and methods discussed have advantages in cleaning patterned substrates with fine features without substantially damaging the features. The cleaning material includes polymers of one or more polymeric compounds. The cleaning materials can be used in a wide range of viscosity and pH to clean different types of surfaces. The cleaning materials are in liquid phase, and deform around device features to capture the contaminants on the substrate. The polymers entrap the contaminants preventing their return to the substrate surface. The cleaning apparatus is designed to dispense and rinse cleaning materials with a range of viscosities.
摘要翻译：本发明的实施例提供用于清洁晶片表面，特别是图案化晶片（或基板）表面的改进的材料，装置和方法。所讨论的清洁材料，设备和方法具有在清洁具有精细特征的图案化基底而没有实质上损害特征的优点。清洁材料包括一种或多种聚合物的聚合物。清洁材料可以在广泛的粘度和pH范围内使用以清洁不同类型的表面。清洁材料处于液相，并围绕设备特征变形以捕获衬底上的污染物。聚合物捕获污染物，防止其返回到基底表面。该清洁装置设计用于分配和冲洗具有一定粘度范围的清洁材料。

7. 发明申请

WO2009078968A1 METHODS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA 审中-公开
标题翻译：用于单相和两相介质去除颗粒的方法
公开(公告)号：WO2009078968A1
公开(公告)日：2009-06-25
申请号：PCT/US2008/013696
申请日：2008-12-12
申请人： LAM RESEARCH CORPORATION , MUI, David, S., L. , SRINIVASAN, Satish , PENG, Grant , ZHU, Ji , KON, Shih-Chung , PODLESNIK, Dragan , MENDIRATTA, Arjun
发明人： MUI, David, S., L. , SRINIVASAN, Satish , PENG, Grant , ZHU, Ji , KON, Shih-Chung , PODLESNIK, Dragan , MENDIRATTA, Arjun
IPC分类号： H01L21/302 , H01L21/304
CPC分类号： C11D7/5009 , C11D3/3723 , C11D3/3765 , C11D3/3773 , C11D7/261 , C11D7/3263 , C11D7/34 , C11D11/0047 , H01L21/02057 , H01L21/67051 , Y10S134/902
摘要： The embodiments of the present invention provide methods for cleaning patterned substrates with fine features. The methods for cleaning patterned substrate have advantages in cleaning patterned substrates with fine features without substantially damaging the features by using the cleaning materials described. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. The cleaning materials containing polymers of a polymeric compound with large molecular weight capture the contaminants on the substrate. In addition, the cleaning materials entrap the contaminants and do not return the contaminants to the substrate surface. The polymers of one or more polymeric compounds with large molecular weight form long polymer chains, which can also be cross-linked to form a network (or polymeric network). The long polymer chains and/or polymer network show superior capabilities of capturing and entrapping contaminants, in comparison to conventional cleaning materials.
摘要翻译：本发明的实施例提供了用于清洁具有精细特征的图案化衬底的方法。用于清洁图案化衬底的方法具有通过使用所述清洁材料来清洁具有精细特征的图案化衬底而不会基本上损坏特征的优点。清洁材料是流体，液相或液相/气相，并围绕装置特征变形; 因此，清洁材料基本上不会损坏设备特征或将损伤全部降低在一起。包含具有大分子量的聚合物的聚合物的清洁材料捕获基底上的污染物。此外，清洁材料夹带污染物并且不会将污染物返回到基底表面。一种或多种具有大分子量的聚合物的聚合物形成长的聚合物链，其也可以交联以形成网络（或聚合物网络）。与传统清洁材料相比，长的聚合物链和/或聚合物网络显示出捕获和捕获污染物的优异性能。

8. 发明申请

WO2020097262A1 THERMOELECTRIC SYSTEMS AND METHODS OF APPLYING THE SAME 审中-公开
公开(公告)号：WO2020097262A1
公开(公告)日：2020-05-14
申请号：PCT/US2019/060152
申请日：2019-11-06
申请人： LIANG, Haifan , MENDIRATTA, Arjun , DAY, Tristan , THAM, Douglas W. , BOUKAI, Akram I.
发明人： LIANG, Haifan , MENDIRATTA, Arjun , DAY, Tristan , THAM, Douglas W. , BOUKAI, Akram I.
IPC分类号： H01L35/32 , F25B21/02 , F25B27/02 , H01L35/30 , H01L35/34
摘要： Provided herein is a thermoelectric system for generating electricity using ambient temperature oscillations (e.g., between day and night time). The thermoelectric system may comprise a first heat exchanger, a thermoelectric generator, one or more heat conducting units, a second heat exchanger, and a container configured to (i) contain the second heat exchanger and a thermal storage material and (ii) insulate the thermal storage material from an external to the container.

9. 发明申请

WO2020142130A2 THERMOELECTRIC SYSTEMS, METHODS, AND DEVICES 审中-公开
公开(公告)号：WO2020142130A2
公开(公告)日：2020-07-09
申请号：PCT/US2019/056335
申请日：2019-10-15
申请人： THAM, Douglas W. , LIANG, Haifan , BOUKAI, Akram I. , MENDIRATTA, Arjun
发明人： THAM, Douglas W. , LIANG, Haifan , BOUKAI, Akram I. , MENDIRATTA, Arjun
IPC分类号： H01L31/08
摘要： The present disclosure provides a thermoelectric system comprising a first heat exchanger, a heat conducting unit, a thermoelectric generator, and a second heat exchanger. The present disclosure also provides a method for generating power comprising providing a thermoelectric system comprising a first heat exchanger, a heat conducting unit, a thermoelectric generator, and a second heat exchanger; using the thermoelectric generator to generate power; and directing the power to an energy storage system or an electrical load.

10. 发明申请

WO2020142130A3 THERMOELECTRIC SYSTEMS, METHODS, AND DEVICES 审中-公开
公开(公告)号：WO2020142130A3
公开(公告)日：2020-07-09
申请号：PCT/US2019/056335
申请日：2019-10-15
申请人： THAM, Douglas W. , LIANG, Haifan , BOUKAI, Akram I. , MENDIRATTA, Arjun
发明人： THAM, Douglas W. , LIANG, Haifan , BOUKAI, Akram I. , MENDIRATTA, Arjun
IPC分类号： H01L35/02 , H01L35/32
摘要： The present disclosure provides a thermoelectric system comprising a first heat exchanger, a heat conducting unit, a thermoelectric generator, and a second heat exchanger. The present disclosure also provides a method for generating power comprising providing a thermoelectric system comprising a first heat exchanger, a heat conducting unit, a thermoelectric generator, and a second heat exchanger; using the thermoelectric generator to generate power; and directing the power to an energy storage system or an electrical load.

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