专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2011002804A2 METHODS AND APPARATUS TO PREDICT ETCH RATE UNIFORMITY FOR QUALIFICATION OF A PLASMA CHAMBER 审中-公开
标题翻译：预测等离子体室质量的方法和装置预测
公开(公告)号：WO2011002804A2
公开(公告)日：2011-01-06
申请号：PCT/US2010/040468
申请日：2010-06-29
申请人： LAM RESEARCH CORPORATION , CHOI, Brian D. , YUN, Gunsu , VENUGOPAL, Vijayakumar C.
发明人： CHOI, Brian D. , YUN, Gunsu , VENUGOPAL, Vijayakumar C.
IPC分类号： H05H1/24 , G06F17/40
CPC分类号： H01J37/3299 , H01J37/32935
摘要： A method for predicting etch rate uniformity for qualifying health status of a processing chamber during substrate processing of substrates is provided. The method includes executing a recipe and receiving processing data from a first set of sensors. The method further includes analyzing the processing data utilizing a subsystem health check predictive model to determine calculated data, which includes at least one of etch rate data and uniformity data. The subsystem health check predictive model is constructed by correlating measurement data from a set of film substrates with processing data collected during analogous processing of a set of non-film substrates. The method yet also includes performing a comparison of the calculated data against a set of control limits as defined by the subsystem health check predictive model. The method yet further includes generating a warning if the calculated data is outside of the set of control limits.
摘要翻译：提供了一种用于在衬底的衬底处理期间预测用于限定处理室的健康状况的蚀刻速率均匀性的方法。该方法包括执行食谱并从第一组传感器接收处理数据。该方法还包括利用子系统健康检查预测模型来分析处理数据，以确定计算出的数据，其包括蚀刻速率数据和均匀性数据中的至少一个。通过将来自一组膜基底的测量数据与在一组非膜基底的类似处理期间收集的处理数据相关联来构建子系统健康检查预测模型。该方法还包括执行计算数据与由子系统健康检查预测模型定义的一组控制限制的比较。所述方法还包括如果所计算的数据在所述一组控制限度之外，则产生警告。

2. 发明申请

WO2011002803A2 METHODS AND APPARATUS FOR PREDICTIVE PREVENTIVE MAINTENANCE OF PROCESSING CHAMBERS 审中-公开
标题翻译：用于预测加工房间预防性维护的方法和设备
公开(公告)号：WO2011002803A2
公开(公告)日：2011-01-06
申请号：PCT/US2010/040465
申请日：2010-06-29
申请人： LAM RESEARCH CORPORATION , ALBAREDE, Luc , PAPE, Eric , VENUGOPAL, Vijayakumar C. , CHOI, Brian D.
发明人： ALBAREDE, Luc , PAPE, Eric , VENUGOPAL, Vijayakumar C. , CHOI, Brian D.
IPC分类号： H05H1/24 , G06F17/40
CPC分类号： H01J37/3299 , H01J37/32935
摘要： A method for assessing health status of a processing chamber is provided. The method includes executing a recipe. The method also includes receiving processing data from a set of sensors during execution of the recipe. The method further includes analyzing the processing data utilizing a set of multi-variate predictive models. The method yet also includes generating a set of component wear data values. The method yet further includes comparing the set of component wear data values against a set of useful life threshold ranges. The method moreover includes generating a warning if the set of component wear data values is outside of the set of useful life threshold ranges.
摘要翻译：提供了用于评估处理室的健康状态的方法。该方法包括执行配方。该方法还包括在执行配方期间从一组传感器接收处理数据。该方法还包括利用一组多变量预测模型来分析处理数据。该方法还包括生成一组部件磨损数据值。该方法还包括将该组部件磨损数据值与一组有用寿命阈值范围进行比较。该方法还包括如果该组件磨损数据值在该组有用寿命阈值范围之外则产生警告。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式