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1. 发明公开

EP2457420A4 SYSTEM AND METHOD FOR PLASMA ARC DETECTION, ISOLATION AND PREVENTION 审中-公开
标题翻译：系统和方法等离子弧检测，隔离和预防
公开(公告)号：EP2457420A4
公开(公告)日：2014-11-05
申请号：EP10802684
申请日：2010-07-16
申请人： LAM RES CORP
发明人： VALCORE JOHN C JR , SANTOS ED
IPC分类号： H05H1/46 , H01J37/32 , H01L21/3065 , H02H9/04
CPC分类号： H01J37/3299 , H01J37/32091 , H01J37/32174 , H01J37/32935

2. 发明申请

WO2011031590A3 METHODS AND ARRANGEMENT FOR PLASMA DECHUCK OPTIMIZATION BASED ON COUPLING OF PLASMA SIGNALING TO SUBSTRATE POSITION AND POTENTIAL 审中-公开
标题翻译：基于等离子体信号耦合到基底位置和潜力的等离子体去离子优化的方法和装置
公开(公告)号：WO2011031590A3
公开(公告)日：2011-06-30
申请号：PCT/US2010047382
申请日：2010-08-31
申请人： LAM RES CORP , VALCURE JR JOHN C , ULLAL SAURABH , BYUN DANIEL , SANTOS ED , MAKHRATCHEV KONSTANTIN
发明人： VALCURE JR JOHN C , ULLAL SAURABH , BYUN DANIEL , SANTOS ED , MAKHRATCHEV KONSTANTIN
IPC分类号： H01L21/66 , H01L21/205 , H01L21/3065 , H01L21/687
CPC分类号： H01L21/6833 , H01J37/32091 , H01J37/32935
摘要： A method for optimizing a dechuck sequence, which includes removing a substrate from a lower electrode. The method includes performing an initial analysis to determine if a first set of electrical characteristic data of a plasma formed during the dechuck sequence traverses a threshold values. If so, turning off the inert gas. The method also includes raising the lifter pins slightly from the lower electrode to move the substrate in an upward direction. The method further includes performing a mechanical and electrical analysis, which includes comparing a first set of mechanical data, which includes an amount of force exerted by the lifter pins, against a threshold value. The mechanical and electrical analysis also includes comparing a second set of electrical characteristic data against a threshold value. If both traverse the respective threshold value, removes the substrate from the lower electrode since a substrate-released event has occurred.
摘要翻译：一种用于优化解扣序列的方法，其包括从下电极去除衬底。该方法包括执行初始分析以确定在解扣序列期间形成的等离子体的第一组电特性数据是否穿过阈值。如果是这样，关闭惰性气体。该方法还包括从下电极稍微升高升降器销，以向上移动基板。该方法还包括执行机械和电气分析，其包括将包括提升器引脚施加的力的第一组机械数据与阈值进行比较。机械和电气分析还包括将第二组电特性数据与阈值进行比较。如果两者都穿过相应的阈值，则由于发生了衬底释放事件而从底部电极去除衬底。

3. 发明申请

WO2011011266A3 SYSTEM AND METHOD FOR PLASMA ARC DETECTION, ISOLATION AND PREVENTION 审中-公开
标题翻译：用于血浆ARC检测，分离和预防的系统和方法
公开(公告)号：WO2011011266A3
公开(公告)日：2011-04-21
申请号：PCT/US2010042205
申请日：2010-07-16
申请人： LAM RES CORP , VALCORE JOHN C JR , SANTOS ED
发明人： VALCORE JOHN C JR , SANTOS ED
IPC分类号： H05H1/46 , H01L21/3065
CPC分类号： H01J37/3299 , H01J37/32091 , H01J37/32174 , H01J37/32935
摘要： A device for use with an RF generating source, a first electrode, a second electrode and an element. The RF generating source is operable to provide an RF signal to the first electrode and thereby create a potential between the first electrode and the second electrode. The device comprises a connecting portion and a current sink. The connecting portion is operable to electrically connect to one of the first electrode, the second electrode and an element. The current sink is in electrical connection with the connection portion and a path to ground. The current sink comprises a voltage threshold. The current sink is operable to conduct current from the connecting portion to ground when a voltage on the electrically connected one of the first electrode, the second electrode and the element is greater than the voltage threshold.
摘要翻译：一种用于RF发生源，第一电极，第二电极和元件的装置。 RF产生源可操作以向第一电极提供RF信号，从而在第一电极和第二电极之间产生电位。该装置包括连接部分和电流槽。连接部分可操作以电连接到第一电极，第二电极和元件之一。电流吸收器与连接部分和接地路径电连接。电流吸收器包括电压阈值。当第一电极，第二电极和元件上的电连接的电压上的电压大于电压阈值时，电流吸收器可操作以将电流从连接部分传导到地。

4. 发明专利

SG177271A1 SYSTEM AND METHOD FOR PLASMA ARC DETECTION, ISOLATION AND PREVENTION 未知
公开(公告)号：SG177271A1
公开(公告)日：2012-02-28
申请号：SG2011093598
申请日：2010-07-16
申请人： LAM RES CORP
发明人： VALCORE JOHN C JR , SANTOS ED
摘要： A device for use with an RF generating source, a first electrode, a second electrode and an element. The RF generating source is operable to provide an RF signal to the first electrode and thereby create a potential between the first electrode and the second electrode. The device comprises a connecting portion and a current sink. The connecting portion is operable to electrically connect to one of the first electrode, the second electrode and an element. The current sink is in electrical connection with the connection portion and a path to ground. The current sink comprises a voltage threshold. The current sink is operable to conduct current from the connecting portion to ground when a voltage on the electrically connected one of the first electrode, the second electrode and the element is greater than the voltage threshold.

5. 发明专利

SG178372A1 METHODS AND ARRANGEMENT FOR PLASMA DECHUCK OPTIMIZATION BASED ON COUPLING OF PLASMA SIGNALING TO SUBSTRATE POSITION AND POTENTIAL 未知
公开(公告)号：SG178372A1
公开(公告)日：2012-03-29
申请号：SG2012009627
申请日：2010-08-31
申请人： LAM RES CORP
发明人： VALCURE JR JOHN C , ULLAL SAURABH , BYUN DANIEL , SANTOS ED , MAKHRATCHEV KONSTANTIN
摘要： A method for optimizing a dechuck sequence, which includes removing a substrate from a lower electrode. The method includes performing an initial analysis to determine if a first set of electrical characteristic data of a plasma formed during the dechuck sequence traverses a threshold values. If so, turning off the inert gas. The method also includes raising the lifter pins slightly from the lower electrode to move the substrate in an upward direction. The method further includes performing a mechanical and electrical analysis, which includes comparing a first set of mechanical data, which includes an amount of force exerted by the lifter pins, against a threshold value. The mechanical and electrical analysis also includes comparing a second set of electrical characteristic data against a threshold value. If both traverse the respective threshold value, removes the substrate from the lower electrode since a substrate-released event has occurred.

6. 发明专利

SG10201405047VA METHODS AND ARRANGEMENT FOR PLASMA DECHUCK OPTIMIZATION BASED ON COUPLING OF PLASMA SIGNALING TO SUBSTRATE POSITION AND POTENTIAL 未知
公开(公告)号：SG10201405047VA
公开(公告)日：2014-10-30
申请号：SG10201405047V
申请日：2010-08-31
申请人： LAM RES CORP
发明人： VALCURE JR JOHN C , ULLAL SAURABH , BYUN DANIEL , SANTOS ED , MAKHRATCHEV KONSTANTIN
摘要： A method for optimizing a dechuck sequence, which includes removing a substrate from a lower electrode. The method includes performing an initial analysis to determine if a first set of electrical characteristic data of a plasma formed during the dechuck sequence traverses a threshold values. If so, turning off the inert gas. The method also includes raising the lifter pins slightly from the lower electrode to move the substrate in an upward direction. The method further includes performing a mechanical and electrical analysis, which includes comparing a first set of mechanical data, which includes an amount of force exerted by the lifter pins, against a threshold value. The mechanical and electrical analysis also includes comparing a second set of electrical characteristic data against a threshold value. If both traverse the respective threshold value, removes the substrate from the lower electrode since a substrate-released event has occurred.

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