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    • 3. 发明申请
    • THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, AND FLAT PANEL DISPLAY DEVICE HAVING THE SAME
    • 薄膜晶体管,其制造方法以及具有该薄膜晶体管的平板显示器件
    • US20100181563A1
    • 2010-07-22
    • US12690149
    • 2010-01-20
    • Min-Kyu KIMJin-Seong PARKTae-Kyung AHNHyun-Joong CHUNG
    • Min-Kyu KIMJin-Seong PARKTae-Kyung AHNHyun-Joong CHUNG
    • H01L29/227H01L51/52H01L21/34
    • H01L29/7869H01L27/1225H01L27/3262
    • A thin film transistor using an oxide semiconductor as an active layer, and its method of manufacture. The thin film transistor includes: a substrate; an active layer formed of an oxide semiconductor; a gate insulating layer formed of a dielectric on the active layer, the dielectric having an etching selectivity of 20 to 100:1 with respect to the oxide semiconductor; a gate electrode formed on the gate insulating layer; an insulating layer formed on the substrate including the gate electrode and having contact holes to expose the active layer; and source and drain electrodes connected to the active layer through the contact holes. Since the source and drain electrodes are not overlapped with the gate electrode, parasitic capacitance between the source and drain electrodes and the gate electrode is minimized. Since the gate insulating layer is formed of dielectric having a high etching selectivity with respect to oxide semiconductor, the active layer is not deteriorated.
    • 使用氧化物半导体作为活性层的薄膜晶体管及其制造方法。 薄膜晶体管包括:基板; 由氧化物半导体形成的有源层; 由有源层上的电介质形成的栅极绝缘层,所述电介质具有相对于所述氧化物半导体为20〜100:1的蚀刻选择性; 形成在所述栅极绝缘层上的栅电极; 绝缘层,形成在包括所述栅电极的所述基板上,并具有露出所述有源层的接触孔; 并且源极和漏极通过接触孔连接到有源层。 由于源极和漏极不与栅电极重叠,所以源电极和漏极之间的寄生电容和栅电极最小化。 由于栅极绝缘层由相对于氧化物半导体具有高蚀刻选择性的电介质形成,所以有源层不会劣化。