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    • 1. 发明授权
    • Pattern forming method
    • 图案形成方法
    • US08411255B2
    • 2013-04-02
    • US12769926
    • 2010-04-29
    • Kyota NozuRyoji Kondo
    • Kyota NozuRyoji Kondo
    • G03B27/32G03B27/54
    • G03B27/32
    • A method of forming a pattern with dots or holes arranged in a two-dimensional period by illuminating, with illumination light, a mask having a light-shielding portion pattern on a translucent substrate, and performing projection and exposure of an object to be exposed through a projection optical system. The illumination light is an effective light source of multipole illumination. A first exposure process is performed with the mask placed at a first position relative to the object to be exposed, and a second exposure process is performed with the mask placed at a second position. The mask has line patterns having lines with a line width a [m] arranged in parallel at a pitch of P. The line patterns are arranged in a mesh such that the line patterns intersect one another at 60° in three directions, and the illumination light is an effective light source of hexapole illumination. The second exposure process is performed, after the first exposure process, with the mask placed at a second position displaced from the first position by 2P/3 [m] in a direction perpendicular to any line of the line patterns. A third exposure process is performed, after the second exposure process, with the mask placed at a third position further displaced from the second position by 2P/3 [m] in the direction, to thereby form a dot pattern in a two-dimensional period having a pitch of P/3 [m].
    • 通过照明光照射在半透明基板上具有遮光部分图案的掩模,并且通过在半透明基板上照射曝光对象的投影和曝光来形成具有以二维周期布置的点或孔的图案的方法 投影光学系统。 照明光是多极照明的有效光源。 在掩模放置在相对于要曝光的物体的第一位置处进行第一曝光处理,并且在将掩模放置在第二位置的情况下执行第二曝光处理。 掩模具有具有以P的间距平行布置的线宽a [m]的线的线图案。线图案布置成网格,使得线图案在三个方向上以60°彼此相交,并且照明 光是六极照明的有效光源。 在第一曝光处理之后,在垂直于线条图案的任何一行的方向上,将掩模放置在从第一位置移位2P / 3 [m]的第二位置处进行第二曝光处理。 在第二曝光处理之后,进行第三曝光处理,将掩模放置在沿第二位置进一步从第二位置移位2P / 3 [m]的第三位置,从而在二维周期中形成点图案 具有P / 3 [m]的间距。
    • 3. 发明申请
    • Manufacturing method for electronic device with functional thin film
    • 具有功能薄膜的电子器件的制造方法
    • US20060000081A1
    • 2006-01-05
    • US11159094
    • 2005-06-23
    • Ryoji Kondo
    • Ryoji Kondo
    • B23P19/00H01M10/14
    • H01J9/027Y10T29/53135
    • An object of the present invention is to obtain uniform shape of a thin film of an electronic device having a thin film. The present invention comprises the steps of: forming an substantially linear droplet pattern by applying an ink-jet head having a plurality of nozzles which discharge a droplet of a solvent containing a functional thin-film material to provide a substrate with droplets from at least part of a plurality of the nozzles; and drying the droplets which have been provided on the substrate, the drying step is performed by intake-exhaust means which is positioned in a direction orthogonal to the substantially linear droplet pattern from the ink-jet head and which has an exhaust opening wider than the approximate linear droplet pattern.
    • 本发明的目的是获得具有薄膜的电子器件的薄膜的均匀形状。 本发明包括以下步骤:通过施加具有多个喷嘴的喷墨头来形成基本上线性的液滴图案,所述多个喷嘴排出含有功能性薄膜材料的溶剂的液滴,从而从至少部分 的多个喷嘴; 并且干燥已经设置在基板上的液滴,干燥步骤通过进气排气装置进行,排气装置位于与喷墨头相同的基本线性液滴图案的方向上,并且具有比 近似线性液滴图案。
    • 7. 发明申请
    • EXPOSING METHOD AND DEVICE MANUFACTURING METHOD
    • 曝光方法和装置制造方法
    • US20100214553A1
    • 2010-08-26
    • US12706477
    • 2010-02-16
    • Ryoji Kondo
    • Ryoji Kondo
    • G03B27/32
    • G03F7/70125
    • In an exposing method which illuminates, by illumination light, a mask having apertures arranged in matrix and a latticed light shielding portion, projects the mask on an object to be projected via a projection optical system, and thus forms a dark portion pattern image at a position conjugate in relation to intersections of a lattice of the light shielding portion, an available light source shape of the illumination satisfies a specific condition. Therefore, it is possible to exposure a two-dimensional periodic pattern to a theoretical limit pitch being the same as that of a one-dimensional periodic pattern, and it is also possible to secure a depth of focus sufficiently.
    • 在通过照明光照射具有排列成矩阵状的孔径的格栅和栅格遮光部的曝光方法中,通过投影光学系统将掩模投射在待投影物体上,从而在a处形成暗部图案图像 相对于遮光部的格子的交点的位置共轭,照明的可用光源形状满足特定条件。 因此,可以将二维周期性图案曝光到与一维周期性图案相同的理论极限间距,并且还可以充分确保焦点深度。
    • 8. 发明授权
    • Mounting structure for rotary member
    • 旋转件安装结构
    • US07574945B2
    • 2009-08-18
    • US10594989
    • 2005-01-12
    • Ryoji Kondo
    • Ryoji Kondo
    • F16H55/17F16D1/06
    • G01P1/04F16D1/116F16D2001/103F16H57/0025Y10T74/19047Y10T74/19251Y10T403/7035
    • A rotary member mounting structure is configured for mounting a speedometer worm gear closely adjacent to a drive gear that is supported on an output shaft. The rotary member mounting structure basically has a rotation preventing structure, a first fastening ring and a second fastening ring. The rotation preventing structure is configured to prevent the drive gear from rotating relative to the output shaft 1 and to prevent the worm gear from rotating relative to the output shaft. The first fastening ring is configured to prevent the drive gear from sliding axially toward the worm gear and to prevent the worm gear from sliding axially toward the drive gear; and a second fastening ring is configured to prevent the worm gear from sliding axially in the direction opposite (i.e., away from) the drive gear.
    • 旋转构件安装结构构造成用于将速度计蜗轮紧紧地安装在支撑在输出轴上的驱动齿轮附近。 旋转构件安装结构基本上具有防旋转结构,第一紧固环和第二紧固环。 旋转防止结构被构造成防止驱动齿轮相对于输出轴1旋转并且防止蜗轮相对于输出轴旋转。 第一紧固环构造成防止驱动齿轮轴向滑向蜗轮并防止蜗轮轴向向驱动齿轮滑动; 并且第二紧固环被构造成防止蜗轮沿相反(即远离驱动齿轮)的方向轴向滑动。
    • 10. 发明授权
    • Exposing method and device manufacturing method
    • 公开方法和设备制造方法
    • US08228486B2
    • 2012-07-24
    • US12706477
    • 2010-02-16
    • Ryoji Kondo
    • Ryoji Kondo
    • G03B27/54
    • G03F7/70125
    • In an exposing method which illuminates, by illumination light, a mask having apertures arranged in matrix and a latticed light shielding portion, projects the mask on an object to be projected via a projection optical system, and thus forms a dark portion pattern image at a position conjugate in relation to intersections of a lattice of the light shielding portion, an available light source shape of the illumination satisfies a specific condition. Therefore, it is possible to exposure a two-dimensional periodic pattern to a theoretical limit pitch being the same as that of a one-dimensional periodic pattern, and it is also possible to secure a depth of focus sufficiently.
    • 在通过照明光照射具有排列成矩阵状的孔径的格栅和栅格遮光部的曝光方法中,通过投影光学系统将掩模投射在待投影物体上,从而在a处形成暗部图案图像 相对于遮光部的格子的交点的位置共轭,照明的可用光源形状满足特定条件。 因此,可以将二维周期性图案曝光到与一维周期性图案相同的理论极限间距,并且还可以充分确保焦点深度。