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1. 发明授权

US08773015B2 Method for manufacturing organic electroluminescent element having organic layers with periodic structure 失效
标题翻译：制造具有周期性结构的有机层的有机电致发光元件的方法
公开(公告)号：US08773015B2
公开(公告)日：2014-07-08
申请号：US13508222
申请日：2010-11-09
申请人： Kyoko Yamamoto , Jarrett Dumond , Hong Yee Low
发明人： Kyoko Yamamoto , Jarrett Dumond , Hong Yee Low
IPC分类号： H05B33/10 , H05B33/14
CPC分类号： H01L51/0014 , H01L51/0024 , H01L51/5012 , H01L51/5275 , H01L51/56 , H01L2251/105
摘要： Disclosed is a method for manufacturing an organic electroluminescent (EL) element which is provided with a pair of electrodes and two or more organic layers disposed between the electrodes, and which includes light-emitting layers as the two or more organic layers. The manufacturing method for an organic EL element includes: a step for forming one electrode of the pair of electrodes; a step for forming the two or more organic layers which have a periodic structure wherein the propagation direction of light propagating in a direction substantially perpendicular to the thickness direction of the light-emitting layers is inclined in said thickness direction; and a step for forming the other electrode of the pair of electrodes. In the step for forming the two or more organic layers, two or more planar layers constituting the organic layers are laminated, and the periodic structure which is periodically arranged in two dimensions is then formed on the two or more planar layers by means of an imprinting method in the plane perpendicular to the thickness direction of the light-emitting layers.
摘要翻译：公开了一种制造有机电致发光（EL）元件的方法，该有机电致发光元件设置有一对电极和设置在电极之间的两个或更多个有机层，并且包括作为两个或更多个有机层的发光层。有机EL元件的制造方法包括：形成该对电极的一个电极的工序; 用于形成具有周期性结构的两个或更多个有机层的步骤，其中沿着与发光层的厚度方向大致垂直的方向传播的光的传播方向在所述厚度方向上倾斜; 以及形成该对电极的另一个电极的步骤。在形成两个以上的有机层的工序中，层叠构成有机层的2层以上的平面层，并且通过印刷法在两层以上的平面层上形成二维周期性排列的周期性结构方法在垂直于发光层的厚度方向的平面中。

2. 发明申请

US20100291723A1 METHOD OF MANUFACTURING AN ORGANIC ELECTRONIC OR OPTOELECTRONIC DEVICE 审中-公开
标题翻译：制造有机电子或光电器件的方法
公开(公告)号：US20100291723A1
公开(公告)日：2010-11-18
申请号：US12675539
申请日：2007-08-28
申请人： Hong Yee Low , Jarrett Dumond , Karen Chong , Kyoko Yamamoto , Satoshi Amamiya
发明人： Hong Yee Low , Jarrett Dumond , Karen Chong , Kyoko Yamamoto , Satoshi Amamiya
IPC分类号： H01L51/54 , H01L51/56 , H01L21/02
CPC分类号： H01L27/3246 , H01L27/3283 , H01L51/0005
摘要： A method of manufacturing an organic electronic or optoelectronic device, the method comprising the steps of: (a) providing a substrate having a plurality of banks formed thereon with alternating well formations formed therebetween, the surface of said banks having imprint formations formed thereon of a dimension conferring a selected wetting property to the surface of said banks that is different from the surface of said wells; and (b) depositing an organic solution into said well formations, wherein the wetting property of said banks causes any organic solution deposited thereon to be at least partially repelled.
摘要翻译：一种制造有机电子或光电子器件的方法，所述方法包括以下步骤：（a）提供其上形成有多个堤的衬底，其间形成有交替的阱结构，所述堤的表面具有形成在其上的压印结构尺寸赋予与所述孔的表面不同的所述堤的表面的选定的润湿性; 和（b）将有机溶液沉积到所述井结构中，其中所述堤的润湿性使得沉积在其上的任何有机溶液至少部分地被排斥。

3. 发明申请

US20120306357A1 METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT 失效
标题翻译：制造有机电致发光元件的方法
公开(公告)号：US20120306357A1
公开(公告)日：2012-12-06
申请号：US13508222
申请日：2010-11-09
申请人： Kyoko Yamamoto , Jarrett Dumond , Hong Yee Low
发明人： Kyoko Yamamoto , Jarrett Dumond , Hong Yee Low
IPC分类号： H05B33/10 , H05B33/14
CPC分类号： H01L51/0014 , H01L51/0024 , H01L51/5012 , H01L51/5275 , H01L51/56 , H01L2251/105
摘要： Disclosed is a method for manufacturing an organic electroluminescent (EL) element which is provided with a pair of electrodes and two or more organic layers disposed between the electrodes, and which includes light-emitting layers as the two or more organic layers. The manufacturing method for an organic EL element includes: a step for forming one electrode of the pair of electrodes; a step for forming the two or more organic layers which have a periodic structure wherein the propagation direction of light propagating in a direction substantially perpendicular to the thickness direction of the light-emitting layers is inclined in said thickness direction; and a step for forming the other electrode of the pair of electrodes. In the step for forming the two or more organic layers, two or more planar layers constituting the organic layers are laminated, and the periodic structure which is periodically arranged in two dimensions is then formed on the two or more planar layers by means of an imprinting method in the plane perpendicular to the thickness direction of the light-emitting layers.
摘要翻译：公开了一种制造有机电致发光（EL）元件的方法，该有机电致发光元件设置有一对电极和设置在电极之间的两个或更多个有机层，并且包括作为两个或更多个有机层的发光层。有机EL元件的制造方法包括：形成该对电极的一个电极的工序; 用于形成具有周期性结构的两个或更多个有机层的步骤，其中沿着与发光层的厚度方向大致垂直的方向传播的光的传播方向在所述厚度方向上倾斜; 以及形成该对电极的另一个电极的步骤。在形成两个以上的有机层的工序中，层叠构成有机层的2层以上的平面层，并且通过印刷法在两层以上的平面层上形成二维周期性排列的周期性结构方法在垂直于发光层的厚度方向的平面中。

4. 发明授权

US09138977B2 Process for forming a laminated structure 有权
标题翻译：用于形成层压结构的方法
公开(公告)号：US09138977B2
公开(公告)日：2015-09-22
申请号：US13635655
申请日：2011-03-15
申请人： Jarrett Dumond , Hong Yee Low
发明人： Jarrett Dumond , Hong Yee Low
IPC分类号： B82Y40/00 , B32B38/06 , B29C65/00 , B82Y20/00 , B82Y30/00
CPC分类号： B32B3/30 , B29C66/91943 , B29C66/91945 , B32B7/045 , B32B27/308 , B32B38/06 , B32B2250/02 , B32B2307/40 , B32B2309/02 , B32B2309/04 , B32B2309/105 , B32B2309/12 , B32B2457/206 , B32B2551/00 , B82Y20/00 , B82Y30/00 , B82Y40/00 , C08J5/18 , C08J2333/12 , Y10T156/1039 , Y10T428/24364 , Y10T428/2462 , Y10T428/2998
摘要： There is provided a process for forming a laminated structure, the process comprising the step of bonding a polymer film to an array of structures disposed on a substrate, and wherein a plurality of cavities are formed between the polymer film and the array of structures during the bonding.
摘要翻译：提供了一种用于形成层压结构的方法，该方法包括将聚合物膜结合到设置在基底上的结构阵列的步骤，并且其中在聚合物膜和结构阵列之间形成多个空腔粘接。

5. 发明授权

US07704432B2 Imprint lithographic method for making a polymeric structure 有权
标题翻译：用于制造聚合物结构的印记平版印刷方法
公开(公告)号：US07704432B2
公开(公告)日：2010-04-27
申请号：US11436833
申请日：2006-05-18
申请人： Jarrett Dumond , Hong Yee Low
发明人： Jarrett Dumond , Hong Yee Low
IPC分类号： B28B3/06 , A61M25/00 , B29C59/02 , B28B7/10
CPC分类号： A61M25/00 , B27N3/08 , B28B3/06 , B81C99/0085 , B81C2201/034 , B81C2203/032 , B81C2203/038 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24479 , Y10T428/254
摘要： An imprint lithographic method for making a polymeric structure comprising the steps of: (a) providing a mold having a shape forming a mold pattern; (b) providing a substrate having a higher surface energy relative to said mold; (c) providing a polymer film on said mold, said polymer film having a selected thickness, wherein the selected thickness of the polymer film on the mold pattern is capable of forming at least one frangible region in the polymer film having a thickness that is less than the remainder of the polymer film; (d) pressing the mold and the substrate relatively toward each other to form said frangible region; and (e) releasing at least one of said mold and said substrate from the other, wherein after said releasing, said frangible region remains substantially attached to said mold while the remainder of said polymer film forms the polymeric structure attached to said substrate.
摘要翻译：一种用于制造聚合物结构的压印光刻方法，包括以下步骤：（a）提供具有形成模具图案的形状的模具; （b）提供相对于所述模具具有更高表面能的基底; （c）在所述模具上提供聚合物膜，所述聚合物膜具有选定的厚度，其中模具图案上的聚合物膜的选定厚度能够在聚合物膜中形成至少一个具有较小厚度的易碎区域比其余的聚合物膜; （d）相对于彼此挤压模具和基板以形成所述易碎区域; 和（e）将所述模具和所述基材中的至少一个从另一个释放，其中在所述释放之后，所述易碎区保持基本上附着到所述模具，而所述聚合物膜的其余部分形成附着到所述基底的聚合物结构。

6. 发明申请

US20130011626A1 PROCESS FOR FORMING A LAMINATED STRUCTURE 有权
公开(公告)号：US20130011626A1
公开(公告)日：2013-01-10
申请号：US13635655
申请日：2011-03-15
申请人： Jarrett Dumond , Hong Yee Low
发明人： Jarrett Dumond , Hong Yee Low
IPC分类号： B29C59/02 , B32B27/14 , C09J5/00 , B32B3/30
CPC分类号： B32B3/30 , B29C66/91943 , B29C66/91945 , B32B7/045 , B32B27/308 , B32B38/06 , B32B2250/02 , B32B2307/40 , B32B2309/02 , B32B2309/04 , B32B2309/105 , B32B2309/12 , B32B2457/206 , B32B2551/00 , B82Y20/00 , B82Y30/00 , B82Y40/00 , C08J5/18 , C08J2333/12 , Y10T156/1039 , Y10T428/24364 , Y10T428/2462 , Y10T428/2998
摘要： There is provided a process for forming a laminated structure, the process comprising the step of bonding a polymer film to an array of structures disposed on a substrate, and wherein a plurality of cavities are formed between the polymer film and the array of structures during the bonding.

7. 发明授权

US07615179B2 Method of imprinting shadow mask nanostructures for display pixel segregation 失效
标题翻译：印刷阴影纳米结构用于显示像素分离的方法
公开(公告)号：US07615179B2
公开(公告)日：2009-11-10
申请号：US11089101
申请日：2005-03-24
申请人： Jarrett Dumond , Hong Yee Low
发明人： Jarrett Dumond , Hong Yee Low
IPC分类号： A61M25/00 , B28B11/08 , B29C59/02 , C03C15/00 , H01J29/80
CPC分类号： A61M25/00 , B27N3/08 , B28B3/06 , B81C99/0085 , B81C2201/034 , B81C2203/032 , B81C2203/038 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24479 , Y10T428/254
摘要： The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials, particularly for pixel segregation in OLED-based displays. In some embodiments, a duo-mold approach is employed in the fabrication of these structures. In such methods, surface treatments are employed to impart differential surface energies to different molds and/or different parts of the mold(s). Such surface treatments permit the formation of three-dimensional (3-D) structures through imprinting and the transfer of such structures to a substrate. In some or other embodiments, such surface treatments and variation in glass transition temperature of the polymers used can facilitate separation of the 3-D structures from the molds to form free-standing micro- and/or nano-structures individually and/or in a film. In some or other embodiments, a “latch-on” assembly technique is utilized to form supported and/or free-standing stacked micro- and/or nano-structures that enable the assembly of polymers without a glass transition temperature and eliminate the heating required to assemble thermoplastic polymers.
摘要翻译：本发明涉及微尺度和纳米级压印方法，并且使用这种方法来制造聚合物，陶瓷和/或金属材料的负载和/或独立的3-D微观和/或纳米结构特别是用于基于OLED的显示器中的像素分离。在一些实施例中，在制造这些结构中采用双模方法。在这种方法中，使用表面处理以将不同的表面能赋予模具的不同模具和/或模具的不同部分。这种表面处理允许通过压印形成三维（3-D）结构并将这种结构转移到基底上。在一些或其它实施方案中，所使用的聚合物的这种表面处理和玻璃化转变温度的变化可促进3-D结构与模具的分离，以单独形成独立的和/或纳米结构，并且/ 电影。在一些或其它实施方案中，使用“闭锁”组装技术来形成支撑和/或独立堆叠的微结构和/或纳米结构，其能够组装聚合物而不具有玻璃化转变温度并消除所需的加热组装热塑性聚合物。

8. 发明申请

US20060214330A1 Imprint lithographic method for making a polymeric structure 有权
标题翻译：用于制造聚合物结构的印记平版印刷方法
公开(公告)号：US20060214330A1
公开(公告)日：2006-09-28
申请号：US11436833
申请日：2006-05-18
申请人： Jarrett Dumond , Hong Low
发明人： Jarrett Dumond , Hong Low
IPC分类号： B29C59/02
CPC分类号： A61M25/00 , B27N3/08 , B28B3/06 , B81C99/0085 , B81C2201/034 , B81C2203/032 , B81C2203/038 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24479 , Y10T428/254
摘要： An imprint lithographic method for making a polymeric structure comprising the steps of: (a) providing a mold having a shape forming a mold pattern; (b) providing a substrate having a higher surface energy relative to said mold; (c) providing a polymer film on said mold, said polymer film having a selected thickness, wherein the selected thickness of the polymer film on the mold pattern is capable of forming at least one frangible region in the polymer film having a thickness that is less than the remainder of the polymer film; (d) pressing the mold and the substrate relatively toward each other to form said frangible region; and (e) releasing at least one of said mold and said substrate from the other, wherein after said releasing, said frangible region remains substantially attached to said mold while the remainder of said polymer film forms the polymeric structure attached to said substrate.
摘要翻译：一种用于制造聚合物结构的压印光刻方法，包括以下步骤：（a）提供具有形成模具图案的形状的模具; （b）提供相对于所述模具具有更高表面能的基底; （c）在所述模具上提供聚合物膜，所述聚合物膜具有选定的厚度，其中模具图案上的聚合物膜的选定厚度能够在聚合物膜中形成至少一个具有较小厚度的易碎区域比其余的聚合物膜; （d）相对于彼此挤压模具和基板以形成所述易碎区域; 和（e）将所述模具和所述基材中的至少一个从另一个释放，其中在所述释放之后，所述易碎区保持基本上附着到所述模具，而所述聚合物膜的其余部分形成附着到所述基底的聚合物结构。

9. 发明申请

US20130048502A1 SYSTEMS AND PROCESSES FOR FORMING MOLDS SUCH AS NICKEL MOLDS 有权
标题翻译：用于形成如尼克胶的产品的系统和工艺
公开(公告)号：US20130048502A1
公开(公告)日：2013-02-28
申请号：US13593272
申请日：2012-08-23
申请人： Kambiz Ansari , Christina Yuan Ling Tan , Yee Chong Loke , Jarrett Dumond , Isabel Rodriguez
发明人： Kambiz Ansari , Christina Yuan Ling Tan , Yee Chong Loke , Jarrett Dumond , Isabel Rodriguez
IPC分类号： C25D1/10 , C23C14/34
CPC分类号： C25D1/10 , C23C14/046 , C23C14/205 , C23C14/584 , C23C14/5873 , C25D1/006
摘要： For forming a nickel mold, a metal and a corresponding etchant are selected such that the etchant selectively etches the metal over nickel. The metal is sputtered onto a surface of a template having nano-structures to form a sacrificial layer covering the nano-structures. Nickel is electroplated onto the sacrificial layer to form a nickel mold, but leaving a portion of the sacrificial layer exposed. The sacrificial layer is contacted with the etchant through the exposed portion of the sacrificial layer to etch away the sacrificial layer until the nickel mold is separated from the template. Subsequently, the nickel mold may be replicated or scaled-up to produce a replicate mold by electroplating, where the replicate mold has nano-structures that match the nano-structures on the template. The metal may be copper.
摘要翻译：为了形成镍模具，选择金属和相应的蚀刻剂，使得蚀刻剂选择性地在镍上蚀刻金属。将金属溅射到具有纳米结构的模板的表面上以形成覆盖纳米结构的牺牲层。将镍电镀到牺牲层上以形成镍模具，但是使牺牲层的一部分露出。牺牲层通过牺牲层的暴露部分与蚀刻剂接触以蚀刻掉牺牲层，直到镍模与模板分离。随后，可以复制或放大镍模具以通过电镀产生复制模具，其中复制模具具有与模板上的纳米结构相匹配的纳米结构。金属可以是铜。

10. 发明授权

US09139924B2 Systems and processes for forming molds such as nickel molds 有权
标题翻译：用于成型模具如镍模具的系统和工艺
公开(公告)号：US09139924B2
公开(公告)日：2015-09-22
申请号：US13593272
申请日：2012-08-23
申请人： Kambiz Ansari , Christina Yuan Ling Tan , Yee Chong Loke , Jarrett Dumond , Isabel Rodriguez
发明人： Kambiz Ansari , Christina Yuan Ling Tan , Yee Chong Loke , Jarrett Dumond , Isabel Rodriguez
IPC分类号： C25D1/10 , C25D1/00 , C23C14/04 , C23C14/20 , C23C14/58
CPC分类号： C25D1/10 , C23C14/046 , C23C14/205 , C23C14/584 , C23C14/5873 , C25D1/006
摘要： For forming a nickel mold, a metal and a corresponding etchant are selected such that the etchant selectively etches the metal over nickel. The metal is sputtered onto a surface of a template having nano-structures to form a sacrificial layer covering the nano-structures. Nickel is electroplated onto the sacrificial layer to form a nickel mold, but leaving a portion of the sacrificial layer exposed. The sacrificial layer is contacted with the etchant through the exposed portion of the sacrificial layer to etch away the sacrificial layer until the nickel mold is separated from the template. Subsequently, the nickel mold may be replicated or scaled-up to produce a replicate mold by electroplating, where the replicate mold has nano-structures that match the nano-structures on the template. The metal may be copper.
摘要翻译：为了形成镍模具，选择金属和相应的蚀刻剂，使得蚀刻剂选择性地在镍上蚀刻金属。将金属溅射到具有纳米结构的模板的表面上以形成覆盖纳米结构的牺牲层。将镍电镀到牺牲层上以形成镍模具，但是使牺牲层的一部分露出。牺牲层通过牺牲层的暴露部分与蚀刻剂接触以蚀刻掉牺牲层，直到镍模与模板分离。随后，可以复制或放大镍模具以通过电镀产生复制模具，其中复制模具具有与模板上的纳米结构相匹配的纳米结构。金属可以是铜。

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