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    • 2. 发明授权
    • Projection device
    • 投影设备
    • US4316665A
    • 1982-02-23
    • US100858
    • 1979-12-06
    • Noritaka MochizukiSetsuo MinamiYoshiya MatsuiKoyo MidorikawaAtsuo TsunodaHidetoshi MuraseMikio SuzutaMasazumi Moriwaki
    • Noritaka MochizukiSetsuo MinamiYoshiya MatsuiKoyo MidorikawaAtsuo TsunodaHidetoshi MuraseMikio SuzutaMasazumi Moriwaki
    • G02B3/00G03B27/52G03B27/00
    • G02B3/0056G02B3/0062G03B27/525
    • In a slit exposure type copying machine, a projection device basically includes transmission type element lens systems each including a lens having a great length in the direction of the optic axis thereof as compared with the effective diameter thereof. A part area of an original is projected upon a predetermined part area on an image plane and the light intensity distribution of the projected part area has a predetermined central area controlled by lens aperture eclipse and extending diametrically from at least the optic axis and a marginal area lying outwardly of the central area and weak in light intensity. A plurality of such element lens systems are substantially equidistantly arranged in the lengthwise direction of the slit in a plane perpendicular to the optic axis so that the marginal areas in at least the element lens systems are superposed upon one another. Further, the element lens systems are arranged in a plurality of rows so that each row is positioned just intermediate the adjacent row, whereby even if there is an error in the arrangement interval of the element lens systems, the uniformity, in the slit area, of the exposure amount time-integrated in the original scanning direction is maintained.
    • 在狭缝曝光型复印机中,投影装置基本上包括透射型元件透镜系统,每个透镜式元件透镜系统都包​​括与其有效直径相比在其光轴方向上具有大长度的透镜。 原稿的部分区域投影在图像平面上的预定部分区域上,并且投影部分区域的光强度分布具有由透镜孔径限制控制的预定中心区域,并且至少从光轴和边缘区域直径延伸 位于中心区域外面,光线强弱。 多个这样的元件透镜系统在垂直于光轴的平面中在狭缝的纵向方向上基本上等距地布置,使得至少元件透镜系统中的边缘区域彼此重叠。 此外,元件透镜系统布置成多行,使得每行位于相邻行的正中间,由此即使元件透镜系统的布置间隔中存在误差,在狭缝区域中的均匀性, 维持在原始扫描方向上积分的曝光量。
    • 3. 发明授权
    • Projection device
    • 投影设备
    • US4275962A
    • 1981-06-30
    • US105789
    • 1979-12-20
    • Koyo MidorikawaAtsuo TsunodaHidetoshi MuraseNoritaka MochizukiSetsuo MinamiYoshiya MatsuiMasazumi MoriwakiMikio Suzuta
    • Koyo MidorikawaAtsuo TsunodaHidetoshi MuraseNoritaka MochizukiSetsuo MinamiYoshiya MatsuiMasazumi MoriwakiMikio Suzuta
    • G02B3/00G02B13/24G03B27/52G03G15/04G03B27/00
    • G02B3/0062G02B13/24G02B3/0075G03B27/525G03G15/0409G02B3/0087
    • This specification discloses a compact projection device in which lens systems extending in the direction of the optic axis for projecting a part area of an object upon a predetermined part area on an image plane (hereinafter referred to as element lens systems) are initially set by a lens holding member having groove portions or hole portions extending in the direction of the optic axis, the distributions of intensity of light of the element lens systems on the image plane are controlled by an aperture eclipse such that the intensity of light is weaker in the marginal area than at least in the central area, a plurality of such element lens systems are arranged in a predetermined direction in a plane perpendicular to the optic axis and the distributions of intensity of light of the element lens systems are suitably superposed upon one another at least in the marginal area to provide uniformity of the distribution of the exposure amount integrated in the scanning direction with respect to the lengthwise direction of the slit of a copying machine of the slit exposure type. The element lens system each comprises two bar lenses each having a great length in the direction of the optic axis thereof as compared with the effective diameter thereof, and an intermediate image is once formed between the bar lenses and finally, a one-to-one magnification image is provided. The element lens systems are arranged in more than two rows in a honeycomb-like fashion such that the element lens systems of each row are positioned intermediate the element lens systems of the other row as viewed in the direction of the optic axis, whereby the uniformity of the distribution of the exposure amount integrated in the scanning direction with respect to the lengthwise direction of the slit is improved.
    • 本说明书公开了一种紧凑的投影装置,其中在光轴方向上延伸的透镜系统用于将物体的一部分区域投影在图像平面上的预定部分区域(以下称为元件透镜系统)上,最初由 透镜保持构件具有沿光轴方向延伸的凹槽部分或孔部分,像面上的元件透镜系统的光强度分布由孔径日食控制,使得光的强度在边缘较弱 区域至少在中心区域中,多个这样的元件透镜系统在垂直于光轴的平面中沿预定方向布置,并且元件透镜系统的光强度的分布至少适当地叠加在彼此上 在边缘区域中以提供在扫描方向上集成的曝光量的分布的均匀性 沿狭缝曝光型的复印机的狭缝的长度方向。 元件透镜系统各自包括两个条形透镜,每个透镜在其光轴的方向上与其有效直径相比具有大的长度,并且在条形透镜之间一度形成中间图像,最后是一对一 提供放大图像。 元件透镜系统以蜂窝状方式布置成两行以上,使得每行的元件透镜系统位于沿着光轴方向观察的另一排的元件透镜系统的中间,由此均匀性 提高了相对于狭缝的长度方向在扫描方向上积分的曝光量的分布。
    • 6. 发明授权
    • Projection device
    • 投影设备
    • US4368975A
    • 1983-01-18
    • US240835
    • 1981-03-05
    • Yoshiya MatsuiSetsuo MinamiNoritaka MochizukiIsao HarumotoAtsuo TsunodaShiro HiraiMasami Ohkubo
    • Yoshiya MatsuiSetsuo MinamiNoritaka MochizukiIsao HarumotoAtsuo TsunodaShiro HiraiMasami Ohkubo
    • G03B27/50G02B3/00G02B13/22G02B13/24G02B27/18G03G15/04G03G15/047G03B27/48
    • G02B13/24G02B13/22G02B3/00
    • This specification discloses a projection device in which a plurality of element lens systems for projecting a part area of an object onto a predetermined part area on the image plane at erect one-to-one magnification are arranged parallel to one another in a plane perpendicular to the optical axis. Each element lens system is a telecentric system comprising three thin lenses of the same shape arranged in the direction of the optical axis, and an intermediate lens is provided at a position deviated from the intermediate point between the object side lens and the image plane side lens. A light absorbing member for extinguishing any light rays exceeding the effective lens diameter is provided between the lenses, and the light intensity distribution on the image plane of each element lens system is controlled substantially to Gauss distribution form by aperture eclipse and, even if there is any error in the arrangement interval, the exposure amount distribution in the arrangement direction superposed on the image plane is uniform.
    • 本说明书公开了一种投影装置,其中用于将物体的一部分区域以直立的一对一放大率在像面上的预定部分区域投影的多个元件透镜系统在垂直于...的平面中彼此平行地布置 光轴。 每个元件透镜系统是一种远心系统,包括沿光轴方向布置的相同形状的三个薄透镜,并且在偏离物侧透镜和像平面侧透镜之间的中间点的位置处设置中间透镜 。 在透镜之间设置用于熄灭超过有效透镜直径的光线的光吸收部件,并且每个元件透镜系统的像面上的光强度分布基本上由孔眼日蚀控制为高斯分布形式,并且即使存在 布置间隔中的任何误差,叠加在图像平面上的排列方向上的曝光量分布是均匀的。
    • 8. 发明授权
    • Projecting device
    • 投影设备
    • US4626082A
    • 1986-12-02
    • US647270
    • 1984-09-04
    • Noritaka MochizukiSetsuo MinamiYoshiya MatsuiTadasu Taniguchi
    • Noritaka MochizukiSetsuo MinamiYoshiya MatsuiTadasu Taniguchi
    • G02B3/00G02B13/24G03B27/52G02B13/26
    • G02B3/0056G02B13/24G03B27/525
    • A projecting device comprising an array of axial element lens systems, wherein each element lens system includes a single bar lens having an axial length larger than the effective aperture and adapted to form an intermediate image of a pixel of the object plane and an erect image of a magnification of unity not vertically nor laterally inverted in such a manner that the light intensity on the image plane corresponding to said pixel is defined in the form of Gaussian distribution by the eclipse of the aperture. The element lens systems are arranged in a plane perpendicular to the optical axis so as to cause the light intensity distributions of said systems to mutually overlap in the peripheral areas thereof on the image plane, wherein each row of the systems in the array is displaced by a half pitch with respect to the neighboring row to constitute a staggered arrangement thereby achieving a uniform exposure distribution, integrated in time, in the scanning direction.
    • 一种包括轴向元件透镜系统的阵列的投影装置,其中每个元件透镜系统包括具有大于有效孔径的轴向长度的单杆透镜,并且适于形成物平面的像素的中间图像和 单位的放大率不垂直或横向倒置,使得对应于所述像素的图像平面上的光强度通过孔径的日食被限定为高斯分布的形式。 元件透镜系统布置在垂直于光轴的平面中,以便使得所述系统的光强度分布在其在像平面上的周边区域中相互重叠,其中阵列中的每一系列被位移 相对于相邻行的半间距构成交错布置,从而实现在扫描方向上集成的均匀的曝光分布。
    • 9. 发明授权
    • Projection apparatus
    • 投影仪
    • US4431299A
    • 1984-02-14
    • US134222
    • 1980-03-26
    • Yoshiya MatsuiSetsuo MinamiNoritaka Mochizuki
    • Yoshiya MatsuiSetsuo MinamiNoritaka Mochizuki
    • G02B3/00G02B27/18G03B27/52G03G15/28G03B27/48
    • G02B3/0056G02B27/18G03B27/528
    • A projection apparatus for forming an image of original on a photosensitive material opposed to the plane of the original. The projection apparatus has a projecting system composed of a plurality of projection optical system arrays. Each individual projection optical system is composed of a first and a second lens coaxially disposed and having a relatively large length as compared with its effective lens diameter respectively. The first lens is an exit side telecentric lens whereas the second one is an incident side telecentric lens. The first lens forms an intermediate image of a portion of the original on a plane between the first and second lenses and the second lens reforms the intermediate image on the photosensitive material.
    • 一种投影装置,用于在与原稿的平面相对的感光材料上形成原稿的图像。 投影装置具有由多个投影光学系统阵列构成的投影系统。 每个单独的投影光学系统由分别与其有效透镜直径相比同轴布置并具有相对较大长度的第一和第二透镜组成。 第一透镜是出射侧远心透镜,而第二透镜是入射侧远心透镜。 第一透镜在第一和第二透镜之间的平面上形成原稿的一部分的中间图像,并且第二透镜改变感光材料上的中间图像。