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    • 8. 发明申请
    • Electron Spectroscopy Analysis Method and Analytical Apparatus
    • 电子光谱分析方法及分析仪器
    • US20080042057A1
    • 2008-02-21
    • US10595614
    • 2004-10-27
    • Noriaki SanadaYoshiharu OhashiAkira YamamotoRetsu Oiwa
    • Noriaki SanadaYoshiharu OhashiAkira YamamotoRetsu Oiwa
    • G01N23/227
    • B82Y30/00B82Y15/00G01N23/2202G01N23/2252
    • [Task] The invention enables uniformly etching a surface of a sample with an improved repeatability, and etching at a low cost without requiring any large-scale equipment.[Means for Solving the Problem] In an electron spectroscopy analytical apparatus (1) for executing an analysis of a composition, a chemical state and the like of a surface of a sample (4) or in a depth direction thereof by irradiating an X-ray to the sample (4) from a high-energy particle irradiating unit (6) within a vacuum chamber (2) under a vacuum atmosphere, and detecting a kinetic energy of electrons emitted from the sample (4) by an electric energy analyzer (7) on the basis of a photoelectric effect, the surface of the sample (4) is ion-etched by irradiating a fullerene ion beam to the surface of the sample (4) from an ion gun (8) before irradiating the high-energy particle to the sample (4).
    • [任务]本发明能够以改善的重复性均匀地蚀刻样品的表面,并且以低成本进行蚀刻,而不需要任何大型设备。 解决问题的手段在电子光谱分析装置(1)中,通过照射X射线照相机,对试样(4)的表面或其深度方向的组成,化学状态等进行分析, 在真空室内从真空室(2)内的高能粒子照射单元(6)向样品(4)射线,并用电能分析仪(4)检测从样品(4)发射的电子的动能( 如图7所示),基于光电效应,通过在照射高能量之前从离子枪(8)照射富勒烯离子束至样品(4)的表面,对样品(4)的表面进行离子蚀刻 颗粒到样品(4)。