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    • 5. 发明授权
    • Semiconductor device
    • 半导体器件
    • US08698309B2
    • 2014-04-15
    • US13397892
    • 2012-02-16
    • Shigefumi DohiKouji Oomori
    • Shigefumi DohiKouji Oomori
    • H01L23/48H01L23/02
    • H01L25/105H01L23/49811H01L2224/16225H01L2225/1023H01L2225/1058H01L2924/15311H01L2924/15331H01L2924/3511H05K3/3436H05K3/3452H05K2201/099
    • A semiconductor device includes a first semiconductor device and second semiconductor device stacked on the first semiconductor device. The first semiconductor device includes a first interconnect substrate, a first semiconductor element provided on an upper surface of the first interconnect substrate, a first electrode provided on the upper surface of the first interconnect substrate, and an insulating layer having an opening portion through which part of the first electrode is exposed. The second semiconductor device includes a second interconnect substrate, a second semiconductor element provided on an upper surface of the second interconnect substrate, a second electrode provided on a lower surface of the second interconnect substrate, and an inter-device connection terminal connected to the second electrode. Part of the first electrode exposed through the opening portion has a smaller area than an area of the opening portion.
    • 半导体器件包括堆叠在第一半导体器件上的第一半导体器件和第二半导体器件。 第一半导体器件包括第一互连衬底,设置在第一互连衬底的上表面上的第一半导体元件,设置在第一互连衬底的上表面上的第一电极和具有开口部分的绝缘层, 的第一电极暴露。 第二半导体器件包括第二互连衬底,设置在第二互连衬底的上表面上的第二半导体元件,设置在第二互连衬底的下表面上的第二电极和连接到第二互连衬底的器件间连接端子 电极。 通过开口部暴露的第一电极的一部分具有比开口部的面积小的面积。