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    • 1. 发明专利
    • METHOD OF MANUFACTURING AVALANCHE PHOTODIODE BY Bi-CMOS PROCESS
    • 通过Bi-CMOS工艺制造AVALANCHE光电子的方法
    • JP2014045198A
    • 2014-03-13
    • JP2013194906
    • 2013-09-20
    • Koninklijke Philips Nvコーニンクレッカ フィリップス エヌ ヴェ
    • ANCO HERINGATHOMAS FRACHAGARWAL PRABHAT
    • H01L31/107G01T1/161G01T1/20H01L27/144H01L27/146
    • H01L31/115H01L27/1446H01L31/107H01L31/1804Y02E10/547Y02P70/521
    • PROBLEM TO BE SOLVED: To provide a photodiode that prevents breakdown at a pn-junction end.SOLUTION: A radiation detector 46 includes a semiconductor layer 12 formed on a substrate 14 and a scintillator 30 formed on the semiconductor layer 12. The semiconductor layer 12 includes an n-type doped region 16 disposed so as to be adjacent to the substrate 14 and a p-type doped region 18 disposed so as to be adjacent to the n-type doped region 16. In the semiconductor layer 12, a trench 20 is formed. The trench 20 surrounds the p-type doped region 18, reduces the curvature of a pn junction at an end of the pn junction, and is filled with material 22 that prevents breakdown at the end. The scintillator 30 is disposed on the p-type doped region 18 so as to be optically coupled to the region 18. The radiation detector 46 further includes at least one conductive electrode 24 being electrically in contact with the n-type doped region 16.
    • 要解决的问题:提供一种防止pn结端破坏的光电二极管。解决方案:辐射检测器46包括形成在基板14上的半导体层12和形成在半导体层12上的闪烁体30.半导体层12 包括以与衬底14相邻的方式设置的n型掺杂区域16和与n型掺杂区域16相邻设置的p型掺杂区域18.在半导体层12中,沟槽20 形成了。 沟槽20围绕p型掺杂区域18,减小了在pn结端部的pn结的曲率,并且填充有材料22,该材料22防止了末端的破坏。 闪烁体30设置在p型掺杂区域18上以便光学耦合到区域18.辐射检测器46还包括至少一个与n型掺杂区域16电接触的导电电极24。