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1. 发明专利

JP2003324095A Substrate cooling circuit for semiconductor manufacturing device and semiconductor manufacturing device provided with cooling circuit 审中-公开
标题翻译：用于半导体制造装置的基板冷却电路和具有冷却电路的半导体制造装置
公开(公告)号：JP2003324095A
公开(公告)日：2003-11-14
申请号：JP2002130397
申请日：2002-05-02
申请人： Komatsu Ltd , 株式会社小松製作所
发明人： MASUTANI YOSHINOBU , TSUJIMURA SHINJI
IPC分类号： C23C14/50 , C23C16/50 , H01L21/265 , H01L21/3065 , H01L21/68 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide cooling circuits for a semiconductor manufacturing device in which the influence of a magnetic field generated from a flow of a cooling medium is reduced. SOLUTION: A cooling device cools the semiconductor manufacturing device (10) for processing a wafer (W) under plasma gas atmosphere or electric field atmosphere by a cooling medium such as water. Each of cooling circuits (20, 30, and 40) is constituted of a 1st channel (27) for flowing the cooling medium in an optional direction and a 2nd channel (28) having approximately the same length to flow the cooling medium in the reverse direction against the flowing direction of the 1st passage (27), the 1st and 2nd channels (27, 28) are adjacently arranged and a magnetic field generated by the cooling medium flowing in the 1st channel (27) and the 2nd channel (28) is cancelled at the outside of the cooling circuit to reduce the influence of the magnetic field. Consequently various kinds of processing for manufacturing semiconductors can be suitably and stably performed. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种半导体制造装置的冷却回路，其中由冷却介质的流动产生的磁场的影响减小。解决方案：冷却装置冷却半导体制造装置（10），用于通过诸如水的冷却介质在等离子体气体气氛或电场气氛下处理晶片（W）。每个冷却回路（20,30,40）由用于沿可选方向流动冷却介质的第一通道（27）和具有大致相同长度的第二通道（28）构成，以使冷却介质反向流动相对于第一通道（27）的流动方向的方向相邻，第一和第二通道（27,28）相邻布置，并且由第一通道（27）和第二通道（28）中流动的冷却介质产生的磁场，在冷却回路的外部被取消，以减小磁场的影响。因此，可以适当且稳定地进行各种制造半导体的处理。版权所有（C）2004，JPO

2. 发明专利

JP2013133774A Reducing agent aqueous solution mixing device and exhaust gas post-treatment device 有权
标题翻译：还原剂水溶液混合装置和排气后处理装置
公开(公告)号：JP2013133774A
公开(公告)日：2013-07-08
申请号：JP2011285450
申请日：2011-12-27
申请人： Komatsu Ltd , 株式会社小松製作所
发明人： IIJIMA TADASHI , KIZAWA HIROSHI , ITO BOKU , TSUJIMURA SHINJI , KATO TAKASHI , ORITA TETSUO , NAMIMATSU HIROTO , HARA KAZUO , TOMIOKA HIROYUKI
IPC分类号： F01N3/24 , B01D53/94 , F01N3/08 , F01N3/28
CPC分类号： F01N3/2882 , B01D53/90 , B01D53/9431 , B01D2251/2067 , B01F3/04049 , B01F5/0473 , B01F5/0485 , B01F5/0498 , B01F5/0659 , F01N3/035 , F01N3/2066 , F01N3/208 , F01N3/2892 , F01N13/009 , F01N13/08 , F01N2240/20 , F01N2470/16 , F01N2610/02 , F01N2610/1453 , Y02T10/24
摘要： PROBLEM TO BE SOLVED: To provide a urea aqueous solution mixing device which can properly mix a urea aqueous solution and exhaust gas together and which restrains the urea aqueous solution from adhering to an inner wall of an exhaust pipe.SOLUTION: This device includes the exhaust pipe 4B, an injector 5, a mixing pipe 6, and an inner pipe 7. The exhaust pipe 4B comprises an elbow portion 10 which has a curved portion, and a straight portion 11 which is provided on the downstream side of the elbow portion 10. The injector 5, which is provided outside the curved portion of the elbow portion 10, emits a jet of urea aqueous solution to the straight portion 11. The mixing pipe 6 is arranged in such a manner as to cover the periphery of the urea aqueous solution jetted from the injector 5, inside the elbow portion 10, and has a plurality of openings 6a on an outer peripheral surface. The inner pipe 7, which is arranged with a space between itself and an outlet portion of the mixing pipe 6 on the downstream side of the mixing pipe 6 and with a space between itself and the inner wall of the straight portion 11, enables the exhaust gas to be circulated through its inside and outer peripheral portion.
摘要翻译：要解决的问题：提供一种尿素水溶液混合装置，其可以将尿素水溶液和废气适当地混合在一起并且抑制尿素水溶液粘附到排气管的内壁。解决方案：该装置包括排气管4B，喷射器5，混合管6和内管7.排气管4B包括具有弯曲部分的弯头部分10和设置在弯头部分10的下游侧的直线部分11 设置在弯头部10的弯曲部的外侧的喷射器5向直线部11喷射尿素水溶液。混合管6以覆盖尿素水溶液的周围的方式配置从注射器5喷射的溶液在肘部10内部，并且在外周面上具有多个开口6a。在混合管6的下游侧配置有自身与混合管6的出口部分之间的空间以及其自身与直线部分11的内壁之间的空间的内管7能够使排气气体通过其内部和外周部分循环。

3. 发明专利

JP2013133775A Reducing agent aqueous solution mixing device and exhaust gas post-treatment device 有权
标题翻译：还原剂水溶液混合装置和排气后处理装置
公开(公告)号：JP2013133775A
公开(公告)日：2013-07-08
申请号：JP2011285451
申请日：2011-12-27
申请人： Komatsu Ltd , 株式会社小松製作所
发明人： IIJIMA TADASHI , KIZAWA HIROSHI , ITO BOKU , TSUJIMURA SHINJI , KATO TAKASHI , ORITA TETSUO , NAMIMATSU HIROTO , HARA KAZUO , TOMIOKA HIROYUKI
IPC分类号： F01N3/24 , B01D53/94 , F01N3/08 , F01N3/28
CPC分类号： F01N3/2892 , F01N3/035 , F01N3/2066 , F01N3/24 , F01N13/08 , F01N2240/20 , F01N2470/02 , F01N2610/02 , F01N2610/1453 , Y02T10/24
摘要： PROBLEM TO BE SOLVED: To efficiently guide a urea aqueous solution to an inner pipe in a urea aqueous solution mixing device using an injector for directly jetting only the urea aqueous solution into an exhaust pipe.SOLUTION: This device includes the exhaust pipe 4B, the injector 5, an inner pipe 7, and a mixing pipe 6. The exhaust pipe 4B comprises an elbow portion 10 which has a curved portion, and a straight portion 11 which is provided on the downstream side of the elbow portion 10. The injector 5, which is provided outside the curved portion of the elbow portion 10, jets only the urea aqueous solution into the elbow portion 10 toward the straight portion 11. The inner pipe 7 is arranged on the exhaust flow downstream side of the injector 5 in the exhaust pipe 4 in such a manner that an inlet portion opening faces the injector 5 and that a space is provided between an outer peripheral surface and an inner wall of the straight portion 11, and exhaust gas can be circulated through the inside and the outer peripheral portion. The mixing pipe 6 guides the urea aqueous solution, which is jetted from the injector 5, to the inner pipe 7.
摘要翻译：要解决的问题：为了在尿素水溶液混合装置中有效地将尿素水溶液引导到使用喷射器的尿素水溶液直接喷射到排气管中。溶液：该装置包括排气管4B，喷射器5，内管7和混合管6.排气管4B包括具有弯曲部分的弯头部分10和设置在肘部10的下游侧的直线部分11.喷射器5 设置在弯头部10的弯曲部的外侧，仅将尿素水溶液喷射到弯头部10而朝向直线部11。内管7配置在排气口的喷射器5的排气下游侧管道4以使得入口部分开口面向喷射器5并且在直线部分11的外周表面和内壁之间设置空间，并且废气可以循环通过 e和外周部分。混合管6将从喷射器5喷出的尿素水溶液引导到内管7。

4. 发明专利

JP2013133773A Reducing agent aqueous solution mixing device and exhaust gas post-treatment device 有权
标题翻译：还原剂水溶液混合装置和排气后处理装置
公开(公告)号：JP2013133773A
公开(公告)日：2013-07-08
申请号：JP2011285449
申请日：2011-12-27
申请人： Komatsu Ltd , 株式会社小松製作所
发明人： IIJIMA TADASHI , KIZAWA HIROSHI , ITO BOKU , TSUJIMURA SHINJI , KATO TAKASHI , ORITA TETSUO , NAMIMATSU HIROTO , HARA KAZUO , TOMIOKA HIROYUKI
IPC分类号： F01N3/24 , B01D53/94 , F01N3/08 , F01N3/28
CPC分类号： F01N3/2066 , B01D53/90 , B01D53/9409 , B01D2251/2067 , F01N3/2892 , F01N2240/20 , F01N2470/02 , F01N2610/02 , F01N2610/1453 , Y02T10/24
摘要： PROBLEM TO BE SOLVED: To provide a urea aqueous solution mixing device in which flow path resistance in an exhaust pipe is reduced by restraining a urea aqueous solution from adhering to an inner wall of the exhaust pipe.SOLUTION: The urea aqueous solution mixing device includes the exhaust pipe 4B, an injector 5, a mixing pipe 6, an inner pipe 7, and a circulation portion 20. The exhaust pipe 4B comprises an elbow portion 10 having a curved portion, and a straight portion 11. The injector 5, which is provided in the elbow portion 10, emits a jet of urea aqueous solution. The mixing pipe 6 comprises an outlet portion which is arranged in such a manner as to cover the periphery of the urea aqueous solution jetted from the injector 5 and which is formed with a space between itself and the inner wall of the exhaust pipe 4B, and a plurality of openings 6a which are formed on an outer peripheral surface. The inner pipe 7, which is arranged in the straight portion 11 of the exhaust pipe 4B, enables exhaust gas to be circulated through its inside and outer peripheral portion. The circulation portion 20, which is formed between the outlet portion of the mixing pipe 6 and the inner wall of the exhaust pipe 4B, guides the exhaust gas to the inner pipe 7.
摘要翻译：要解决的问题：提供一种尿素水溶液混合装置，其中通过抑制尿素水溶液粘附到排气管的内壁来降低排气管中的流路阻力。溶液：尿素水溶液混合装置包括排气管4B，喷射器5，混合管6，内管7和循环部20.排气管4B包括具有弯曲部分的弯头部分10和直线部分11.喷射器5 设置在肘部10中，发射尿素水溶液的射流。混合管6包括出口部分，其布置成覆盖从喷射器5喷射的尿素水溶液的周边，并且在其自身与排气管4B的内壁之间形成有空间，以及形成在外周面上的多个开口部6a。布置在排气管4B的直线部分11中的内管7能够使废气通过其内周和外周部分循环。形成在混合管6的出口部与排气管4B的内壁之间的循环部20将废气引导到内管7。

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