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    • 1. 发明授权
    • Production method of and production apparatus for optical recording disc
    • 光记录盘的制造方法和制造装置
    • US06702920B2
    • 2004-03-09
    • US09997747
    • 2001-11-30
    • Kokichi KohinataShoji AkiyamaYoshinori ItabaTokuhiro Morioka
    • Kokichi KohinataShoji AkiyamaYoshinori ItabaTokuhiro Morioka
    • G11B726
    • B29C65/1483B29C65/1406B29C65/1435B29C65/4845B29C65/521B29C65/78B29C65/7847B29C66/1122B29C66/452B29C66/71B29C66/8322B29D17/005B29L2017/005B32B37/1284B32B2038/0076B32B2310/0831B32B2429/02G11B7/26B29K2069/00
    • This invention relates to how to obtain an optical recording disc with a good quality, capable of achieving a beautiful outline shape of the inner peripheral part side rim part of the cured ultraviolet ray curing type resin substantially concentrically even in the case there is irregularity of the wettability of both round substrates with respect to the ultraviolet ray curing type resin, and capable of providing an even film thickness of the resin with the film thickness controlled to a predetermined value or less even in the case there are irregularity of the wettability of both round substrates, difficulty in controlling the centrifugal force applied on the resin, irregularity of the plate thickness of both round substrates, or the like. Either one of both substrates is rotated at a low speed with the other one fixed while pressuring between both substrates of an optical recording disc comprising both substrates temporarily bonded via a ring-like ultraviolet ray curing type resin disposed substantially concentrically with the substrates for forming a layer with a predetermined even thickness by the spread, the optical recording disc temporarily bonded having the layer-like resin is rotated at a high speed, and an ultraviolet ray is irradiated to the optical recording disc temporarily bonded and rotated at the high speed for curing the layer-like resin.
    • 本发明涉及如何获得具有良好质量的光学记录盘,能够实现同时固化的紫外线固化型树脂的内周部边缘部分的美观轮廓形状,即使在不规则的情况下 两种圆形基材相对于紫外线固化型树脂的润湿性,即使在两面的润湿性不均匀的情况下,也能够使膜厚控制在规定值以下的树脂的均匀膜厚 基板,难以控制施加在树脂上的离心力,两个圆形基板的板厚度不规则等。两个基板之一都以低速旋转,另一个基板在两个基板之间压力固定的同时固定 光学记录盘,其包括通过环状紫外线固化型树脂disp临时粘合的两个基板 与用于通过扩展形成具有预定均匀厚度的层的基板基本上同心地旋转,具有层状树脂的临时粘合的光学记录盘以高速旋转,并且将紫外线暂时照射到光学记录盘 粘合并高速旋转以固化层状树脂。
    • 3. 发明授权
    • Production method of and production apparatus for optical recording disc
    • 光记录盘的制造方法和制造装置
    • US06478908B1
    • 2002-11-12
    • US09704812
    • 2000-11-02
    • Kokichi KohinataShoji AkiyamaYoshinori ItabaTokuhiro Morioka
    • Kokichi KohinataShoji AkiyamaYoshinori ItabaTokuhiro Morioka
    • G11B726
    • B29C65/1483B29C65/1406B29C65/1435B29C65/4845B29C65/521B29C65/78B29C65/7847B29C66/1122B29C66/452B29C66/71B29C66/8322B29D17/005B29L2017/005B32B37/1284B32B2038/0076B32B2310/0831B32B2429/02G11B7/26B29K2069/00
    • This invention relates to how to obtain an optical recording disc with a good quality, capable of achieving a beautiful outline shape of the inner peripheral part side rim part of the cured ultraviolet ray curing type resin substantially concentrically even in the case there is irregularity of the wettability of both round substrates with respect to the ultraviolet ray curing type resin, and capable of providing an even film thickness of the resin with the film thickness controlled to a predetermined value or less even in the case there are irregularity of the wettability of both round substrates, difficulty in controlling the centrifugal force applied on the resin, irregularity of the plate thickness of both round substrates, or the like. Either one of both substrates is rotated at a low speed with the other one fixed while pressuring between both substrates of an optical recording disc comprising both substrates temporarily bonded via a ring-like ultraviolet ray curing type resin disposed substantially concentrically with the substrates for forming a layer with a predetermined even thickness by the spread, the optical recording disc temporarily bonded having the layer-like resin is rotated at a high speed, and an ultraviolet ray is irradiated to the optical recording disc temporarily bonded and rotated at the high speed for curing the layer-like resin.
    • 本发明涉及如何获得具有良好质量的光学记录盘,能够实现同时固化的紫外线固化型树脂的内周部边缘部分的美观轮廓形状,即使在不规则的情况下 两种圆形基材相对于紫外线固化型树脂的润湿性,即使在两面的润湿性不均匀的情况下,也能够使膜厚控制在规定值以下的树脂的均匀膜厚 基板,难以控制施加在树脂上的离心力,两个圆形基板的板厚度不规则等。两个基板之一都以低速旋转,另一个基板在两个基板之间压力固定的同时固定 光学记录盘,其包括通过环状紫外线固化型树脂disp临时粘合的两个基板 与用于通过扩展形成具有预定均匀厚度的层的基板基本上同心地旋转,具有层状树脂的临时粘合的光学记录盘以高速旋转,并且将紫外线暂时照射到光学记录盘 粘合并高速旋转以固化层状树脂。
    • 5. 发明申请
    • METHOD FOR MANUFACTURING COMPOSITE WAFERS
    • 制造复合波导的方法
    • US20140308800A1
    • 2014-10-16
    • US14343515
    • 2012-09-14
    • Shoji AkiyamaKazutoshi Nagata
    • Shoji AkiyamaKazutoshi Nagata
    • H01L21/762
    • H01L21/76254H01L21/02002H01L21/2007H01L21/2011H01L21/76243H01L21/76251
    • This invention provides a method for manufacturing composite wafers in which at least two composite wafers can be obtained from one donor wafer, and in which the chamfering step can be omitted. Provided is a method for manufacturing composite wafers comprising: bonding surfaces of at least two handle wafers and a surface of a donor wafer which has a diameter greater than or equal to a sum of diameters of the at least two handle wafers and which has a hydrogen ion implantation layer formed inside thereof by implanting hydrogen ions from the surface of the donor wafer, to obtain a bonded wafer; heating the bonded wafer at 200° C. to 400° C.; and detaching a film from the donor wafer along the hydrogen ion implantation layer of the heated bonded wafer, to obtain the composite wafers having the film transferred onto the at least two handle wafers.
    • 本发明提供一种制造复合晶片的方法,其中可以从一个施主晶片获得至少两个复合晶片,并且其中可以省略倒角步骤。 提供了一种用于制造复合晶片的方法,包括:将至少两个手柄晶片的接合表面和施主晶片的表面直接大于或等于至少两个手柄晶片的直径之和,并且具有氢 通过从施主晶片的表面注入氢离子形成在其内部的离子注入层,以获得接合晶片; 将粘合晶片在200℃加热至400℃; 以及沿加热的接合晶片的氢离子注入层从施主晶片分离膜,以获得具有转移到至少两个处理晶片上的膜的复合晶片。
    • 8. 发明授权
    • Method for manufacturing SOI wafer
    • 制造SOI晶圆的方法
    • US08268700B2
    • 2012-09-18
    • US12153160
    • 2008-05-14
    • Shoji AkiyamaYoshihiro KubotaAtsuo ItoKoichi TanakaMakoto KawaiYuuji Tobisaka
    • Shoji AkiyamaYoshihiro KubotaAtsuo ItoKoichi TanakaMakoto KawaiYuuji Tobisaka
    • H01L21/30
    • H01L21/76254
    • There is disclosed a method for manufacturing an SOI wafer comprising at least: implanting a hydrogen ion, a rare gas ion, or both the ions into a donor wafer formed of a silicon wafer or a silicon wafer having an oxide film formed on a surface thereof from a surface of the donor wafer, thereby forming an ion implanted layer; performing a plasma activation treatment with respect to at least one of an ion implanted surface of the donor wafer and a surface of a handle wafer, the surface of the handle wafer is to be bonded to the ion implanted surface; closely bonding these surfaces to each other; mechanically delaminating the donor wafer at the ion implanted layer as a boundary and thereby reducing a film thickness thereof to provide an SOI layer, and performing a heat treatment at 600 to 1000° C.; and polishing a surface of the SOI layer for 10 to 50 nm based on chemical mechanical polishing.A method for manufacturing with excellent productivity an SOI wafer having an SOI layer with a mirror-finished surface and high film thickness uniformity can be provided.
    • 公开了一种制造SOI晶片的方法,该方法至少包括:将氢离子,稀有气体离子或两者离子注入到由硅晶片或具有在其表面上形成的氧化膜的硅晶片形成的施主晶片中 从施主晶片的表面,从而形成离子注入层; 对施主晶片的离子注入表面和处理晶片的表面中的至少一个进行等离子体激活处理,把手晶片的表面与离子注入表面结合; 将这些表面彼此紧密结合; 以离子注入层的施主晶片作为边界进行机械分层,由此降低其膜厚以提供SOI层,并在600〜1000℃下进行热处理。 并且基于化学机械抛光将SOI层的表面抛光10至50nm。 可以提供具有优异的生产率的具有SOI层的具有镜面精加工表面和高膜厚均匀性的SOI晶片的方法。