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    • 1. 发明授权
    • Radiation detector
    • 辐射检测器
    • US07233003B2
    • 2007-06-19
    • US10942846
    • 2004-09-17
    • Koji WatadaniKenji SatoYoichiro ShimuraHideo Tsuruta
    • Koji WatadaniKenji SatoYoichiro ShimuraHideo Tsuruta
    • G01T1/00
    • H01L27/14676
    • The radiation detector according to this invention has a common electrode for bias voltage application formed on a surface of an amorphous selenium semiconductor film (a-Se semiconductor film) sensitive to radiation. The common electrode is a gold thin film having a thickness in a range of 100 to 1,000 Å. The gold thin film acting as the common electrode may be formed on the surface of the a-Se semiconductor film at a relatively low vapor deposition temperature and in a reduced vapor deposition time. This feature suppresses a generation of defects in the a-Se semiconductor film due to formation of the common electrode. The gold thin film for the common electrode is not so thick as in the prior art, but is 1,000 Å or less. With the reduced thickness, the common electrode has improved boding property with respect to the a-Se semiconductor film.
    • 根据本发明的辐射检测器具有在对辐射敏感的非晶硒半导体膜(a-Se半导体膜)的表面上形成用于偏置电压的公共电极。 公共电极是厚度在100至1000埃范围内的金薄膜。 作为公共电极的金薄膜可以在相对低的气相沉积温度和减少的蒸镀时间形成在a-Se半导体膜的表面上。 该特征抑制由于共用电极的形成而导致的a-Se半导体膜的缺陷的产生。 用于公共电极的金薄膜不像现有技术那样厚,但为1000或更小。 随着厚度减小,公共电极相对于a-Se半导体膜具有改善的粘合性能。
    • 2. 发明申请
    • Radiation detector
    • 辐射检测器
    • US20050061987A1
    • 2005-03-24
    • US10942846
    • 2004-09-17
    • Koji WatadaniKenji SatoYoichiro ShimuraHideo Tsuruta
    • Koji WatadaniKenji SatoYoichiro ShimuraHideo Tsuruta
    • G01T1/24A61B6/00G01J1/02H01L27/14H01L27/146H01L31/0224H01L31/08H01L31/09H01L31/115
    • H01L27/14676
    • The radiation detector according to this invention has a common electrode for bias voltage application formed on a surface of an amorphous selenium semiconductor film (a-Se semiconductor film) sensitive to radiation. The common electrode is a gold thin film having a thickness in a range of 100 to 1,000 Å. The gold thin film acting as the common electrode may be formed on the surface of the a-Se semiconductor film at a relatively low vapor deposition temperature and in a reduced vapor deposition time. This feature suppresses a generation of defects in the a-Se semiconductor film due to formation of the common electrode. The gold thin film for the common electrode is not so thick as in the prior art, but is 1,000 Å or less. With the reduced thickness, the common electrode has improved boding property with respect to the a-Se semiconductor film.
    • 根据本发明的辐射检测器具有在对辐射敏感的非晶硒半导体膜(a-Se半导体膜)的表面上形成用于偏置电压的公共电极。 公共电极是厚度在100至1000埃范围内的金薄膜。 作为公共电极的金薄膜可以在相对低的气相沉积温度和减少的蒸镀时间形成在a-Se半导体膜的表面上。 该特征抑制由于共用电极的形成而导致的a-Se半导体膜的缺陷的产生。 用于公共电极的金薄膜不像现有技术那样厚,但为1000或更小。 随着厚度减小,公共电极相对于a-Se半导体膜具有改善的粘合性能。