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1. 发明授权

US06640696B2 Device and method for continuous high-pressure treatment 失效
标题翻译：连续高压处理装置及方法
公开(公告)号：US06640696B2
公开(公告)日：2003-11-04
申请号：US10203413
申请日：2002-08-09
申请人： Koji Shinobudani , Tetsuo Shinomiya , Mitsuo Nagai , Nobuhiro Haramoto , Hiroshi Miyahara , Toshiyuki Ninomiya , Yasuharu Nosho , Shinichi Hashimoto , Masakazu Kato , Kazuhiro Ueshima
发明人： Koji Shinobudani , Tetsuo Shinomiya , Mitsuo Nagai , Nobuhiro Haramoto , Hiroshi Miyahara , Toshiyuki Ninomiya , Yasuharu Nosho , Shinichi Hashimoto , Masakazu Kato , Kazuhiro Ueshima
IPC分类号： A23L100
CPC分类号： B01J3/00 , A23L3/0155 , B01J3/02 , B01J2219/00033 , G05D16/2066 , G05D16/2073
摘要： A device and a method for continuous high-pressure treatment; the method, comprising the steps of increasing the pressure of raw materials (25) in a feed tank (9) by a pressurizing pump (1) so as to continuously feed the raw material to treatment containers (6) and (6a) and increasing the flow rate of the pressurizing pump (1) over that of a depressurizing pump (2) or continuously exhausting the raw material from the treatment containers (6) and (6a) through a pressure regulating flow path resistance (59) while depressurizing; the device, comprising pressure releasing bypass circuits (55) disposed in the flow path resistance (59) in parallel with each other, wherein the insides of the treatment containers (6) and (6a) are kept in a specified high-pressure state during the continuous processing.
摘要翻译：连续高压处理的装置和方法; 该方法包括以下步骤：通过加压泵（1）增加进料罐（9）中的原料（25）的压力，以便将原料连续地供给到处理容器（6）和（6a）中，并且增加加压泵（1）的流量超过减压泵（2）的流量，或者在减压的同时通过压力调节流路阻力（59）连续排出来自处理容器（6）和（6a）的原料; 所述装置包括彼此平行地设置在流路阻力（59）中的压力释放旁路回路（55），其中处理容器（6）和（6a）的内部保持在规定的高压状态连续加工。

2. 发明授权

US5996390A Method for manufacturing vacuum chamber 失效
标题翻译：真空室制造方法
公开(公告)号：US5996390A
公开(公告)日：1999-12-07
申请号：US105149
申请日：1998-06-26
申请人： Hiroshi Tsujikawa , Koji Shinobudani , Yosiki Ogata , Takashi Iwamoto , Shinichi Ono , Hideo Iwasawa
发明人： Hiroshi Tsujikawa , Koji Shinobudani , Yosiki Ogata , Takashi Iwamoto , Shinichi Ono , Hideo Iwasawa
IPC分类号： B21J5/00 , B01J3/00 , B21J5/02 , B21K21/02 , C23C14/00 , H01L21/00 , H01L21/205 , B21D28/32 , B21D51/18
CPC分类号： H01L21/67011
摘要： In accordance with the present invention, the method of manufacturing a vacuum chamber which is used as a cluster tool, a vacuum film-forming apparatus, or the like of a manufacturing apparatus used for semiconductors, liquid crystals, solar cells, and the like, and which is formed by a vessel in which an opening (4A) is provided at one surface for forming a cover, and a hole (4) smaller than the opening (4A) is provided in an opposite surface to the opening (4A), includes the steps of:by using a forging press which is provided with an outer die (3) and an inner die (2) for die forging a material (1-1),cutting the material to dimensions suitable for the die forging of the material (1-1) which is made of a metal;heating the material (1-1) to a temperature for die forging;placing the heated material (1-1) in the outer die (3) of the press, and pressing the inner die (2) against the material (1-1) by the forging press to effect forging; andsubjecting the forged material to machining into a predetermined configuration.
摘要翻译：根据本发明，制造用于半导体，液晶，太阳能电池等的制造装置的用作簇工具的真空室，真空成膜装置等的制造方法，并且由形成盖的一个表面上设置有开口（4A）的容器形成，并且在与开口（4A）相反的表面上设置有小于开口（4A）的孔（4）包括以下步骤：通过使用设置有用于模锻材料（1-1）的模具（2）的外模（3）和内模（2）的锻造压力机，将材料切割成适合于模具锻造的尺寸材料（1-1），由金属制成; 将材料（1-1）加热至模锻温度; 将加热的材料（1-1）放置在压模的外模（3）中，并通过锻压机将内模（2）压靠在材料（1-1）上以进行锻造; 并将锻造的材料加工成预定的构造。

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