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1. 发明授权

US06838016B2 Polishing composition and polishing method employing it 失效
标题翻译：抛光组合物和抛光方法
公开(公告)号：US06838016B2
公开(公告)日：2005-01-04
申请号：US09985490
申请日：2001-11-05
申请人： Kenji Sakai , Hiroshi Asano , Tadahiro Kitamura , Koji Ohno , Katsuyoshi Ina
发明人： Kenji Sakai , Hiroshi Asano , Tadahiro Kitamura , Koji Ohno , Katsuyoshi Ina
IPC分类号： B24B37/00 , C09G1/02 , C09K3/14 , H01L21/304 , H01L21/321 , H01L21/768 , C09K13/00 , C09K13/06 , H01L21/302
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463 , H01L21/7684
摘要： A polishing composition comprising the following components (a) to (g): (a) an abrasive which is at least one member selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide and titanium oxide, (b) a polyalkyleneimine, (c) at least one member selected from the group consisting of guinaldic acid and its derivatives, (d) at least one member selected from the group consisting of glycine, α-alanine, histidine and their derivatives, (e) at least one member selected from the group consisting of benzotriazole and its derivatives, (f) hydrogen peroxide, and (g) water.
摘要翻译：一种抛光组合物，其包含以下组分（a）至（g）：（a）至少一种选自二氧化硅，氧化铝，氧化铈，氧化锆和氧化钛的组分的研磨剂，（b）聚亚烷基亚胺，（c）选自桂皮酸及其衍生物的至少一种，（d）选自甘氨酸，α-丙氨酸，组氨酸及其衍生物中的至少一种，（e）选自苯并三唑及其衍生物的组中的至少一种，（f）过氧化氢和（g）水。

2. 发明授权

US06814766B2 Polishing composition and polishing method employing it 有权
标题翻译：抛光组合物和抛光方法
公开(公告)号：US06814766B2
公开(公告)日：2004-11-09
申请号：US10214176
申请日：2002-08-08
申请人： Koji Ohno , Kenji Sakai , Katsuyoshi Ina
发明人： Koji Ohno , Kenji Sakai , Katsuyoshi Ina
IPC分类号： C09G102
CPC分类号： H01L21/31053 , C09G1/02 , C23F3/06 , H01L21/3212
摘要： A polishing composition for polishing a semiconductor device having at least a tungsten film and an insulating film, which comprises the following components (a) to (d): (a) silicon dioxide, (b) periodic acid, (c) at least one pH controlling agent selected from the group consisting of ammonia, potassium hydroxide, sodium hydroxide, ammonium periodate, potassium periodate and sodium periodate, and (d) water.
摘要翻译：一种用于研磨至少具有钨膜和绝缘膜的半导体器件的抛光组合物，其包含以下组分（a）至（d）：（a）二氧化硅，（b）高碘酸，（c）至少一种选自氨，氢氧化钾，氢氧化钠，高碘酸铵，高碘酸钾和高碘酸钠的pH控制剂，和（d）水。

3. 发明授权

US07189684B2 Polishing composition and method for forming wiring structure using the same 有权
标题翻译：抛光组合物及其形成方法
公开(公告)号：US07189684B2
公开(公告)日：2007-03-13
申请号：US10476717
申请日：2003-03-04
申请人： Koji Ohno , Chiyo Horikawa , Kenji Sakai , Kazusei Tamai , Katsuyoshi Ina
发明人： Koji Ohno , Chiyo Horikawa , Kenji Sakai , Kazusei Tamai , Katsuyoshi Ina
IPC分类号： C09K13/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463
摘要： A polishing composition capable of satisfactorily polishing a semiconductor. The first polishing composition of the present invention includes silicon dioxide, at least one component selected from periodic acids and salts thereof, at least one component selected from tetraalkyl ammonium hydroxides and tetraalkyl ammonium chlorides, hydrochloric acid, and water, and contains substantially no iron. The second polishing composition of the present invention includes a predetermined amount of fumed silica, a predetermined amount of at least one component selected from periodic acids and salts thereof, a tetraalkyl ammonium salt represented by the following general formula (1), at least one component selected from ethylene glycol and propylene glycol, and water. The pH of the second polishing composition is greater than or equal to 1.8 and is less than 4.0.
摘要翻译：能够令人满意地研磨半导体的抛光组合物。本发明的第一种抛光组合物包括二氧化硅，选自周期酸及其盐中的至少一种组分，至少一种选自四烷基氢氧化铵和四烷基氯化铵的组分，盐酸和水，并且基本上不含铁。本发明的第二抛光组合物包含预定量的热解法二氧化硅，预定量的选自周期酸及其盐中的至少一种组分，由以下通式（1）表示的四烷基铵盐，至少一种组分选自乙二醇和丙二醇，和水。第二抛光组合物的pH值大于或等于1.8，小于4.0。

4. 发明授权

US06849099B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US06849099B2
公开(公告)日：2005-02-01
申请号：US10674318
申请日：2003-09-30
申请人： Koji Ohno , Chiyo Horikawa , Kenji Sakai , Katsuyoshi Ina
发明人： Koji Ohno , Chiyo Horikawa , Kenji Sakai , Katsuyoshi Ina
IPC分类号： B24B37/00 , C09C1/68 , C09G1/02 , C09K3/14 , H01L21/304 , H01L21/3105 , H01L21/321 , C09G1/04
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/31053 , H01L21/3212
摘要： There is provided a polishing composition that reduces erosion and is used in a final polishing step of a semiconductor device manufacturing process. The polishing composition contains colloidal silica, a periodic acid compound, ammonia, ammonium nitrate and water and its pH is 1.8 to 4.0.
摘要翻译：提供了减少腐蚀并用于半导体器件制造工艺的最终抛光步骤中的抛光组合物。抛光组合物含有胶体二氧化硅，高碘酸化合物，氨，硝酸铵和水，其pH为1.8〜4.0。

5. 发明授权

US07522166B2 Video game processing method, video game processing apparatus and computer readable recording medium storing video game program 有权
标题翻译：视频游戏处理方法，视频游戏处理装置和存储视频游戏程序的计算机可读记录介质
公开(公告)号：US07522166B2
公开(公告)日：2009-04-21
申请号：US10306158
申请日：2002-11-29
申请人： Koji Ohno
发明人： Koji Ohno
IPC分类号： G06T15/40 , G06T15/00
CPC分类号： A63F13/52 , A63F13/10 , G06T13/40
摘要： A simple model for an object to be processed is obtained, and Z-values and display coordinates of vertexes of the simple model from a predetermined viewpoint are calculated. A rectangular Z-area associated with the calculated display coordinates is detected, and an area of a predetermined size is generated based upon the detected Z-area while keeping a feature of the detected Z-area. A minimum value Z1MIN of the simple model is extracted. The minimum value Z1MIN of the simple model is compared with all of the Z-values within the generated area, which are stored in a Z-buffer at that time. If it is determined that the minimum value Z1MIN of the simple model is larger than the maximum value Z2MAX within the generated area, subsequent steps are skipped. Thus, processing of a real model can be avoided, which reduces the processing.
摘要翻译：获得待处理对象的简单模型，并计算出从预定视点的简单模型的顶点的Z值和显示坐标。检测与所计算的显示坐标相关联的矩形Z区域，并且基于检测到的Z区域生成预定大小的区域，同时保持检测到的Z区域的特征。提取简单模型的最小值Z1MIN。将简单模型的最小值Z1MIN与存储在该时间的Z缓冲器中的生成区域内的所有Z值进行比较。如果确定简单模型的最小值Z1MIN大于生成区域内的最大值Z2MAX，则跳过后续步骤。因此，可以避免真实模型的处理，这减少了处理。

6. 发明授权

US07095780B2 Base station apparatus of mobile communication system 有权
标题翻译：移动通信系统基站装置
公开(公告)号：US07095780B2
公开(公告)日：2006-08-22
申请号：US10673685
申请日：2003-09-29
申请人： Takehiro Nakamura , Junichiro Hagiwara , Etsuhiro Nakano , Koji Ohno , Seizo Onoe , Akihiro Higashi , Motoshi Tamura , Masatomo Nakano , Hiroshi Kawakami , Hiroki Morikawa
发明人： Takehiro Nakamura , Junichiro Hagiwara , Etsuhiro Nakano , Koji Ohno , Seizo Onoe , Akihiro Higashi , Motoshi Tamura , Masatomo Nakano , Hiroshi Kawakami , Hiroki Morikawa
IPC分类号： H04B1/707 , H04Q7/20
CPC分类号： H04W88/08 , H04B7/2618 , H04B7/2628 , H04B2201/70701 , H04B2201/70703 , H04J13/00 , H04J13/0022 , H04J13/0029 , H04J13/0077 , H04J13/10 , H04J13/16 , H04W52/08 , H04W52/12 , H04W52/16 , H04W52/24 , H04W52/241 , H04W52/248 , H04W52/322 , H04W52/325 , H04W52/40 , H04W52/50 , H04W52/56 , H04W52/60 , H04W92/10 , H04W92/12
摘要： A base station including a transmitting and receiving amplifier for amplifying CDMA signals exchanged with a mobile station; a radio stage connected to the transmitting and receiving amplifier for carrying out D/A conversion of a transmitted signal that undergoes baseband spreading, followed by quadrature modulation, and for carrying out quasi-coherent detection of a received signal, followed by A/D conversion; a baseband signal processor connected with the radio stage for carrying out baseband signal processing of the transmitted signal and the received signal; a transmission interface connected with the baseband signal processor for implementing interface with external channels; and a base station controller for carrying out control such as management of radio channels and establishment and release of the radio channels. The base station communicates with the external channels by mapping logical channels into physical channels. The CDMA signals are spread using a short code and a long code.
摘要翻译：一种基站，包括用于放大与移动台交换的CDMA信号的发射和接收放大器; 连接到发射和接收放大器的无线电台，用于对经历基带扩频的发送信号进行D / A转换，随后进行正交调制，并进行接收信号的准相干检测，然后进行A / D转换 ; 与无线电台连接的基带信号处理器，用于对发射信号和接收信号进行基带信号处理; 与基带信号处理器连接的传输接口，用于实现与外部信道的接口; 以及用于执行无线电信道的管理和无线电信道的建立和释放的控制的基站控制器。基站通过将逻辑信道映射到物理信道中与外部信道进行通信。 CDMA信号使用短码和长码进行传播。

7. 发明申请

US20060111572A1 Ligands and complex compounds containing the same 失效
标题翻译：配体和含有相同的配合物
公开(公告)号：US20060111572A1
公开(公告)日：2006-05-25
申请号：US10542659
申请日：2004-02-04
申请人： Kazushi Mashima , Koji Ohno , Kazuhiko Matsumura
发明人： Kazushi Mashima , Koji Ohno , Kazuhiko Matsumura
IPC分类号： C07F15/00
CPC分类号： B01J31/182 , B01J31/1805 , B01J31/2243 , B01J2231/641 , B01J2531/0244 , B01J2531/0258 , B01J2531/0288 , B01J2531/16 , B01J2531/17 , B01J2531/18 , B01J2531/26 , B01J2531/31 , B01J2531/37 , B01J2531/38 , B01J2531/42 , B01J2531/46 , B01J2531/48 , B01J2531/56 , B01J2531/74 , B01J2531/821 , B01J2531/822 , B01J2531/824 , B01J2531/827 , B01J2531/828 , B01J2531/842 , B01J2531/845 , B01J2531/847 , C07C215/50 , C07F5/003
摘要： A ligand represented by the formula (1): R1R2N-Q1-X-Q2-NR3R4 (1) wherein R1, R2, R3 and R4 are each the same or different and represent a group represented by the formula (2): wherein Q3 is an optionally substituted alkylene group, an optionally substituted cycloalkylene group, an optionally substituted arylene group, or an optionally substituted divalent heterocyclic group, R5 is an optionally substituted alkyl group, an optionally substituted aryl group or an optionally substituted heterocyclic group and R6 is a substituent which may coordinate or bind to a metal atom, or R5 and R6, taken together, may form a ring, Q1 and Q2 are each the same or different and represent an optionally substituted alkylene group or a single bond, and X is a divalent spacer.
摘要翻译：由式（1）表示的配体：<？in-line-formula description =“In-line Formulas”end =“lead”？> R＆lt; 2＆lt; 2＆gt; NQ “在线公式”end =“tail”？>其中R 1，R 2，R 3和R 4， / SUP>各自相同或不同，表示由式（2）表示的基团：其中Q 3是任选取代的亚烷基，任选取代的亚环烷基，任选取代的亚芳基，或任选取代的二价杂环基，R 5是任选取代的烷基，任选取代的芳基或任选取代的杂环基，R 6是取代基，其可以是配位或结合金属原子，或R 5和R 6组合在一起可形成环，Q 1和Q 2 > 2 各自相同或不同，表示optio 正构取代的亚烷基或单键，X是二价间隔基。

8. 发明授权

US5692015A Coherent detector and a coherent detection method for a digital communication receiver 失效
标题翻译：相干检测器和数字通信接收机的相干检测方法
公开(公告)号：US5692015A
公开(公告)日：1997-11-25
申请号：US553464
申请日：1995-11-28
申请人： Akihiro Higashi , Fumiyuki Adachi , Koji Ohno , Mamoru Sawahashi
发明人： Akihiro Higashi , Fumiyuki Adachi , Koji Ohno , Mamoru Sawahashi
IPC分类号： H04L7/08 , H04L25/02 , H03D1/00 , H04L27/06
CPC分类号： H04L25/0236 , H04L25/0212 , H04L25/0232 , H04L7/08
摘要： A coherent detection method including a step of estimating a transfer function of a propagation path using pseudo-pilot signals which consist of some information symbols adjacent to pilot signals. The information symbols in the pseudo-pilot signals are assumed to be known. The method includes the steps of estimating the transfer functions using the pilot signals, carrying out interpolation coherent detection of the information symbols using the estimated transfer functions, storing the detection results as the pseudo-pilot signals, reestimating the transfer functions associated with the information symbols corresponding to the pseudo-pilot signals by using the pseudo-pilot signals and the corresponding received signal under the assumption that the pseudo-pilot signals have a known correct pattern, and carrying out the interpolation coherent detection of the individual information symbols by using the transfer functions obtained by the reestimation. This makes it possible to estimate the transfer function at high accuracy with a small number of symbols per pilot signal, thereby improving the detection characteristics.
摘要翻译： PCT No.PCT / JP95 / 01229 Sec。 371日期：1995年11月28日 102（e）1995年11月28日日期PCT 1995年6月21日PCT PCT。公开号WO95 / 35615 日期1995年12月28日一种相干检测方法，包括使用由与导频信号相邻的一些信息符号组成的伪导频信号来估计传播路径的传递函数的步骤。伪导频信号中的信息符号被认为是已知的。该方法包括以下步骤：使用导频信号估计传递函数，使用估计的传递函数执行信息符号的内插相关检测，将检测结果存储为伪导频信号，重新估计与信息符号相关联的传递函数在伪导频信号具有已知正确模式的假设下，通过使用伪导频信号和相应的接收信号对应于伪导频信号，并且通过使用传输来执行个体信息符号的内插相关检测通过重新获得的功能。这使得可以以每个导频信号的少量符号高精度地估计传递函数，从而提高检测特性。

9. 发明授权

US4550030A Method for strengthening dental restorative material 失效
标题翻译：加强牙科修复材料的方法
公开(公告)号：US4550030A
公开(公告)日：1985-10-29
申请号：US650544
申请日：1984-09-14
申请人： Nobukazu Ohi , Koji Ohno , Hiroshi Kamohara
发明人： Nobukazu Ohi , Koji Ohno , Hiroshi Kamohara
IPC分类号： A61C5/10 , A61C5/08 , A61C13/083 , A61K6/06 , A01N1/02 , C09K3/00
CPC分类号： A61K6/0017 , A61K6/026 , A61K6/04
摘要： A method for strengthening dental restorative material is disclosed, which comprises depositing one or more inorganic salts of metals selected from rubidium, cesium, and potassium on the surface of a coated material of a dental restorative material obtained by coating and firing a dental porcelain fused to metal material. The dental restorative material is containing leucite and sodium on the surface of a dental alloy substrate, and heat treating the coated material at temperatures of 380.degree. C. or higher but lower than the melting point of the inorganic salt and the strain temperature of the coated material. According to the method of this invention, the coated material can be strengthened with ease while maintaining its translucency and color tone, without using any special device.
摘要翻译：公开了一种用于加强牙科修复材料的方法，其包括将选自铷，铯和钾的金属的一种或多种无机盐沉积在通过涂覆和烧制融合的牙瓷所获得的牙科修复材料的涂覆材料的表面上金属材料。牙科修复材料在牙科合金基材的表面上含有白云石和钠，并且在380℃以上但低于无机盐的熔点和涂层的应变温度的温度下对涂覆材料进行热处理材料。根据本发明的方法，可以在不使用任何特殊装置的情况下容易地加强涂覆材料，同时保持其半透明度和色调。

10. 发明授权

US4526619A Gypsum composition for denture investment 失效
标题翻译：石膏组合物用于义齿投资
公开(公告)号：US4526619A
公开(公告)日：1985-07-02
申请号：US516331
申请日：1983-07-22
申请人： Nobukazu Ohi , Koji Ohno , Satoshi Tosaki
发明人： Nobukazu Ohi , Koji Ohno , Satoshi Tosaki
IPC分类号： A61K6/00 , A61K6/027 , C04B11/00 , C04B11/06 , C04B28/14 , C09K3/00
CPC分类号： A61K6/0625 , C04B11/002 , C04B28/147 , C04B2111/00836 , C04B2111/00939
摘要： A gypsum composition for denture investment consists of 100 parts by weight of a mixture of 50-90 parts by weight of .alpha.-Gypsum hemihydrate (.alpha.-CaSO.sub.4.1/2H.sub.2 O) with 10-50 parts by weight of .beta.-Gypsum hemihydrate (.beta.-CaSO.sub.4.1/2H.sub.2 O) and 0.2-2.0 parts by weight of a soluble potassium salt. As the soluble potassium salt, use may be made of one or more of potassium sulfate, potassium chloride and potassium tartrate. The gypsum composition may further include 0.5-5.0 parts by weight of dihydrate gypsum.
摘要翻译：用于义齿投资的石膏组合物由100重量份的50-90重量份的α-石膏半水合物（α-C 4 SO 4 .1 / 2H 2 O）与10-50重量份的β-石膏半水合物（β -CaSO 4·1 / 2H 2 O）和0.2〜2.0重量份的可溶性钾盐。作为可溶性钾盐，可以使用硫酸钾，氯化钾和酒石酸钾中的一种或多种。石膏组合物还可以包含0.5-5.0重量份的二水石膏。

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