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1. 发明授权

US4976942A Method for purifying gaseous hydrides 失效
标题翻译：气态氢化物的净化方法
公开(公告)号：US4976942A
公开(公告)日：1990-12-11
申请号：US412750
申请日：1989-09-26
申请人： Koichi Kitahara , Takashi Shimada , Keiichi Iwata , Noboru Akita
发明人： Koichi Kitahara , Takashi Shimada , Keiichi Iwata , Noboru Akita
IPC分类号： C01B6/34 , C01B19/00 , C01B19/04 , C01B25/06 , C01B25/08 , C01B33/04 , C01B33/06 , C01B35/04
CPC分类号： C01B35/04 , C01B19/007 , C01B19/04 , C01B25/06 , C01B25/08 , C01B33/046 , C01B33/06 , C01B6/34
摘要： A method for purifying a gaseous hydride, which comprises bringing a crude gaseous hydride into contact with at least one material from nickel arsenides, nickel phosphides, nickel silicides, nickel selenides, or nickel borides to remove oxygen contained in the crude gaseous hydride.

2. 发明授权

US5019364A Method for purifying gaseous hydrides 失效
标题翻译：气态氢化物的净化方法
公开(公告)号：US5019364A
公开(公告)日：1991-05-28
申请号：US611603
申请日：1990-11-13
申请人： Koichi Kitahara , Takashi Shimada , Keiichi Iwata
发明人： Koichi Kitahara , Takashi Shimada , Keiichi Iwata
IPC分类号： C01G28/00 , C01B6/34 , C01B17/16 , C01B19/04 , C01B25/06 , C01B33/04
CPC分类号： C01B6/34 , C01B17/168 , C01B19/04 , C01B25/06 , C01B33/046 , C01P2006/80
摘要： A method for purifying a gaseous hydride, which comprises bringing a crude gaseous hydride into contact with at least one material selected from copper arsenides, copper phosphides, copper silicides, copper selenides, copper borides or copper sulfides to remove oxygen contained in the crude gaseous hydride.
摘要翻译：一种纯化气态氢化物的方法，其包括使粗气态氢化物与选自砷化铜，磷化铜，硅化铜，硒化铜，铜硼化物或硫化铜中的至少一种材料接触，以除去粗制氢化物中所含的氧。

3. 发明授权

US4743435A Method for cleaning exhaust gases 失效
标题翻译：排气净化方法
公开(公告)号：US4743435A
公开(公告)日：1988-05-10
申请号：US711135
申请日：1985-03-13
申请人： Koichi Kitahara , Takashi Shimada
发明人： Koichi Kitahara , Takashi Shimada
IPC分类号： B01D53/46 , B01D53/86 , B01J20/02 , B01D53/34
CPC分类号： B01D53/46 , B01D53/8671 , B01J20/06 , B01J20/08 , B01J20/103 , B01J20/3007 , B01J20/3078
摘要： A method for cleaning an exhaust gas containing at least one toxic component selected from the group consisting of arsine, phosphine, diborane and hydrogen selenide is disclosed. The method comprises contacting the toxic component with a molded cleaning agent having a composition consisting essentially of (1) cupric oxide and (2) at least one metal oxide selected from the group consisting of silicon oxide, aluminum oxide and zinc oxide and having a density of from about 1.5 to about 3.5 g/ml, said composition having a metal atomic ratio M/(M+Cu) in the range of from about 0.02 to about 0.7 wherein Cu represents a number of gram atom of copper and M represents a total number of gram atom of silicon, aluminum and/or zinc, to remove the toxic component from the exhaust gas.
摘要翻译：公开了一种清洗含有选自胂，膦，乙硼烷和硒化氢中的至少一种有毒成分的废气的方法。该方法包括使有毒成分与具有以下组成的成型清洗剂接触：（1）氧化铜和（2）选自氧化硅，氧化铝和氧化锌中的至少一种金属氧化物，并具有密度为约1.5至约3.5g / ml，所述组合物的金属原子比M /（M + Cu）在约0.02至约0.7的范围内，其中Cu表示铜原子数，M表示总量硅，铝和/或锌的克原子数，以从废气中除去有毒成分。

4. 发明授权

US4996030A Method for cleaning exhaust gases 失效
标题翻译：排气净化方法
公开(公告)号：US4996030A
公开(公告)日：1991-02-26
申请号：US200886
申请日：1988-06-01
申请人： Koichi Kitahara , Takashi Shimada , Noboru Akita , Tadashi Hiramoto , Kohhei Sasaki
发明人： Koichi Kitahara , Takashi Shimada , Noboru Akita , Tadashi Hiramoto , Kohhei Sasaki
IPC分类号： B01D53/46 , B01D53/86 , C01B3/56 , C01B21/04 , C01B23/00
CPC分类号： C01B23/00 , B01D53/46 , B01D53/8671 , C01B21/0427 , C01B3/56 , C01B2203/042 , C01B2203/0465 , C01B2210/0043
摘要： A method for cleaning an exhaust gas comprising a base gas and at least one toxic component selected from the group consisting of arsine, phosphine, diborane and hydrogen selenide is disclosed. The method comprises contacting the exhaust gas with a molded cleaning agent having a composition consisting essentially of (1) cupric oxide, (2) manganese dioxide, and (3) at least one metal oxide selected from the group consisting of silicon oxide, aluminum oxide and zinc oxide and having a density of from 0.6 to 1.5 g/ml, said composition having a metal atomic ratio M/(M+Cu+Mn) in the range of from 0.02 to 0.70 and a metal atomic ratio Cu/(Cu+Mn) in the range of from 0.1 to 0.9; wherein Cu represents a number of gram atom of copper; Mn represents a number of gram atom of manganese; and M represents a total number of gram atom of silicon, aluminum and/or zinc, to remove the toxic component from the exhaust gas. The method is effective even at low temperatures below 10.degree. C.

5. 发明授权

US4731333A Method for detecting gaseous hydrides 失效
标题翻译：检测气态氢化物的方法
公开(公告)号：US4731333A
公开(公告)日：1988-03-15
申请号：US878537
申请日：1986-06-25
申请人： Koichi Kitahara , Takashi Shimada
发明人： Koichi Kitahara , Takashi Shimada
IPC分类号： G01N31/00 , G01N31/22 , G01N21/78
CPC分类号： G01N31/22 , Y10S436/902 , Y10S436/904 , Y10T436/16 , Y10T436/19 , Y10T436/204998
摘要： A solid detecting reagent for gaseous hydrides and a gaseous hydride detecting method are disclosed, said reagent comprising a basic copper carbonate as a color changing component and undergoing color change upon contact with at least one gaseous hydride selected from the group consisting of arsine, phosphine, diborane, hydrogen selenide, germane, monosilane, disilane and dichlorosilane. The reagent is applicable to all of these gaseous hydrides and, upon contact therewith, rapidly changes from an initial blue color to a black color, said black color standing for a long period of time.
摘要翻译：公开了一种用于气态氢化物的固体检测试剂和气态氢化物检测方法，所述试剂包含碱性碳酸铜作为变色组分，并且与至少一种选自胂，膦，乙硼烷，硒化氢，锗烷，甲硅烷，乙硅烷和二氯硅烷。该试剂适用于所有这些气态氢化物，并且与其接触时，从初始蓝色迅速变化为黑色，所述黑色长时间放置。

6. 发明授权

US4910001A Method for cleaning gas containing toxic component 失效
标题翻译：清洁含有毒成分的气体的方法
公开(公告)号：US4910001A
公开(公告)日：1990-03-20
申请号：US238068
申请日：1988-08-30
申请人： Koichi Kitahara , Noboru Akita , Takashi Shimada , Kohhei Sasaki , Tadashi Hiramoto
发明人： Koichi Kitahara , Noboru Akita , Takashi Shimada , Kohhei Sasaki , Tadashi Hiramoto
IPC分类号： B01D53/46
CPC分类号： B01D53/46
摘要： A method for cleaning a gas containing at least one toxic component selected from the group consisting of arsine, phosphine, monosilane, diborane, and hydrogen selenide, which comprises contacting the gas with a cleaning agent containing a molded composition comprising (1) manganese dioxide and (2) cupric oxide, having deposited thereon (3) a silver compound, wherein the weight ratio of cupric oxide to manganese dioxide ranges from 0.2 to 1.2 and the amount of the deposited silver compound ranges from 0.01 to 10.5% by weight based on the cleaning agent. By the cleaning method, the toxic component can be removed from a gas, e.g., air, at high efficiency and at a high rate even in case of sudden leakage of the toxic component out of a bomb.

7. 发明授权

US5597540A Process for cleaning harmful gas 失效
标题翻译：清洁有害气体的过程
公开(公告)号：US5597540A
公开(公告)日：1997-01-28
申请号：US308648
申请日：1994-09-19
申请人： Noboru Akita , Toshiya Hatakeyama , Takashi Shimada , Keiichi Iwata
发明人： Noboru Akita , Toshiya Hatakeyama , Takashi Shimada , Keiichi Iwata
IPC分类号： B01D53/68 , C01B7/07
CPC分类号： B01D53/68
摘要： There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process.
摘要翻译：公开了一种清洁有害气体的方法，该方法包括使氯，氯化氢，二氯硅烷，四氯化硅，三氯化磷，三氟化氯，三氯化硼，三氟化硼，六氟化钨，四氟化硅，氟，氢等有害的气态卤化物氟化物和溴化氢与包含氧化锌，氧化铝和碱性化合物的清洗剂接触以除去上述卤化物。上述方法对于迅速有效地除去从半导体制造过程中排出的气体中所含有的上述气态卤化物是非常有效的。

8. 发明授权

US5378444A Process for cleaning harmful gas 失效
标题翻译：清洁有害气体的过程
公开(公告)号：US5378444A
公开(公告)日：1995-01-03
申请号：US975698
申请日：1992-11-13
申请人： Noboru Akita , Toshiya Hatakeyama , Takashi Shimada , Keiichi Iwata
发明人： Noboru Akita , Toshiya Hatakeyama , Takashi Shimada , Keiichi Iwata
IPC分类号： B01D53/68 , C01B7/07
CPC分类号： B01D53/68
摘要： There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process or leaked suddenly from a gas bomb in an emergency.
摘要翻译：公开了一种清洁有害气体的方法，该方法包括使氯，氯化氢，二氯硅烷，四氯化硅，三氯化磷，三氟化氯，三氯化硼，三氟化硼，六氟化钨，四氟化硅，氟，氢等有害的气态卤化物氟化物和溴化氢与包含氧化锌，氧化铝和碱性化合物的清洗剂接触以除去上述卤化物。上述过程对于迅速有效地除去在半导体制造过程中排出的气体中所含的上述气态卤化物或在紧急情况下突然从气体炸弹泄漏而非常有效。

9. 发明授权

US5470555A Process for purification of gaseous organometallic compound 失效
标题翻译：气态有机金属化合物的纯化方法
公开(公告)号：US5470555A
公开(公告)日：1995-11-28
申请号：US202701
申请日：1994-02-23
申请人： Takashi Shimada , Keiichi Iwata , Masako Yasuda
发明人： Takashi Shimada , Keiichi Iwata , Masako Yasuda
IPC分类号： B01D53/02 , C07F3/06 , C07F5/00 , C07F5/06 , C23C16/18 , C23C16/44 , B01D53/46 , C07F19/00 , C23C16/16
CPC分类号： C07F5/063 , B01D53/02 , C07F3/06 , C07F5/00 , C23C16/18 , C23C16/4402
摘要： There is disclosed a process for purification a gaseous organometallic compound containing impurities by bringing the compound into contact with a catalyst comprising a copper or nickel component as the essential ingredient to remove oxygen contained in the compound. The above-mentioned process is capable removal of oxygen in an organometallic compound as low as 0.1 ppm and further to a ultralow concentration of 0.01 ppm, which removal has heretofore been impossible, and thereby the production of a ultrapure organometallic compound has been made possible.
摘要翻译：公开了通过使化合物与包含铜或镍组分的催化剂作为必要成分接触来净化含有杂质的气态有机金属化合物以除去化合物中所含的氧的方法。上述方法能够除去低至0.1ppm的有机金属化合物中的氧，并且进一步至0.01ppm的超低浓度，迄今为止不可能进行除去，从而使超纯有机金属化合物的生产成为可能。

10. 发明申请

US20140094555A1 CARBON-FIBER-REINFORCED PLASTIC AND PROCESS FOR PRODUCING SAME 有权
标题翻译：碳纤维增强塑料及其制造方法
公开(公告)号：US20140094555A1
公开(公告)日：2014-04-03
申请号：US14122501
申请日：2012-04-18
申请人： Takafumi Hashimoto , Hirohito Minowa , Takashi Shimada , Masahiro Hashimoto , Katsuhiro Miyoshi , Yoshihiro Naruse
发明人： Takafumi Hashimoto , Hirohito Minowa , Takashi Shimada , Masahiro Hashimoto , Katsuhiro Miyoshi , Yoshihiro Naruse
IPC分类号： C08K3/04 , B29C70/06
CPC分类号： C08K3/04 , B29C70/06 , B29C70/14 , C08J5/042 , C08J5/24 , C08J2300/22 , C08J2377/00
摘要： A carbon-fiber-reinforced plastic prepared by impregnating a matrix resin into a sheet-like base material includes discontinuous carbon fibers, wherein a content ratio of carbon fibers having lengths of 10 mm or longer in the base material is 60 wt % or more relative to a total amount of the carbon fibers, and an average value of orientation degrees of carbon fibers contained in the base material is 2-10.
摘要翻译：通过将基质树脂浸渍到片状基材中而制备的碳纤维增强塑料包括不连续的碳纤维，其中基材中长度为10mm以上的碳纤维的含量比例为60重量％以上相对于碳纤维的总量，基材中所含的碳纤维的取向度的平均值为2-10。

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