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    • 3. 发明申请
    • INFRARED-RAY REFLECTIVE MEMBER
    • 红外反射成员
    • US20120218626A1
    • 2012-08-30
    • US13503514
    • 2010-10-08
    • Satoru HamadaShoji TakeshigeKeiji KashimaTakashi Kuroda
    • Satoru HamadaShoji TakeshigeKeiji KashimaTakashi Kuroda
    • G02B5/30
    • G02B5/30G02B5/208G02B5/26
    • Disclosed is an infrared-ray reflective member which efficiently reflects infrared rays (heat rays) contained in sunlight while transmitting visible light rays. The infrared-ray reflective member has an infrared-ray reflective layer having a selective reflection layer for reflecting infrared rays of a right-circularly polarized light component or a left-circularly polarized light component, and the infrared-ray reflective layer has a first reflection band corresponding to a first radiant energy band containing a peak located closest to the short-wavelength side of the infrared range of the spectrum of sunlight on earth, and when the maximum reflectance in the first reflection band is determined at R1 and a wavelength in the short-wavelength side for allowing half-value reflectance of the R1 is determined at λ1, the λ1 is 900 nm to 1010 nm.
    • 公开了一种红外线反射构件,其在透射可见光的同时有效地反射包含在太阳光中的红外线(热线)。 红外线反射构件具有红外线反射层,其具有用于反射右圆偏振光分量或左圆偏振光分量的红外线的选择反射层,并且红外线反射层具有第一反射 对应于包含最靠近地球上太阳光谱的红外范围的短波长侧的峰的第一辐射能带,并且当在第一反射带中的最大反射率在R1和波长 在λ1处确定用于允许R1的半值反射率的短波长侧,λ1为900nm至1010nm。
    • 4. 发明申请
    • ELECTROMAGNETIC WAVE REFLECTIVE MEMBER PRODUCTION METHOD
    • 电磁波反射成员生产方法
    • US20120177838A1
    • 2012-07-12
    • US13395940
    • 2010-12-22
    • Satoru HamadaShoji TakeshigeKeiji Kashima
    • Satoru HamadaShoji TakeshigeKeiji Kashima
    • B05D5/06B05D3/06
    • G02B5/305G02B5/3083
    • An electromagnetic wave reflective member production method including a right-circularly-polarized-light selective reflective layer forming step, and a left-circularly-polarized-light selective reflective layer forming step, characterized in that a right-handed twisted coating film is formed in the right-circularly-polarized-light selective reflective layer forming step by applying a right-handed twisting coating liquid on a transparent substrate and forming a substantially fully cured right-circularly-polarized-light selective reflective layer by means of energy irradiation of the right-handed twisted coating film; and a left-handed twisted coating film is formed in the left-circularly-polarized-light selective reflective layer forming step by applying a left-handed twisting coating liquid on the right-circularly-polarized-light selective reflective layer and forming a left-circularly-polarized-light selective reflective layer by means of energy irradiation of the left-handed twisted coating film.
    • 一种包括右圆偏振光选择反射层形成步骤和左圆偏振光选择反射层形成步骤的电磁波反射构件制造方法,其特征在于,将右旋扭转涂膜形成在 通过在透明基板上施加右旋扭转涂布液并通过右侧的能量照射形成基本上完全固化的右圆偏振光选择反射层的右圆偏振光选择反射层形成步骤 手套扭涂膜; 并且在左圆偏振光选择反射层形成步骤中,通过在右圆偏振光选择反射层上施加左旋扭转涂布液形成左旋扭转涂膜, 通过左旋扭转涂膜的能量照射进行圆偏振光选择反射层。
    • 7. 发明授权
    • Electromagnetic wave reflective film and method for producing same
    • 电磁波反射膜及其制造方法
    • US08968836B2
    • 2015-03-03
    • US13807144
    • 2011-05-18
    • Satoru HamadaShoji TakeshigeKeiji Kashima
    • Satoru HamadaShoji TakeshigeKeiji Kashima
    • B05D5/06G02B5/30G02F1/13
    • B05D5/063G02B5/3016G02F1/1313Y10T428/10
    • Method for producing an electromagnetic wave reflective film by a first selective reflection layer forming process of using a transparent substrate; applying a first selective reflection layer forming coating solution on the transparent substrate to form a first selective reflection layer forming layer; irradiating the first selective reflection layer forming layer with ultraviolet rays at a dose in the range of 25 mJ/cm2 to 800 mJ/cm2; and thereby forming a first selective reflection layer; and a second selective reflection layer forming process of: using a second selective reflection layer forming coating solution; applying the second selective reflection layer forming coating solution on the first selective reflection layer so as to be in direct contact therewith to form a second selective reflection layer forming layer; irradiating the second selective reflection layer forming layer with ultraviolet rays; and thereby forming a second selective reflection layer.
    • 通过使用透明基板的第一选择反射层形成工艺制造电磁波反射膜的方法; 在所述透明基板上施加第一选择反射层形成涂层溶液以形成第一选择反射层形成层; 以25mJ / cm 2〜800mJ / cm 2的剂量对紫外线照射第一选择反射层形成层; 从而形成第一选择反射层; 以及第二选择反射层形成工艺:使用第二选择反射层形成涂布溶液; 将第二选择反射层形成涂层溶液施加到第一选择反射层上以与其直接接触以形成第二选择反射层形成层; 用紫外线照射第二选择反射层形成层; 从而形成第二选择反射层。
    • 8. 发明申请
    • ELECTROMAGNETIC WAVE REFLECTIVE FILM AND METHOD FOR PRODUCING SAME
    • 电磁波反射膜及其制造方法
    • US20130107193A1
    • 2013-05-02
    • US13807144
    • 2011-05-18
    • Satoru HamadaShoji TakeshigeKeiji Kashima
    • Satoru HamadaShoji TakeshigeKeiji Kashima
    • B05D5/06G02F1/13
    • B05D5/063G02B5/3016G02F1/1313Y10T428/10
    • Method for producing an electromagnetic wave reflective film by a first selective reflection layer forming process of using a transparent substrate; applying a first selective reflection layer forming coating solution on the transparent substrate to form a first selective reflection layer forming layer; irradiating the first selective reflection layer forming layer with ultraviolet rays at a dose in the range of 25 mJ/cm2 to 800 mJ/cm2; and thereby forming a first selective reflection layer; and a second selective reflection layer forming process of: using a second selective reflection layer forming coating solution; applying the second selective reflection layer forming coating solution on the first selective reflection layer so as to be in direct contact therewith to form a second selective reflection layer forming layer; irradiating the second selective reflection layer forming layer with ultraviolet rays; and thereby forming a second selective reflection layer.
    • 通过使用透明基板的第一选择反射层形成工艺制造电磁波反射膜的方法; 在所述透明基板上施加第一选择反射层形成涂层溶液以形成第一选择反射层形成层; 以25mJ / cm 2〜800mJ / cm 2的剂量对紫外线照射第一选择反射层形成层; 从而形成第一选择反射层; 以及第二选择反射层形成工艺:使用第二选择反射层形成涂布溶液; 将第二选择反射层形成涂层溶液施加到第一选择反射层上以与其直接接触以形成第二选择反射层形成层; 用紫外线照射第二选择反射层形成层; 从而形成第二选择反射层。