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JP2008115464A Method and device for manufacturing anti-adhesive and wear-resistant surface 审中-公开
标题翻译：用于制造抗粘合和抗磨损表面的方法和装置
公开(公告)号：JP2008115464A
公开(公告)日：2008-05-22
申请号：JP2007249867
申请日：2007-09-26
申请人： Koenig & Bauer Ag , ケーニッヒ、ウント、バウエル、アクチエンゲゼルシャフトKoenig&Bauer Ag
发明人： PATZELT BERND , HOPFE VOLKMAR , DANI INES , KOCH MICHAEL DR , LINASCHKE DORIT
IPC分类号： C23C16/42 , B41F13/18
CPC分类号： C23C16/04 , B41N7/00 , B41N2207/02 , B41N2207/10 , C23C16/0272 , C23C16/26
摘要： PROBLEM TO BE SOLVED: To economically deposit by continuous production, an ink-repellent, easily cleanable, anti-adhesive and wear-resistant layer on a rotating body or the outer circumferential face member thereof (a coating object) used in a paper machine or a rotary press, in particular on the roughened structure of an impression cylinder without damaging concentricity. SOLUTION: A roughened structure for reducing adhesion is made on a surface then a carbon coating is deposited by a PACVD (plasma-assisted chemical vapor deposition) process, thereby an anti-adhesive and wear-resistant layer is deposited, wherein in order that the coating contains elements C, H, Si, O and F in various compositions, a C-H-Si-O base lattice is formed using a hydrocarbon and silicon-containing precursor in the first stage and fluorine is taken in from a fluorine precursor in the second stage, At this time, the head of a movable reactor shaped by copying the profile of a coating object surrounds a reaction chamber together with the surface of the coating object and further traverses over the coating object without contact, and the precursor and scavenging gas are fed to the reaction chamber with a PACVD plasma flow and an another gas flow. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了经济地沉积，在旋转体或其外周面构件（涂覆对象）上使用的防油墨，易清洁，耐粘合和耐磨层造纸机或旋转压机，特别是在压印滚筒的粗糙结构上，而不损坏同心度。解决方案：在表面上形成用于降低粘合性的粗糙结构，然后通过PACVD（等离子体辅助化学气相沉积）方法沉积碳涂层，由此沉积抗粘和耐磨层，其中在各种组成中，涂层含有元素C，H，Si，O和F，在第一阶段使用烃和含硅前体形成CH-Si-O基晶格，氟从氟前体在第二阶段，此时，通过复制涂布物体的轮廓而成形的可动式反应器的头部与涂覆物体的表面一起包围反应室，并且进一步在不接触的情况下横越涂覆物体，并且前体和清除气体以PACVD等离子体流和另一种气体流量供入反应室。版权所有（C）2008，JPO＆INPIT

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