会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Spin valve head with a current channeling layer
    • 旋转阀头带有电流通道层
    • US06665154B2
    • 2003-12-16
    • US09931155
    • 2001-08-17
    • Kochan JuYou Feng ZhengRod Lee
    • Kochan JuYou Feng ZhengRod Lee
    • G11B539
    • B82Y25/00B82Y10/00G11B5/3903G11B5/3932G11B2005/3996
    • Spin valve heads with overlaid leads have several advantages over butted contiguous junction designs, including larger signal output and better head stability. However, in any overlaid design there is always present at least one high resistance layer between the GMR layer and the conductive leads. This leads to an effective read width that is greater than the actual physical width. This problem has been overcome by inserting a highly conductive channeling layer between the GMR stack and the conducting lead laminate. This arrangement ensures that, at the intersection between the leads and the GMR stack, virtually all the current moves out of the free layer into the leads thereby providing an effective read width for the device that is very close to the physical read width defined by the spacing between the two leads. A process for manufacturing the device is also described.
    • 具有覆盖引线的旋转阀头具有优于对接连接结设计的优点,包括较大的信号输出和更好的磁头稳定性。 然而,在任何重叠的设计中,总是在GMR层和导电引线之间存在至少一个高电阻层。 这导致有效的读宽度大于实际物理宽度。 通过在GMR堆叠和导电铅层压板之间插入高度导电的沟道层已经克服了这个问题。 这种布置确保了在引线和GMR堆叠之间的交叉点处,几乎所有的电流都从自由层移动到引线中,从而为非常接近于由 两根导线之间的间距。 还描述了用于制造该装置的方法。
    • 5. 发明授权
    • Ferromagnetic/antiferromagnetic bilayer, including decoupler, for longitudinal bias
    • 铁磁/反铁磁双层,包括去耦器,用于纵向偏置
    • US06721143B2
    • 2004-04-13
    • US09933963
    • 2001-08-22
    • You Feng ZhengKochan JuCheng T. HorngSimon LiaoRu Ying Tong
    • You Feng ZhengKochan JuCheng T. HorngSimon LiaoRu Ying Tong
    • G11B539
    • B82Y25/00B82Y10/00G11B5/3163G11B5/3903G11B2005/3996Y10T29/49044Y10T29/49046Y10T29/49052
    • As the dimensions of spin valve heads continue to be reduced, a number of difficulties are being encountered. One such is with the longitudinal bias when an external magnetic field can cause reversal of the hard magnet, thereby causing a hysteric response by the head. This coercivity reduction becomes more severe as the hard magnet becomes thinner. This problem has been overcome by inserting a decoupling layer between the antiferromagnetic layer that is used to stabilize the pinned layer of the spin valve itself and the soft ferromagnetic layer that is used for longitudinal biasing. This soft ferromagnetic layer is pinned by a second antiferromagnetic layer deposited on it on its far side away from the first antiferromagnetic layer. The presence of the decoupling layer ensures that the magnetization of the soft layer is determined only by the second antiferromagnetic layer. The inclusion of the decoupling layer allows more latitude in etch depth control during manufacturing.
    • 随着自旋阀头的尺寸不断减小,正在遇到许多困难。 当外部磁场可能导致硬磁体的反转时,其中之一是具有纵向偏置,从而导致头部的歇斯底里响应。 随着硬磁体变薄,矫顽力降低变得更严重。 通过在用于稳定自旋阀本身的被钉扎层的反铁磁性层和用于纵向偏置的软铁磁层之间插入去耦层已经克服了这个问题。 该软铁磁层由沉积在其上的远离第一反铁磁性层的远侧的第二反铁磁层固定。 去耦层的存在确保了软层的磁化仅由第二反铁磁层确定。 包含去耦层在制造过程中允许蚀刻深度控制的更大的纬度。
    • 10. 发明授权
    • CPP head with parasitic shunting reduction
    • CPP头与寄生分流减少
    • US07279269B2
    • 2007-10-09
    • US10734422
    • 2003-12-12
    • Jeiwei ChangStuart KaoChao Peng ChenChunping LuoKochan JuMin Li
    • Jeiwei ChangStuart KaoChao Peng ChenChunping LuoKochan JuMin Li
    • G11B5/39
    • G11B5/3163G11B5/398Y10T428/1171
    • The series resistance of a CPP GMR stack can be reduced by shaping it into a small upper, on a somewhat larger, lower part. Because of the sub-micron dimensions involved, good alignment between these is normally difficult to achieve. The present invention discloses a self-alignment process based on first laying down a mask that will determine the shape of the top part. Ion beam etching is then initiated, the ion beam being initially applied from one side only at an angle to the surface normal. During etching, all material on the near side of the mask gets etched but, on the far side, only material that is outside the mask's shadow gets removed so, depending on the beam's angle, the size of the lower part is controlled and the upper part is precisely centrally aligned above it.
    • CPP GMR堆叠的串联电阻可以通过将其成形为较小的上部,在较小的较低部分上来减小。 由于涉及亚微米尺寸,这些之间的良好对准通常难以实现。 本发明公开了一种基于第一次铺设掩模的自对准过程,该掩模将确定顶部的形状。 然后开始离子束蚀刻,离子束最初仅从一侧以与表面法线成一定角度施加。 在蚀刻期间,掩模近侧的所有材料都被蚀刻,但在远侧,只有在掩模阴影之外的材料被去除,因此根据光束的角度,下部的尺寸被控制,并且上部 部分精确地集中在其上。