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1. 发明申请

US20070141191A1 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US20070141191A1
公开(公告)日：2007-06-21
申请号：US11312659
申请日：2005-12-21
申请人： Yvonne Kruijt-Stegeman , Raymond Knaapen , Johan Dijksman , Krassimir Krastev , Sander Wuister , Aleksey Kolesnychenko , Karel Van Der Mast , Klaus Simon
发明人： Yvonne Kruijt-Stegeman , Raymond Knaapen , Johan Dijksman , Krassimir Krastev , Sander Wuister , Aleksey Kolesnychenko , Karel Van Der Mast , Klaus Simon
IPC分类号： B29C35/08
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

2. 发明申请

US20070102844A1 Imprint lithography 有权
公开(公告)号：US20070102844A1
公开(公告)日：2007-05-10
申请号：US11364490
申请日：2006-03-01
申请人： Klaus Simon , Karel Van Der Mast , Johan Dijksman
发明人： Klaus Simon , Karel Van Der Mast , Johan Dijksman
IPC分类号： B29C33/40 , H05B6/00 , B29C55/00 , B28B11/08 , B29C45/14 , B29C59/00
CPC分类号： B29C59/022 , B29C35/0888 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.

3. 发明申请

US20050286035A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050286035A1
公开(公告)日：2005-12-29
申请号：US10876772
申请日：2004-06-28
申请人： Kars Troost , Karel Van Der Mast
发明人： Kars Troost , Karel Van Der Mast
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70225 , G03F7/70291 , G03F7/70425
摘要： Lithographic apparatus providing a patterned beam of radiation in which radiation that is linearly polarized in a first direction has a first pattern and radiation that is linearly polarized in an orthogonal direction has a second pattern.
摘要翻译：提供图案化的辐射束的平版印刷设备具有第二图案，其中沿第一方向线性偏振的辐射具有第一图案，并且在正交方向上线偏振的辐射。

4. 发明申请

US20060132742A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060132742A1
公开(公告)日：2006-06-22
申请号：US11013939
申请日：2004-12-17
申请人： Karel Van Der Mast , Kars Troost
发明人： Karel Van Der Mast , Kars Troost
IPC分类号： G03B27/68
CPC分类号： G03F7/70183 , G03F7/70216 , G03F7/70258 , G03F7/70291 , G03F7/70425
摘要： A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and a throughput of the system optimized.
摘要翻译：提供了一种系统和方法，其包括在投影系统内的不同的可移动透镜，其可以放置在辐射束的路径中以改变投影系统的放大率。通过改变投影系统的放大倍数，可以调整每像素曝光的衬底的面积，并优化系统的吞吐量。

5. 发明申请

US20050062948A1 Imaging apparatus 有权
标题翻译：成像设备
公开(公告)号：US20050062948A1
公开(公告)日：2005-03-24
申请号：US10496630
申请日：2002-11-27
申请人： Karel Van Der Mast , Arno Bleeker
发明人： Karel Van Der Mast , Arno Bleeker
IPC分类号： G01B11/00 , G01B11/24 , G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70425
摘要： An imaging apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting programmable patterning means, the programmable patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the apparatus further comprises: beam splitting means, provided between the programmable patterning means and the substrate table, serving to divert aside a portion of the patterned beam; image detection means, for analyzing said portion of the patterned beam.
摘要翻译：一种成像装置，包括：辐射系统，用于提供投影射束; 用于支持可编程图案形成装置的支撑结构，所述可编程图案形成装置用于根据期望图案对投影光束进行图案化; 用于保持衬底的衬底台; 用于将图案化的光束投影到基板的目标部分上的投影系统，其中所述装置还包括：分束装置，设置在所述可编程图案形成装置和所述基板台之间，用于将所述图案化光束的一部分转移; 图像检测装置，用于分析图案化束的所述部分。

6. 发明申请

US20070279742A1 Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate 有权
标题翻译：计量工具，包括光刻设备和计量工具的系统以及用于确定衬底参数的方法
公开(公告)号：US20070279742A1
公开(公告)日：2007-12-06
申请号：US11802257
申请日：2007-05-21
申请人： Reinder Plug , Arie Den Boef , Karel Van Der Mast
发明人： Reinder Plug , Arie Den Boef , Karel Van Der Mast
IPC分类号： G02B27/64
CPC分类号： G03F7/70758 , G03F7/70766
摘要： A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, a sensor constructed and arranged to measure a parameter of the substrate, a displacement system configured to displace the substrate table or the sensor with respect to the other in a first direction, a balance mass, and a bearing configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.
摘要翻译：计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。测量工具包括基架，构造和布置成保持基板的基板台，构造和布置成测量基板的参数的传感器，构造成将基板台或传感器相对于彼此移位的位移系统第一方向，平衡块和轴承，其构造成可移动地支撑所述第一平衡块，以便在与所述第一方向相反的方向上基本上自由地平移，以抵消所述第一平衡块中的所述基板台或传感器在所述第一方向方向。

7. 发明申请

US20060040187A1 Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same 有权
标题翻译：用于产生掩模图案的平版印刷设备，方法和计算机程序产品以及使用其的设备制造方法
公开(公告)号：US20060040187A1
公开(公告)日：2006-02-23
申请号：US10919532
申请日：2004-08-17
申请人： Kars Troost , Johannes Jacobus Baselmans , Karel Van Der Mast
发明人： Kars Troost , Johannes Jacobus Baselmans , Karel Van Der Mast
IPC分类号： G03C5/00 , G06F17/50 , G03F1/00
CPC分类号： G03F7/70283 , G03F1/36 , G03F7/70291 , G03F7/70441
摘要： Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process of simulating an aerial image that would be produced by the pattern, comparing the simulation to the desired pattern, and adjusting the OPC features may be used to generate an optimum pattern for projection
摘要翻译：灰度光学接近校正设备特征通过使用二维校正内核或两个一维校正内核卷积设备特征来添加到掩模图案中，以生成灰度OPC功能。所得到的图案可以用在具有适于产生三个或更多个强度水平的可编程图案形成装置的投影光刻设备中。可以使用模拟由图案产生的空间图像，将模拟与期望图案进行比较并调整OPC特征的迭代过程来产生用于投影的最佳图案

8. 发明申请

US20050012916A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050012916A1
公开(公告)日：2005-01-20
申请号：US10850567
申请日：2004-05-21
申请人： Karel Van Der Mast , Arno Bleeker , Cheng-Qun Gui , Johan Hoefnagels
发明人： Karel Van Der Mast , Arno Bleeker , Cheng-Qun Gui , Johan Hoefnagels
IPC分类号： G02B3/00 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70275 , G03F7/70291
摘要： A lithographic projection apparatus comprises a microlens array for generating a plurality of source images in a two-dimensional array, a programmable patterning means having a plurality of addressable elements acting as shutters for the source images and a projection subsystem for projecting a n image of the array of source images onto a substrate. A greater working distance can thereby be obtained
摘要翻译：光刻投影装置包括用于以二维阵列产生多个源图像的微透镜阵列，具有用作源图像的快门的多个可寻址元件的可编程图案形成装置和用于投影阵列的图像的投影子系统的源图像到基板上。从而可以获得更大的工作距离

9. 发明授权

US07777861B2 Methods, systems, and computer program products for printing patterns on photosensitive surfaces 有权
标题翻译：用于在感光表面上印刷图案的方法，系统和计算机程序产品
公开(公告)号：US07777861B2
公开(公告)日：2010-08-17
申请号：US11836343
申请日：2007-08-09
申请人： Azat Latypov , Karel Van Der Mast
发明人： Azat Latypov , Karel Van Der Mast
IPC分类号： G03B27/42
CPC分类号： G03F7/70475 , G03B27/54 , G03F7/70291
摘要： A method, system, and computer program product are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method, system, and computer program product define two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.
摘要翻译：提供了一种使用包括空间光调制器（SLM）的无掩模光刻系统在感光表面上印刷图案的方法，系统和计算机程序产品。方法，系统和计算机程序产品在表面的预定区域内定义两个或更多个曝光区域，每个区域对应于SLM的所选像素。在两个或多个曝光区域之间形成重叠区域，重叠区域由曝光区域的相应重叠边缘限定，重叠边缘对应于来自每个区域的所选像素的重叠对。每对中的像素被交替地激活，使得只有一对中的像素之一用于产生图案。

10. 发明授权

US07167231B2 Method and apparatus for printing large data flows 有权
标题翻译：用于打印大数据流的方法和装置
公开(公告)号：US07167231B2
公开(公告)日：2007-01-23
申请号：US10508463
申请日：2003-03-19
申请人： Anders Thurén , Karel Van Der Mast , Arno Bleeker
发明人： Anders Thurén , Karel Van Der Mast , Arno Bleeker
IPC分类号： G03B27/42 , G21K5/10 , B41J2/455
CPC分类号： G03F7/70725 , G03F7/70291 , G03F7/704 , G03F7/70508
摘要： An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation, comprising the actions of, providing a data representation of at least one image to be imaged onto a plurality of locations of said workpiece, fracturing said data representation into a plurality of field stripes, repeating the actions of rasterizing a first field stripe of said data representation, modulating a modulator according to said rasterized field stripe, imaging said first field stripe onto a plurality of locations of said workpiece, rasterizing a second field stripe of said data representation while imaging said first field stripe onto said plurality of locations of said workpiece, terminating the repetition when a predetermined amount of said image is imaged onto said plurality of locations of said workpiece. Other aspects of the present invention are reflected in the detailed description, figures and claims.
摘要翻译：本发明的一个方面包括一种用于图案化至少部分地具有对电磁辐射敏感的层的工件的方法，包括以下动作：提供要成像到所述工件的多个位置上的至少一个图像的数据表示将所述数据表示压缩成多个场条带，重复光栅化所述数据表示的第一场条带的动作，根据所述光栅化场条带调制调制器，将所述第一场条纹成像到所述工件的多个位置上，光栅化所述数据表示的第二场条纹，同时将所述第一场条纹成像到所述工件的所述多个位置上，当将预定量的所述图像成像到所述工件的所述多个位置上时，终止重复。本发明的其它方面在详细描述，附图和权利要求中被体现。

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