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    • 1. 发明授权
    • Method and apparatus for forming electrically conductive transparent
oxide
    • 用于形成导电透明氧化物的方法和装置
    • US4428809A
    • 1984-01-31
    • US362432
    • 1982-03-26
    • Klaus J. HeimbachWolf-Dieter MunzRolf AdamHeinz Wenzl
    • Klaus J. HeimbachWolf-Dieter MunzRolf AdamHeinz Wenzl
    • C23C14/00C23C14/35C23C15/00
    • C23C14/35C23C14/0068
    • The invention concerns a method of and apparatus for forming electrically conductive transparent oxide coatings on water-containing substrates by magnetic-field reinforced cathodic atomization of a target hot-pressed from powdered oxide ceramic materials. The coatings formed have electrical conductivity.When the atomization process is carried out using direct-current voltages of between 150 and 600 volts and a power density of 3 to 15 and preferably 5 to 10 watts/cm.sup.2, the degree of pressing of the target is at least 75% of the density of the solid material and the atomization atmosphere is maintained at between 1.times.10.sup.-3 and 5.times.10.sup.-2 mbars with a composition of 2 to 20% oxygen, 40 to 70% hydrogen, and the remainder argon. Based upon the speed of travel of the web, a thickness of coating of between 10 and 100 mm and a specific resistance of between 100 and 10,000 .mu..OMEGA.cm are achieved.
    • 本发明涉及通过从粉末状氧化物陶瓷材料热压的靶的磁场增强阴极雾化在含水基底上形成导电透明氧化物涂层的方法和装置。 所形成的涂层具有导电性。 当使用150至600伏特的直流电压和3至15,优选5至10瓦特/平方厘米的功率密度进行雾化处理时,靶的压制度至少为密度的75% 的固体材料和雾化气氛保持在1×10 -3和5×10 -2 m巴之间,组成为2至20%氧气,40至70%氢气,其余为氩气。 基于网的行进速度,实现10至100mm之间的涂层厚度和100至10,000微米欧米伽厘米之间的电阻率。