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1. 发明申请

US20060000705A1 Cylindrical target with oscillating magnet for magnetron sputtering 有权
标题翻译：圆柱靶用磁控溅射的振荡磁体
公开(公告)号：US20060000705A1
公开(公告)日：2006-01-05
申请号：US11171054
申请日：2005-06-30
申请人： Klaus Hartig , Steve Smith , John Madocks
发明人： Klaus Hartig , Steve Smith , John Madocks
IPC分类号： C23C14/32
CPC分类号： H01J37/3455 , H01J37/3405 , H01J37/3423 , H01J37/3497
摘要： In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, means for rotating the target about its axis during a sputtering operation, an elongated magnet carried within the target for generation of a plasma-containing magnetic field exterior to but adjacent the target, a framework for supporting the magnet against rotation within the target, and a power train for causing the magnet to oscillate within and axially of the target in a substantially asynchronous manner to promote generally uniform target utilization along its length, as well as its method of use. In some embodiments, the magnet is oscillated in response to rotation of the target.
摘要翻译：在一些实施例中，本发明包括用于将目标材料溅射到基板上的圆柱形阴极靶组件，该基板包括大致圆柱形的靶，用于在溅射操作期间使靶围绕其轴旋转的装置，用于产生的靶内的细长磁体位于目标外部但邻近目标的等离子体磁场，用于支撑磁体以防止目标内的旋转的框架和用于使磁体以基本上异步的方式在目标内部和轴向振荡的传动系，以促进一般沿其长度的均匀目标利用率及其使用方法。在一些实施例中，磁体响应于目标的旋转而振荡。

2. 发明申请

US20120132261A1 CADMIUM STANNATE SPUTTER 审中-公开
公开(公告)号：US20120132261A1
公开(公告)日：2012-05-31
申请号：US13171987
申请日：2011-06-29
申请人： Benyamin Buller , Douglas Dauson , Scott Mills , Dale Roberts , Yu Yang , Zhibo Zhao , Keith Burrows , Klaus Hartig , Annette Krisko
发明人： Benyamin Buller , Douglas Dauson , Scott Mills , Dale Roberts , Yu Yang , Zhibo Zhao , Keith Burrows , Klaus Hartig , Annette Krisko
IPC分类号： H01L31/048 , H01L31/0224
CPC分类号： C23C14/3414 , C23C14/086 , H01L31/022466 , H01L31/03925 , H01L31/073 , H01L31/1884 , Y02E10/543 , Y02P70/521
摘要： A structure includes a barrier layer which can include a silicon aluminum oxide, and a transparent conductive oxide layer which can include a layer of cadmium and tin.
摘要翻译：结构包括可以包括硅氧化铝的阻挡层和可以包括镉和锡层的透明导电氧化物层。

3. 发明申请

US20110128617A1 HIGH INFRARED REFLECTION COATINGS, THIN FILM COATING DEPOSITION METHODS AND ASSOCIATED TECHNOLOGIES 有权
标题翻译：高红外反射涂层，薄膜涂层沉积方法及相关技术
公开(公告)号：US20110128617A1
公开(公告)日：2011-06-02
申请号：US13023582
申请日：2011-02-09
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： G02B5/26
CPC分类号： E06B3/6715 , C03C17/36 , C03C17/3613 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/211 , C03C2217/216 , C03C2217/78 , C03C2218/153 , C03C2218/154 , C23C14/568 , E06B9/24 , E06B2009/2417 , Y10T428/24612 , Y10T428/24942 , Y10T428/2495 , Y10T428/24975 , Y10T428/31504
摘要： The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.
摘要翻译：本发明提供高反射红外辐射的低发射率涂层。该涂层包括三个红外反射膜区域，其可以各自包含银。

4. 发明授权

US07572511B2 High infrared reflection coatings 有权
标题翻译：高红外反射涂层
公开(公告)号：US07572511B2
公开(公告)日：2009-08-11
申请号：US11545323
申请日：2006-10-10
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： B32B15/04 , B32B17/06
CPC分类号： C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , Y10T428/231
摘要： The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.
摘要翻译：本发明提供高反射红外辐射的低发射率涂层。该涂层包括三个红外反射膜区域，其可以各自包含银。

5. 发明授权

US07534466B2 Methods and equipment for depositing coatings having sequenced structures 有权
标题翻译：用于沉积具有测序结构的涂层的方法和设备
公开(公告)号：US07534466B2
公开(公告)日：2009-05-19
申请号：US11273979
申请日：2005-11-15
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： B05D5/06 , C23C16/00 , B05D1/36
CPC分类号： C03C17/002 , C03C17/3417 , C03C17/36 , C03C17/3626 , C03C17/3644 , C03C17/3652 , C03C2217/71 , C03C2218/365 , C23C14/568
摘要： Methods and equipment are provided for processing sheet-like substrates. The methods and equipment are useful for depositing coatings on both major surfaces of a sheet-like substrate. Also provided are substrates with coatings on both major surfaces. Preferably, the coatings on the opposed major surfaces of a substrate have different structures, yet share a common structural sequence of at least two film regions, and in some embodiments at least three film regions.
摘要翻译：提供了用于处理片状基材的方法和设备。所述方法和设备可用于在片状基底的两个主表面上沉积涂层。还提供了在两个主表面上具有涂层的基底。优选地，衬底的相对主表面上的涂层具有不同的结构，但是共享至少两个膜区域的共同结构序列，并且在一些实施方案中共享至少三个膜区域。

6. 发明授权

US07491301B2 Methods and apparatuses for depositing film on both sides of a pane 有权
标题翻译：用于在玻璃板两侧沉积薄膜的方法和装置
公开(公告)号：US07491301B2
公开(公告)日：2009-02-17
申请号：US10922719
申请日：2004-08-20
申请人： Annette J. Krisko , Bob Bond , Roger Stanek , Gary Pfaff , Klaus Hartig
发明人： Annette J. Krisko , Bob Bond , Roger Stanek , Gary Pfaff , Klaus Hartig
IPC分类号： C23C14/34
CPC分类号： C03C17/3618 , C03C17/245 , C03C17/3417 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3642 , C03C17/3681 , C03C2217/213 , C03C2217/75 , C03C2217/77 , C03C2218/154 , C03C2218/365 , C23C14/10 , C23C14/3464 , C23C14/568 , Y10T428/26 , Y10T428/265
摘要： A method and apparatus for coating two sides of a single pane of glass or other substrate in a single pass through a coating apparatus. A sputtering line is provided, this line comprising a series of sputtering chambers. At least one of the chambers comprises a downward sputtering chamber having an upper target. At least one of the chambers comprises an upward sputtering chamber having a lower target. In some embodiments, the upper and lower targets are rotary targets. The coating apparatus advantageously has a plurality of transport rollers for conveying the substrate along the sputtering line. In certain embodiments, a majority of the chambers of the sputtering line are downward sputtering chambers each having only an upper target with no lower target.
摘要翻译：一种用于在单次通过涂布装置的玻璃或其它基板的单层玻璃中涂覆两侧的方法和装置。提供溅射线，该线包括一系列溅射室。至少一个腔室包括具有上靶的向下溅射室。至少一个室包括具有较低靶的向上溅射室。在一些实施例中，上靶和下靶是旋转靶。涂布装置有利地具有多个输送辊，用于沿溅射线输送基板。在某些实施例中，溅射线的大部分腔室是向下的溅射腔室，每个腔室仅具有没有较低靶子的上靶。

7. 发明授权

US07342716B2 Multiple cavity low-emissivity coatings 有权
标题翻译：多腔低辐射涂层
公开(公告)号：US07342716B2
公开(公告)日：2008-03-11
申请号：US11398345
申请日：2006-04-05
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： F21V9/04
CPC分类号： E06B3/6715 , C03C17/36 , C03C17/3613 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/211 , C03C2217/216 , C03C2217/78 , C03C2218/153 , C03C2218/154 , C23C14/568 , E06B9/24 , E06B2009/2417 , Y10T428/24612 , Y10T428/24942 , Y10T428/2495 , Y10T428/24975 , Y10T428/31504
摘要： Multiple cavity low-emissivity coatings. The coating includes three infrared-reflection film regions, which may each include silver.
摘要翻译：多腔低辐射涂层。涂层包括三个红外反射膜区域，每个红外反射膜区域可以各自包括银。

8. 发明授权

US07241506B2 Corrosion-resistant low-emissivity coatings 有权
标题翻译：耐腐蚀低辐射涂层
公开(公告)号：US07241506B2
公开(公告)日：2007-07-10
申请号：US10862770
申请日：2004-06-07
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： B32B17/06
CPC分类号： C03C17/3613 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C2217/78 , Y10T428/24 , Y10T428/265
摘要： A corrosion-resistant low-emissivity coating is provided. The low-emissivity coating comprises, in sequence outwardly, a corrosion-resistant inner infrared-reflective layer, a transparent dielectric middle coat, and an outer infrared-reflective layer. The outer infrared-reflective layer consists essentially of silver and the corrosion-resistant inner infrared-reflective layer has a different composition than the outer infrared-reflective layer. Also provided are methods for depositing coatings of this nature, as well as substrates bearing these coatings.
摘要翻译：提供耐腐蚀的低辐射涂层。低辐射涂层依次向外包括耐腐蚀的内部红外反射层，透明电介质中间涂层和外部红外反射层。外部红外反射层基本上由银组成，耐腐蚀的内部红外反射层具有与外部红外反射层不同的组成。还提供了用于沉积这种性质的涂层以及承载这些涂层的基材的方法。

9. 发明申请

US20070138000A1 CONCENTRATION-MODULATED COATINGS 有权
标题翻译：浓度调节涂料
公开(公告)号：US20070138000A1
公开(公告)日：2007-06-21
申请号：US11672207
申请日：2007-02-07
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： C23C16/00 , C23C14/32 , C23C14/00
CPC分类号： C03C17/3613 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3694 , C23C14/086 , C23C14/352 , C23C14/568 , Y10T428/265
摘要： The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.
摘要翻译：本发明提供一种承载低发射率涂层的基片。低辐射涂层包括至少一个分级膜区域。在某些实施例中，在双型低辐射率涂层的两个红外反射层之间提供至少一个分级膜区域。分级膜区域具有基本上连续降低的第一介电材料的浓度和基本上连续增加的第二介电材料的浓度。还提供了沉积这种低辐射率涂层和承载这些涂层的基材的方法。

10. 发明授权

US07157123B2 Plasma-enhanced film deposition 有权
标题翻译：等离子体增强膜沉积
公开(公告)号：US07157123B2
公开(公告)日：2007-01-02
申请号：US10739887
申请日：2003-12-18
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： H05H1/04
CPC分类号： H01J37/32862 , C23C16/4404 , C23C16/4405 , C23C16/509 , H01J37/34
摘要： Methods and equipment for depositing films. In certain embodiments, there is provided a deposition chamber having a substrate-coating region and an electrode-cleaning region. In these embodiments, an electrode is positioned in the deposition chamber and has an interior cavity in which first and second magnet systems are disposed. In certain embodiments, there is provided a method for depositing films onto substrates using a deposition chamber of the described nature. The invention also provides electrode assemblies for film-deposition equipment. In certain embodiments, the electrode assembly comprises a rotatable electrode (optionally having an outer coating of carbon or the like) having an interior cavity, with stationary first and second generally-opposed magnet systems being disposed in this interior cavity.
摘要翻译：沉积膜的方法和设备。在某些实施例中，提供了一种具有基底涂覆区域和电极清洁区域的沉积室。在这些实施例中，电极位于沉积室中，并且具有内部空腔，第一和第二磁体系统设置在该内部空腔中。在某些实施方案中，提供了一种使用所述性质的沉积室将膜沉积到基板上的方法。本发明还提供了用于成膜设备的电极组件。在某些实施例中，电极组件包括具有内部空腔的可旋转电极（可选地具有碳外部涂层等），固定的第一和第二大致相对的磁体系统设置在该内腔中。

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